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PLENARY SESSION
Organized by: M. Mantler, Vienna University of Technology, Vienna, Austria
“THE USE OF CONVENTIONAL AND SYNCHROTRON
X-RAY MICROBEAM FOR NON-DESTRUCTIVE CHARACTERISATION OF ARCHAEOLOGICAL AND
ARTISTS’ MATERIALS: BEYOND ELEMENTAL ANALYSIS”
K. Janssens, University of Antwerp, Antwerp, Belgium
“X-RAYS IN ART AND ARCHAEOLOGY—HISTORY,
PRESENT STATE AND PERSPECTIVES”
M. Schreiner, Academy of Fine Arts, Vienna, Austria
“APPLICATIONS OF X-RAY DIFFRACTION IN
CONSERVATION SCIENCE AND ARCHAEOMETRY”
M.C. Corbeil, Canadian Conservation Institute, Ottawa, Canada
“PORTABLE X-RAY FLUORESCENCE ANALYSIS OF
NEOLITHIC STONE AXES—OPENING A WINDOW ON PREHISTORY”
P.J. Potts, The Open University, Milton Keynes, United Kingdom |
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Special Sessions - XRD & XRF
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New Developments
in XRD & XRF Instrumentation
Organized by: V.E. Buhrke, Consultant, Portola Valley, CA, 650.851.5020,
vebuhrke@cs.com
Abstracts should be submitted by technical representatives of a
manufacturer. They should discuss specifications and applications
concerning one of their newest and most important products. Talks should
include comments about software, XRD and XRF equipment, and accessories.
No mention of prices or a comparison with competitors’ products can be
included. |
X-ray Optics
Organized by: G.J. Havrilla, Los Alamos National Laboratory, Los Alamos,
NM, 505.667.9627, havrilla@lanl.go
“X-RAY OPTICS: THE DRIVING FORCE OF NEW TECHNOLOGIES FOR X-RAY ANALYSIS”
N. Gao, X-ray Optical Systems, Inc., Albany, NY
"DEPTH SENSITIVE X-RAY FLUORESCENCE ANALYSIS
WITH X-RAY OPTICS"
B. Kanngießer, TU-Berlin, Institut für Atomare Physik und Fachdidaktik,
Berlin, Germany
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Detectors & Sources
Organized by: V.E. Buhrke, Consultant, Portola Valley, CA, 650.851.5020, vebuhrke@cs.com
“NEW DETECTOR TECHNOLOGIES FOR X-RAY DIFFRACTION”
R. Durst, Bruker AXS, Inc., Madison, WI
“RECENT ADVANCES IN HIGH-RESOLUTION SOURCES AND HIGH-RESOLUTION
DETECTORS FOR SOFT X-RAY FLUORESCENCE ANALYSIS: TXRF-NEXAFS AND STJS”
B. Beckhoff, Physikalisch–Technische Bundesanstalt, Berlin, Germany
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Cement Analysis
Organized by: R. Yellepeddi, Thermo ARL, Ecublens, Switzerland,
ravi.yellepeddi@thermoarl.com
“PROCESS AND QUALITY CONTROL IN THE CEMENT INDUSTRY USING X-RAY
INSTRUMENTS: CHALLENGES AND SOLUTIONS”
J. Hook, Lehigh Cement Company, Union Bridge, MD
“ADVANCES IN QUANTITATIVE XRD ANALYSIS FOR CLINKER, CEMENT (CEM I, CEM
II, CEM III) AND CEMENTITIOUS ADDITIONS
G. Walenta, Lafarge Central Research Laboratories, Cedex, France
T. Füllmann, Swiss Federal Institute of Technology, Lausanne, Switzerland
“NON-ROUTINE ANALYSIS IN CEMENT INDUSTRY: ENVIRONMENTAL CONTROL,
ALTERNATIVE FUELS AND OTHER CENTRAL LAB APPLICATIONS USING STANDARD-LESS ANALYSIS PROGRAMS”
A. Buman, Thermo ARL, Dearborn, MI
R. Yellepeddi, Thermo ARL, Ecublens, Switzerland
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Special Sessions - XRD
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Stress Analysis
Organized by: C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY,
845.894.3683, cgoldsmi@us.ibm.com
Co-chair: T.R. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN
“IN-SITU MEASUREMENT OF GROWTH STRESS IN ALUMINA SCALE”
