49th Annual (2000) Denver X-ray Conference™
Denver Marriott Tech Center Hotel
Denver, Colorado, U.S.A.
July 31 - August 4

 

49th Annual (2000) DXC > Monday Workshops (July 31)
a.m. workshops: 9:00a.m.-12 noon      p.m. workshops: 2:00p.m.-5:00 p.m.
(unless otherwise noted)


Morning Workshops: XRF & XRD(W-1) - XRD(W-2 & W-3) - XRF(W-4)
Evening Workshops:  XRD(W-5 & W-6) - XRF(W-7 & W-8)

Workshops, Monday a.m.

XRD & XRF
W-1 
New Methods of Beam Conditioning (Evergreen A)

Organizer: J. Faber International Centre for Diffraction Data, Newtown Square, PA
Instructors: J. Faber International Centre for Diffraction Data, Newtown Square, PA
D.K. Bowen Bede Scientific, Inc., Englewood, CO

This workshop discusses traditional and newer methods of X-ray beam conditioning, as applied to both X-ray diffraction and X-ray fluorescence.

XRD
W-2 
Hands on Rietveld Analysis I (Bring your own computer) (Evergreen B)

Organizers: R.E. Dinnebier University of Bayreuth, Bayreuth, Germany
E. Antipov Moscow State University, Moscow, Russia
Instructors: R.E. Dinnebier University of Bayreuth, Bayreuth, Germany
E. Antipov Moscow State University, Moscow, Russia
R. VonDreele Los Alamos National Laboratory, Los Alamos, New Mexico
P.W. Stephens State University of New York at Stony Brook, Stony Bro

The Rietveld method is a fast-developing technique. This course is intended for beginners as well as advanced users and will cover many new features such as: advanced peak profile functions, rigid bodies with satellite groups, planarity restraints, modeling of anisotropic half-widths due to lattice strain, etc. After the lectures, all participants will have the opportunity to practice* using the well known "GSAS" program system. A well-prepared example exhibiting different levels of complexity will be provided. Participants are also welcome to bring their own datasets. 
*In order to participate hands-on, you must bring your own laptop computer and load the appropriate software, prior to attending the workshop. Please visit the web page http://www.pulverdiffraktometrie.de/Education/rietveld/rietveld.html for detailed instructions on how to obtain the necessary software.

W-3 
Alignment & Standards (Evergreen C)

Organizers & Instructors: J.P. Cline National Institute of Standards & Technology, Gaithersburg, MD
R.W. Cheary University of Technology Sydney, New South Wales, Australia

This workshop will discuss NIST Standard Reference Materials, the basic design of the conventional diffractometer, and how to realize optimal diffractometer performance through proper alignment and selection of optical components (eg., divergence slits, Soller slits, etc.). Various alignment procedures will be discussed with consideration given to the consequences of misalignment and missetting of the components. nstrument calibration and performance will be evaluated through the use of NIST Standards and the simulation of line profiles.

XRF
W-4 
Practical TXRF (Evergreen D)

Organizer: M.A. Zaitz IBM Microelectronics, Hopewell Junction, NY
Instructors: M.A. Zaitz IBM Microelectronics, Hopewell Junction, NY
P. Wobrauschek Atominstitut der Österreichischen Universitäten, Vienna, Austria
C. Streli Atominstitut der Österreichischen Universitäten, Vienna, Austria

This workshop will cover the basics of total reflection X-ray fluorescence, as well as instrumentation, calibration, and applications

Workshops, Monday p.m.

XRD
W-5 
Hands on Rietveld Analysis II (Bring your own computer) (Evergreen B)

Organizer: R.E. Dinnebier University of Bayreuth, Bayreuth, Germany
E. Antipov Moscow State University, Moscow, Russia
Instructors: R.E. Dinnebier University of Bayreuth, Bayreuth, Germany
E. Antipov Moscow State University, Moscow, Russia
R. VonDreele Los Alamos National Laboratory, Los Alamos, New Mexico
P.W. Stephens State University of New York at Stony Brook, Stony Brook, NY

Continuation of W-2.
*In order to participate hands-on, you must bring your own laptop computer and load the appropriate software, prior to attending the workshop. Please visit the web page http://www.pulverdiffraktometrie.de/Education/rietveld/rietveld.html for detailed instructions on how to obtain the necessary software.

W-6 
Analysis of Micron Size Specimens (Evergreen A)

Organizer: R. Goehner Sandia National Laboratories, Albuquerque, NM
Instructors: R. Goehner Sandia National Laboratories, Albuquerque, NM
R. Tissot Sandia National Laboratories, Albuquerque, NM
G. Ice Oak Ridge National Laboratory, Oak Ridge, TN
P.-C. Wang IBM Corporation Microelectronics Division, Hopewell Junction, NY

The workshop will describe methods and techniques used to analyze micron size specimens. Instructors will cover such topics as the use of Scanning Electron Microscopy for crystallographic evaluation, synchrotron based X-ray microbeam characterization of thin films in very-large-scale-integrated circuits, recent advances in synchrotron based 3-D X-ray crystal microscopes, and the use of laboratory-based X-ray sources and 2-D area detectors for small specimen analysis. Please bring your questions and ideas to this open forum workshop.

XRF
W-7 
An Introduction to X-ray Fluorescence (Evergreen C)

Organizer: R. Jenkins International Centre for Diffraction Data, Newtown Square, PA
Instructors: R. Jenkins International Centre for Diffraction Data, Newtown Square, PA
J. Croke Philips Analytical, Inc. (retired), Mahwah, NJ

This workshop is intended for beginners and those fairly new to the field of X-ray fluorescence analysis. The principles behind the technique, along with a description of the basics, of X-ray spectra and absorption effects will be introduced. The various types of instrumentation used in the field, including a "compare and contrast" of the features of wavelength and energy dispersive spectrometers, will also be presented. The use of both techniques for qualitative analysis will be covered. Additionally, brief coverage on specimen preparation methods an introduction to the basic concepts behind quantitative analysis will be offered.

W-8 
Analysis of Layered Materials by XRF (Evergreen D)

Organizer: M.W. Dirken Philips Analytical, Almelo, The Netherlands
Instructors: M.W. Dirken Philips Analytical, Almelo, The Netherlands
M. Mantler Vienna University of Technology, Vienna, Austria
A. Wittkopp Rontgenanalytik, Taunusstein-Neuhof, Germany

This workshop provides an introduction to the analysis of layered materials, and is intended for the X-ray spectroscopist who encounters this analysis for the first time. Therefore, the physics and various analysis models are presented. This is followed by contributions on ED-XRF and WD-XRF examples, focusing on practical issues including problems of finite thickness and line selection.