The 2002 Denver X-ray Conference
Antlers Adam's Mark Hotel

(formerly Antlers Doubletree Hotel)
Colorado Springs, Colorado, U.S.A.
29th July - 2nd August 2002

Denver X-ray Conference - sponsored by the International Centre for Diffraction Data

CALL FOR PAPERS

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51st Annual Denver X-ray Conference Plenary Session
Applications of X-ray Analysis to Forensic Materials

Organized by:
D.F. Rendle, The Forensic Science Service, Metropolitan Laboratory, London, United Kingdom
R. Jenkins, Emeritus, International Centre for Diffraction Data, Newtown Square, PA

“X-ray Analysis in the U.S. Customs Laboratories”
M.H. Liberman, U.S. Customs Laboratory,
San Francisco, CA

“Underkarat Jewelry: The Perfect Crime?
Investigations and Analysis of Jewelry Using XRF”
D. Kloos, Industry Consultant, Westminster, CA

“X-ray Diffraction Analysis in the Forensic Science Laboratory of Stuttgart, Germany—The Last Resort in Many Criminal Cases”
W. Kugler, Landeskriminalamt Baden, Wurttemberg, Kriminaltechnisches Institut, Stuttgart, Germany

“Portable XRF for Forensic Investigations”
D.C. Ward, Federal Bureau of Investigation,
Microanalysis Laboratory, Washington, DC

“Use of X-rays in the United Kingdom Forensic Science Service”
D.F. Rendle, The Forensic Science Service, Metropolitan
Laboratory, London, United Kingdom

“XRD at the FBI”
M.C. Bottrell, Federal Bureau of Investigation,
Geologist/Forensic Examiner, Washington, DC

 

Special Sessions—XRD & XRF

New Developments in XRD & XRF Instrumentation (commercial)
Organized by:
V.E. Buhrke, Consultant, Portola Valley, CA, 650.851.5020, vebuhrke@cs.com

Abstracts should be submitted by technical representatives of a manufacturer. They should discuss specifications and applications concerning one of their newest and most important products. Talks should include comments about software, XRD and XRF equipment, and accessories. No mention of prices or a comparison with competitors’ products can be included.

Synchrotron Applications
Organized by:
C. Lavoie, IBM, Yorktown Heights, NY, 914.945.2180, Clavoie@us.ibm.com
Co-chair:
K. Ludwig, Boston University, Boston, MA

“Real-Time Synchrotron Studies of Phase Transformations”
K. Ludwig, Boston University, Boston, MA

“Synchrotron In Situ Studies of Chemical Vapor Deposition”
G.B. Stephenson, Argonne National Laboratory, Argonne, IL

X-ray Optics
Organized by:
N. Gao, X-ray Optical Systems, Inc., Albany, NY, 518.464.3334, ngao@xos.com
Co-chair:
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM

“X-ray Diffraction Thin Film Analysis Using Polycapillary Collimating Optics”
Q. Xiao, IBM Corporation, San Jose, CA

“Dual Polycapillary Micro X-ray Fluorescence Instrument”
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM;
N. Gao, X-ray Optical Systems, Inc., Albany, NY

Microbeam Analysis (Combinatorial & Robotic Applications)
Organized by:
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, 505.667.9627, havrilla@lanl.gov

“1, 2 and 3D Micro-analysis Using SR-based Spectroscopy and Imaging”
A.S. Simionovici, European Synchrotron Research Facility, Grenoble, France

“Quantitative Aspects of X-ray Microbeam Analysis”
K. Janssens, University of Antwerp (UIA), Antwerp, Belgium

“Scanning X-ray Microtopography Study of Electromigration in Integrated Circuits”
P.-C. Wang, IBM Microelectronics, Hopewell Junction, NY

Thin Films
Organized by:
T.C. Huang, Emeritus, IBM Almaden Research Center, San Jose, CA, 408.578.4060, huang@icdd.com

“X-ray Diffraction Evidence of Anisotropic Epitaxial Stacking of Cu-phthalocyanine Molecules on a Specially Treated Si Substrate”
K. Inaba, K. Omote, J. Harada, Rigaku Corporation, Tokyo, Japan;
M. Ofuji, H. Hoshi, Y. Takanishi, K. Ishikawa, H. Takezoe, Tokyo Institute of Technology, Tokyo, Japan