E. Specht, Oak Ridge National Laboratory, Oak Ridge, TN
“PRECIPITATION KINETICS AND DEFORMATION BEHAVIOR OF TiAl-W ALLOYS AT
ELEVATED TEMPERATURES”
H. Choo, The University of Tennessee, Knoxville, TN and Oak Ridge National
Laboratories, Oak Ridge, TN
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Industrial Applications of XRD
(Full day)
Organized by: R.L. Snyder, Georgia Institute of Technology, Atlanta, GA,
404.894.2888, bob.snyder@mse.gatech.edu
C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN,
865.574.4472, hubbardcr@ornl.gov
“X-RAY DIFFRACTION AT DUPONT CENTRAL RESEARCH AND DEVELOPMENT”
T.G. Amos, DuPont Central R & D Experimental Station, Wilmington, DE
“X-RAY DIFFRACTION AT IBM”
I.C. Noyan, IBM, Yorktown Heights, NY
C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY, 845.894.3683,
cgoldsmi@us.ibm.com
“X-RAY DIFFRACTION AT LUCENT”
G. Kowach, Bell Laboratories—Lucent Technologies, Murray Hill, NJ
"X-RAY DIFFRACTION AND MORE AT GE"
Y. Gao, GE Global Research Center, Schenectady, NY
"XRD FOR INDUSTRY: SELECTED EXAMPLES FROM A
SMALL PRIVATE LABORATORY"
H. Goebel, Siemens AG, Muenchen, Germany
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Rietveld Applications (Full day)
Organized by: J.A. Kaduk, BP Chemicals, Naperville, IL
"STRUCTURE- PROPERTY RELATIONSHIPS OF
SUPERCONDUCTING AND HEAVY FERMION
INTERMETALLICS"
J. Chan, Louisiana State University, Baton Rouge, LA
SMART CRYSTALLOGRAPHIC IMAGING FOR CHEMICAL
ENGINEERING BY THE MEM/RIETVELD METHOD
M. Takata, Nagoya University, Nagoya, Japan
COMBINING MULTIPLE OBSERVATIONS FOR POWDER
DIFFRACTION CRYSTALLOGRAPHY
B. Toby, National Institute of Standards & Technology, Gaithersburg,
MD
SOLVING NEIGHBORING ELEMENT PROBLEMS IN TYPE-I
CLATHRATES USING RESONANT DIFFRACTION: SUCESSES AND PROBLEMS
A.P. Wilkinson, Georgia Institute of Technology, Atlanta, GA
REVEALING STRUCTURAL CHANGE BY THE TEMPERATURE
DEPENDENCE OF ATOMIC DISPLACEMENT PARAMETERS
B. Chakoumakos, Oak Ridge National Laboratory, Oak Ridge, TN |
High Resolution—XRD
Organized by: B. Tanner, University of Durham, Durham, United Kingdom, b.k.Tanner@durham.ac.uk
“X-RAY SCATTERING FOR SEMICONDUCTOR HETEROSTRUCTURE ANALYSIS”
M. Goorsky, UCLA, Los Angeles, CA
“STRUCTURE INVESTIGATIONS OF THIN FILMS AND LATERAL NANOSTRUCTURES BY
MEANS OF X-RAY GRAZINGINCIDENCE DIFFRACTION”
U. Pietsch, University of Potsdam, Potsdam, Germany
“FROM THE LAB TO THE FAB: AUTOMATED HIGH-RESOLUTION X-RAY METROLOGY FOR
THE SILICON SEMICONDUCTOR INDUSTRY”
M. Wormington, Bede Scientific, Inc., Denver, CO
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Catalysis
Organized by: C. Lowe-Ma, Ford Motor Research Labs, Dearborn, MI,
313.317.7382, clowema@ford.com
Co-chair: A.Z. Ringwelski, UOP LLC, Des Plaines, IL
“CHARACTERIZATION OF A Ce/Zr MIXED OXIDE MATERIAL—A COMPARISON OF
OFF-LINE AND IN-SITU HIGHTEMPERATURE REDUCTION TREATMENTS”
D.J. Hetro, D.S. Roehner, S.D. Gotshall, Johnson Matthey Catalytic Systems
Division—North America, Wayne, PA
“STATIC AND DYNAMIC NANO-CHARACTERIZATION OF HETEROGENEOUS CATALYSTS”
P.A. Crozier, Arizona State University, Tempe, AZ
“COMBINATORIAL METHODS IN CATALYSIS RESEARCH: HIGH SPEED
CHARACTERIZATION OF MATERIALS”
A.Z. Ringwelski, UOP LLC, Des Plaines, IL
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Pharmaceuticals
Organized by: T.C. Huang, Emeritus, IBM Almaden Research Center, San Jose,
CA, 408.578.4060,
tinghuang@tinghuang.com
NEW APPLICATIONS OF XRD FOR R&D AND QUALITY
CONTROL OF PHARMACEUTICAL COMPOUNDS
A. Kishi, Rigaku Corporation, Osaka, Japan
Title to be announced
R. Suryanarayanan, University of Minnesota, Minneapolis, MN |
Synchrotron Applications: X-ray
Diffraction and Scattering
Organized by: C. Lavoie, IBM, Yorktown Heights, NY, 914.945.2180, clavoie@us.ibm.com
Co-chair: S. Eisebitt, BESSY GmbH, Berlin, Germany
“COHERENT X-RAY SCATTERING ON MAGNETIC NANOSTRUCTURES”
S. Eisebitt, BESSY GmbH, Berlin, Germany
“FROM BASIC SCIENCE TO NEW FLAT PANEL DISPLAYS: SOLVING THE LIQUID
CRYSTAL ALIGNMENT PUZZLE USING NEXAFS SPECTROSCOPY”
J. Lüning, Stanford Synchrotron Radiation Laboratory, Menlo Park, CA
"TEXTURE AND MICROSTRUCTURE ANALYSIS WITH
HIGH-ENERGY SYNCHROTRON RADIATION”
H.J. Bunge, Technische Universität Clausthal, Clausthal-Zellerfeld,
Germany
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Special Sessions - XRF
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Quantitative XRF
Organized by: J. Gilfrich, Emeritus, SFA, Inc./NRL, Washington, DC,
301.365.5070, jgilfrich@juno.com
Co-chair: W.T. Elam, University of Washington, Redmond, WA
“QUANTITATIVE ANALYSIS BY X-RAY INDUCED TOTAL ELECTRON YIELD (TEY) COMPARED TO
XRFA”
H. Ebel, Institut für Festkörperphysik, Technische Universität Wien, Wien,
Austria
“CONSIDERATIONS FOR OPTIMIZING PRECISION AND ACCURACY OF MULTILAYER THIN FILM
MEASUREMENTS”
A. Wittkopp, Thermo NORAN, Middleton, WI
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Problem Solving / Industrial Applications—XRF
Organized by: J. Anzelmo, Bruker AXS, Inc., Madison, WI, 608.276.3011, janzelmo@bruker-axs.com
APPLICATIONS OF XRF IN THE PLASTICS INDUSTRY
T. Henderson, GE Plastics, Mt. Vernon, IN
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TXRF
Organized by: M.A. Zaitz, IBM – EF Microelectronics, Hopewell Junction, NY,
845.894.6337, zaitz@us.ibm.com
“FOCUSED BEAM TXRF SYSTEM BASED ON DOUBLY CURVED CRYSTAL OPTICS”
Z. Chen, X-ray Optical Systems, Inc., Albany, NY
“PERSPECTIVE OF TXRF IN ENVIRONMENTAL ANALYSIS”
S. Török, J. Osán, KFKI Atomic Energy Research Institute, Budapest, Hungary
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Synchrotron Applications—XRF
Organized by: K.W. Jones, Brookhaven National Laboratory, Upton, NY,
631.344.4588, kwj@bnl.gov
“PERFORMANCE AND APPLICATION OF MIRROR-BASED X-RAY FLUORESCENCE MICROPROBES AT
THE
ADVANCED PHOTON SOURCE AND THE NATIONAL SYNCHROTRON LIGHT SOURCE”
S.R. Sutton, The University of Chicago, Chicago, IL
“CHARACTERIZATION OF METALLOPROTEIN METAL SITES: HIGH THROUGHPUT APPROACHES TO
BIOLOGICAL X-RAY ABSORPTION SPECTROSCOPY”
J. Penner-Hahn, The University of Michigan, Ann Arbor, MI
“APPLICATION OF FLUORESCENT MICROTOMOGRAPHY AND OTHER X-RAY FLUORESCENCE
TECHNIQUES”
A. Simionovici, European Synchrotron Radiation Facility, Grenoble, France
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Workshops.XRD & XRF
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Optics
Organized by: S.T. Misture, NYS College of Ceramics at Alfred University,
Alfred, NY, misture@alfred.edu
J.P. Cline, National Institute of Standards & Technology, Gaithersburg, MD,
james.cline@nist.gov
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Technical Communication
Organized by: J.A. Kaduk, BP Chemicals, Naperville, IL, kadukja@bp.com
I.C. Noyan, IBM, Yorktown Heights, NY, noyan@us.ibm.com