Special Sessions—XRD

Rietveld Applications (Full day)
Organized by:
J.A. Kaduk, BP Amoco, Naperville, IL, 630.420.4547, James.Kaduk@ineos.com

“Structure Determination From Powder Diffraction Data: Relations Between Structures and Physical Properties”
Q. Huang, National Institute of Standards & Technology, Gaithersburg, MD

“Crystal Structures of Organic/Pharmaceutical Compounds”
P.W. Stephens, SUNY Stony Brook, Stony Brook, NY

“Rietveld Quantitative X-ray Diffraction on Complex Mixtures—What Can We Do?”
R.S. Winburn, Minot State University, Minot, ND

“Strain, Crystallite Size, and Phase Composition in Nanocrystalline Solids”
X. Bokhimi, Mexican Institute of Petroleum, Mexico City, Mexico

Industrial Applications of XRD (Full day)
Organized by:
R.L. Snyder, The Ohio State University, Columbus, OH, 614.292.6255, snyder.355@osu.edu
C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN, 865.574.4472, hubbardcr@ornl.gov

Invited talks to be announced

Stress Analysis
Organized by:
C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY, 914.894.3683, cgoldsmi@us.ibm.com

"Residual Stress Measurements Using Parallel Beam Optics"
T. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN

Neutron Diffraction
Organized by:
E. Üstündag, California Institute of Technology, Pasadena, CA, 626.395.2329, ersan@caltech.edu
M.A.M. Bourke, Los Alamos National Laboratory, Los Alamos, NM, 505.665.1386, bourke@lanl.gov

“Diffraction Measurements During Mechanical Loading in Superelastic and Shape-Memory Alloys”
R. Vaidyanathan, University of Central Florida, Orlando, FL

“ENGIN-X: Optimizing a Neutron Stress Diffractometer”
M.R. Daymond, Rutherford Appleton Laboratory, Oxon, United Kingdom

Special Sessions—XRF

Quantitative XRF
Organized by:
J. Gilfrich, Emeritus, SFA, Inc./NRL, Washington, DC, 301.365.5070, j.gilfrich@att.net

“Accuracy of Theoretical Influence Coefficient Methods”
M. Mantler, Vienna University of Technology, Vienna, Austria

“Quantitative Approaches in Micro X-ray Fluorescence”
G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM

TXRF
Organized by:
M.A. Zaitz, IBM Microelectronics, Hopewell Junction, NY, 914.894.6337, zaitz@us.ibm.com

Invited talks to be announced

Problem Solving/Industrial Applications of XRF
Organized by:
D. Broton, Construction Technology Labs, Skokie, IL, 847.965.7500, dbroton@CTLgroup.com

“Cement Content of Hardened Portland Cement Concrete Using XRF, A Novel Approach”
D. Broton, Construction Technology Labs, Skokie, IL

“The Use of XRF in Solving Problems Related to the Production of Active Pharmaceutical Ingredients (API)”
F.J. Antosz, J.W. Manski, Pharmacia, Kalamazoo, MI

Polarized X-ray Optics
Organized by:
B. Chappell, Macquarie University, Sydney, Australia, bruce.chappell@mg.edu.au
Co-chair: R.W. Ryon, Emeritus, Lawrence Livermore National Laboratories, Livermore, CA

“Polarized Beam XRF Analysis—Past and Future”
J. Heckel, Spectro Analytical Instruments, Kleve, Germany

“Polarized Beam XRF Analysis of Geologic Materials”
B. Chappell, Macquarie University, Sydney, Australia

“Polarization for Background Reduction in EDXRF—The Technique That Would Not Work”
R.W. Ryon, Emeritus, Lawrence Livermore National Laboratories, Livermore, CA

Workshops—XRD & XRF
Optics
Organized by:
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, havrilla@lanl.gov
Z. Al-Mosheky, Osmic, Inc., Troy, MI, Zaid@osmic.com

Thin Films
Organized by:
M.W. Dirken, Philips Analytical, Almelo, The Netherlands, mark.dirken@philips.com

Workshops—XRD

Rietveld Applications (Full day)
Organized by:
J.A. Kaduk, BP Amoco, Naperville, IL, James.Kaduk@ineos.com

Advances in Database Technology
Organized by:
J. Faber, International Centre for Diffraction Data, Newtown Square, PA, faber@icdd.com