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Workshops.XRD
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Alignment & Standards
Organized by: S.T. Misture, NYS College of Ceramics at Alfred University,
Alfred, NY, misture@alfred.edu
J. Cline, National Institute of Standards & Technology, Gaithersburg, MD, cline@credit.nist.gov
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Two-Dimensional X-ray Diffraction (Full day)
Organized by: B.B. He, Bruker AXS, Inc., Madison, WI, bhe@bruker-axs.com
T.N. Blanton, Eastman Kodak Company, Rochester, NY, thomas.blanton@kodak.com
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Rietveld Applications (Full day)
Organized by: J. Faber, International Centre for Diffraction Data, Newtown
Square, PA, faber@icdd.com
A. Kern, Bruker AXS GmbH, Karlsruhe, Germany, arnt.kern@bruker-axs.de
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High Resolution XRD
Organized by: B. Tanner, University of Durham, Durham, United Kingdom,
b.k.Tanner@durham.ac.uk
D.K. Bowen, Bede Scientific Inc., Englewood, CO, keith@bede.com
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Backscatter Electron Diffraction
Organized by: R.P. Goehner, Sandia National Laboratories, Albuquerque, NM,
rpgoehn@sandia.gov
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Workshops.XRF
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Specimen Preparation (Full day)
Organized by: D. Broton, Construction Technology Labs, Skokie, IL, dbroton@ctlgroup.com
J. Anzelmo, Bruker AXS, Inc., Madison, WI, janzelmo@bruker-axs.com
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Fundamentals of XRF
Organized by: J. Gilfrich, Emeritus, SFA, Inc./NRL, Washington, DC,
jgilfrich@juno.com
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Working Close to Detection Limits.XRF
Organized by: R. Van Grieken, University of Antwerp, Antwerp, Belgium, vgrieken@uia.ua.ac.be
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Quantitative Analysis (Full day)
Organized by: M. Mantler, Vienna University of Technology, Vienna, Austria,
mmantler@xrm.atp.tuwien.ac.at
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Basic TXRF
Organized by: M.A. Zaitz, IBM.EF Microelectronics, Hopewell Junction, NY, zaitz@us.ibm.com
P. Wobrauschek, Atominstitut der Osterreichischen Universitaten, Vienna,
Austria, wobi@ati.ac.at
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Guidelines for Preparing Abstracts
The deadline for receipt of abstracts is 21 February 2003
Abstracts are reproduced as submitted in the Book of Abstracts, and will also be published on the Denver
X-ray Conference web site, with links to, or duplicate copies on other affiliated web sites (e.g., ICDD
and/or IXAS). If you do not want your abstract so published, please note your request on the information page
of your abstract submission. Abstracts must not exceed
one page in length and must include the title, author(s), affiliations(s) and the text. To provide uniformity, it is
recommended that abstracts be prepared according to
the following guidelines:
Abstract Format
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Paper Size: 8.5 x 11 inches; A4 paper must be formatted
for 8.5 x 11 inches
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Size: Entire abstract, including title,
author(s), affiliation(s), and text, must fit into a maximum area of 15 cm (5.9") wide by 20 cm (7.9") high.
Please allow a top margin of 3.8 cm (1.5") to allow insertion of session codes/information by
conference staff
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Font: Times or Times New Roman, 12 point
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Title: bold, centered, all uppercase (except where
lowercase letters are needed for clarity)
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Leave one blank line between the title and the
author(s)
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Author(s) and affiliation(s): mixed upper and
lowercase, centered; if there is more than one author, underline the presenting author's name
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Leave two blank lines before beginning the text
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Text:
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text should appear flush left; do not indent
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use line spacing sufficiently large enough
to allow the abstract to be read easily, including subscripts, superscripts and
Greek letters
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a blank line is recommended (space permitting)
between paragraphs
Information Page
In addition to the abstract, please submit a separate page with the following information:
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Permission to post abstract on the DXC web site
and affiliated web sites
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Speaker's name, mailing address, phone number,
fax number, and e-mail address
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If the speaker is not the person to whom correspondence
should be sent, please include contact person's name, mailing address, phone number,
fax number, and e-mail address
-
Indicate your preferences:
- oral presentation or poster
- if oral presentation is preferred, suggested session where paper may be best suited
- if poster presentation is preferred, choose the XRD or XRF evening poster
session
-
If your submission is invited, please indicate that
your paper is invited and include the chairperson's name that issued your invitation along with
the session title
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Indicate whether you intend to publish this paper
in Advances in X-ray Analysis, Volume 47
Abstract Submission
Abstracts may be submitted via the web or by e-mail.
Please note:
-
Special characters, tables, mathematical formulae
and figures should be kept to a minimum
-
If special symbols or Greek letters are used,
please limit the fonts to those that are available with the standard distribution of
Microsoft Word or WordPerfect. Nonstandard fonts may lead to errors in transmission
-
All graphics must be embedded in the Word or
WordPerfect document
Note: Because they do not reproduce well, abstracts submitted by facsimile will not be accepted.
Receipt of abstracts will be confirmed via e-mail. If you do not receive your confirmation
within two weeks of your submission, please
contact:
Denise Flaherty
Conference Coordinator
flaherty@icdd.com
phone 610.325.9814.
Presented Papers
The Organizing Committee considers unprofessional the withdrawal of a paper
(except in special circumstances) after it has been accepted and widely advertised. Non-U.S. authors, in
particular, please try to secure travel funding and approvals before submitting your
abstract(s). Publication of presented papers: In the interest of releasing the conference
proceedings, Advances in X-ray Analysis, as early as possible after the conclusion of the conference, we are encouraging
authors to submit their manuscripts for publication during the conference at the conference registration desk. If
you are unable to bring your manuscript with you at that time, please mail it no later than 8 September 2003
to:
Denise Flaherty
ICDD
12 Campus Boulevard
Newtown Square, PA 19073-3273 U.S.A.
Note: To be acceptable for publication, papers should describe either new
methods, theory and applications, improvements in methods or instrumentation, or other advances in the state of the art. Papers
emphasizing commercial aspects are discouraged. Information for preparing manuscripts will be mailed after abstracts have been
received.
Contributed Papers
Contributed papers are hereby solicited for any of the special sessions
previously listed or the XRD and XRF general sessions. Many of the contributed papers will be placed in poster
sessions, held in conjunction with mixers during the evenings of conference week. Those of more general interest
will be placed in oral sessions.
Jerome B. Cohen Student Award
This award, instituted in the memory of Professor Jerome B. Cohen, one of the
leaders in the field of X-ray analysis and in the training of students in this art, is intended to recognize the
outstanding achievements of student research in this field. All students, graduate or undergraduate, who are working in any
aspect of X-ray analysis, can submit their
work. The research must be original, of high quality and must be primarily the
work of the student. The papers submitted for this competition must be received in electronic form by
1 July 2003 in final publication form. The winner will be selected by a committee of researchers in the field,
announced at the Plenary Session of the conference and listed in the proceedings. The award for the year 2003 will be in the amount
of $1,000. Students interested in participating in this year's competition must submit
their papers and a certification form to dxc@icdd.com by the due date. The certification form can be obtained
here.
For more
information please contact Denise Flaherty - flaherty@icdd.com
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