Line Broadening
Organized by:
J. Makinson, Rail Sciences, Inc., Omaha, NE, john@railsciences.com

Methods of Phase Identification
Organized by:
R. Jenkins, Emeritus, International Centre for Diffraction Data, Newtown Square, PA, jenkins@icdd.com

Texture Analysis (Full day)
Organized by:
H. Schaeben, Freiberg University of Mining and Technology, Freiberg, Germany, schaeben@geo.tu-freiberg.de

Workshops—XRF

Quantitative XRF (Full day)
Organized by:
J. Anzelmo, Bruker AXS, Inc., Madison, WI, janzelmo@bruker-axs.com
M. Mantler, Vienna University of Technology Vienna, Austria, mmantler@xrm.atp.tuwien.ac.at

Fundamentals of XRF
Organized by:
J. Gilfrich, Emeritus, SFA, Inc./NRL, Washington, DC, j.gilfrich@att.net
J. Croke, Emeritus, Philips Analytical, Inc., Natick, MA, johncroke@aol.com

TXRF
Organized by:
M.A. Zaitz, IBM Microelectronics, Hopewell Junction, NY, zaitz@us.ibm.com

Polarized X-ray Optics
Organized by:
B. Chappell, Macquarie University, Sydney, Australia, bruce.chappell@mg.edu.au

Specimen Preparation (Full day)
Organized by:
D. Broton, Construction Technology Labs, Skokie, IL, dbroton@CTLgroup.com

Approximate Conference Preregistration Fees*
Full week: exhibits, workshops, sessions† $325
Monday & Tuesday: exhibits, workshops† $275
Wednesday, Thursday & Friday: exhibits, sessions† $275
Session organizers, invited speakers & workshop instructors† $100
Students, unemployed X-ray people, and persons 65 and older: exhibits, workshops, sessions $ 75

*Preregistration fees will only be valid until 5 July 2002. Registration fees will increase after 5 July 2002.
†Includes a copy of Volume 46 of Advances in X-ray Analysis on CD-ROM.

Jerome B. Cohen Student Award
This award, instituted in the memory of Professor Jerome B. Cohen, one of the leaders in the field of X-ray analysis and in the training of students in this art, is intended to recognize the outstanding achievements of student research in this field. All students, graduate or undergraduate, who are working in any aspect of X-ray analysis, can submit their work. The research must be original, of high quality and must be primarily the work of the student. The papers submitted for this competition must be received in electronic form by 1 July 2002 in final publication form. The winner will be selected by a committee of researchers in the field, announced at the Plenary Session of the conference and listed in the proceedings. The award for the year 2002 will be in the amount of $1,000. Students interested in participating in this year’s competition must submit their papers and a certification form to dxc@icdd.com by the due date. The certification form can be obtained on the Denver X-ray Conference website: http://www.dxcicdd.com.

Presented Papers
The Organizing Committee considers unprofessional the withdrawal of a paper (except in special circumstances) after it has been accepted and widely advertised. Non-U.S. authors, in particular, please try to secure travel funding and approvals before submitting your abstract(s).

Publication of presented papers: In the interest of releasing the conference proceedings, Advances in X-ray Analysis, as early as possible after the conclusion of the conference, we are encouraging authors to submit their manuscripts for publication during the conference at the conference registration desk.

If you are unable to bring your manuscript with you at that time, please mail it no later than 7 September 2002 to:
Denise Zulli
ICDD
12 Campus Boulevard
Newtown Square, PA 19073-3273 U.S.A.

Note: To be acceptable for publication, papers should describe either new methods, theory and applications, improvements in methods or instrumentation, or other advances in the state of the art. Papers emphasizing commercial aspects are discouraged. Information for preparing manuscripts will be mailed after abstracts have been received.

Contributed Papers
Contributed papers are hereby solicited for any of the special sessions previously listed or the XRD and XRF general sessions. Many of the contributed papers will be placed in poster sessions, held in conjunction with mixers during the evenings of conference week. Those of more general interest will be placed in oral sessions.

For More Information
For additional information, contact:
Denise Zulli
ICDD
12 Campus Boulevard
Newtown Square, PA 19073-3273 U.S.A.
Phone: 610.325.9814
Fax: 610.325.9823
E-mail: dxc@icdd.com