 |
Thursday Sessions
|
Thursday a.m.
(Evergreen A)
SESSION C-2 Detectors & Sources
Organized by: V.E. Buhrke, Consultant, Portola Valley, CA
XRD & XRF |
|
9:00 |
F22 |
RECENT ADVANCES IN HIGH-RESOLUTION SOURCES AND HIGH-RESOLUTION
DETECTORS FOR SOFT X-RAY FLUORESCENCE ANALYSIS: TXRF-NEXAFS AND STJs—Invited
B. Beckhoff, Physikalisch-Technische Bundesanstalt, Berlin, Germany |
|
9:30
|
F44 |
IMPROVEMENTS IN LOW-POWER END-WINDOW TRANSMISSION-TARGET
X-RAY TUBES
C. Jensen, S.D. Liddiard, A. Reyes-Mena, M. Moras, D.C. Turner, MOXTEK,
Inc., Orem, UT
S.M. Elliott, Thin Film Consulting, Longmont, CO |
|
9:50
|
C08 |
STATUS OF COMPACT AND PORTABLE LASER-COMPTON SCATTERING SOURCE
AT THE IDAHO ACCELERATOR CENTER
K. Chouffani, D. Wells, F. Harmon, Y. Toyoda, Idaho Accelerator Center,
Pocatello, ID
J. Jones, G. Lancaster, Idaho National Engineering and Environmental
Laboratory, Idaho Falls, ID |
|
10:00
|
|
Break |
|
10:40
|
C04 |
STATE-OF-THE-ART SILICON DETECTORS FOR X-RAY SPECTROSCOPY
P. Lechner, R. Hartmann, P. Holl, H. Soltau, PNSensor GmbH, München,
Germany
N. Meidinger, G. Schaller, F. Schopper, L. Strüder, MPI für Physik,
München, Germany
G. Lutz, R.H. Richter, MPI für extraterrestrische Physik, Garching,
Germany |
|
11:00
|
C05 |
SILICON DRIFT DETECTORS FOR HIGH RESOLUTION, HIGH COUNT RATE
X-RAY SPECTROSCOPY AT ROOM TEMPERATURE
P. Lechner, H. Soltau, PNSensor GmbH, München, Germany
C. Fiorini, A. Longoni, Politecnico di Milano, Milano, Italy
G. Lutz, MPI für Physik, München, Germany
L. Strüder, MPI für extraterrestrische Physik, Garching, Germany |
|
11:20
|
C13 |
1- AND 2-DIMENSIONAL DETECTION SYSTEMS AND THE PROBLEM OF
SAMPLE FLUORESCENCE IN X-RAY DIFFRACTOMETRY
M.J. Fransen, A.C. Vermeulen, PANalytical, Almelo, The Netherlands |
|
11:40
|
D111 |
A NEW “VORTEX” DETECTOR SYSTEM FOR X-RAY POWDER
DIFFRACTOMETRY
G. Fuginawa, M. Kuribayashi, J. Harada, Rigaku Corporation, Tokyo, Japan
S. Barkan, J.S. Iwanczyk, B.E. Patt, L. Feng, C.R. Tull, Photon Imaging,
Inc.,
Northridge, CA |
|
12:00
|
C16 |
NOVEL, PHOTON COUNTING X-RAY DETECTORS—Invited
R.D. Durst, Y. Diawara, D. Khazins, S. Medved, B. Becker, T. Thorson, Bruker
AXS, Inc., Madison, WI
|
Thursday a.m.
(Evergreen B)
SESSION D-3 SYNCHROTRON APPLICATIONS: X-RAY DIFFRACTION & SCATTERING
Organized by: C. Lavoie, IBM, Yorktown Heights, NY
Co-chair: S. Eisebitt, BESSY GmbH, Berlin, Germany
XRD |
| 8:30 |
D071 |
COHERENT X-RAY
SCATTERING ON MAGNETIC NANOSTRUCTURES—Invited
S. Eisebitt, BESSY GmbH, Berlin, Germany |
|
9:00
|
D017 |
TEXTURE AND MICROSTRUCTURE ANALYSIS WITH HIGH-ENERGY
SYNCHROTRON RADIATION—Invited
H.J. Bunge, Technical University of Clausthal, Clausthal-Zellerfeld,
Germany |
|
9:30
|
D035 |
DEPTH RESOLVED STRAIN ANALYSIS OF LATERAL NANOSTRUCTURES
PRODUCED BY FOCUSED Ga ION IMPLANTATION IN GaAs
J. Grenzer, U. Pietsch, Institut of Physics, University of Potsdam,
Potsdam, Germany
B. Köhler, Fraunhofer Institute for Nondestructive Testing, Dresden,
Germany |
|
9:50
|
D107 |
MEASUREMENT OF STRAIN FIELDS AROUND DOMAINS IN BaTiO3 USING
X-RAY MICRODIFFRACTION
R.C. Rogan, E. Üstündag, M. Motahari, California Institute of
Technology, Pasadena, CA
N. Tamura, Lawrence Berkeley National Laboratory, Berkeley, CA |
|
10:10
|
Break |
|
|
10:30
|
D062 |
FATIGUE CRACK STUDY USING X-RAY PHASE CONTRAST AND MULTIPLE
ANGLE STEREOMETRY METHODS
K. Ignatiev, Georgia Institute of Technology, Atlanta, GA
S.R. Stock, Northwestern University, Chicago, IL |
|
10:50
|
D043 |
PHASE IDENTIFICATION AND SEQUENCE CHARACTERIZATION IN Ni-Si
THIN FILMS AT LOW TEMPERATURE
C. Coia, P. Desjardins, École Polytechnique de Montréal, Montréal,
Canada
C. Lavoie, C. Detavernier, IBM, T.J. Watson Research Center, Yorktown
Heights, NY |
|
11:10
|
D013 |
THE USE OF X-RAY SCATTERING FOR MEDICAL DIAGNOSIS
K.D. Rodgers, A. Round, Cranfield University, Swindon, U.K.
C.J. Hall, Synchrotron Radiation Dept., SRS, Cheshire, U.K.
R.A. Lewis, Monash University, Australia
A. Hufton, Christie Hospital, Manchester, U.K. |
|
11:30
|
D060 |
SYNCHROTRON X-RAY PHASE RADIOGRAPHY AND ABSORPTION MICRO-CT
OF REGENERATING NEWT LIMBS
S.R. Stock, M. Gradassi, H.G. Simon, Northwestern University, Chicago IL
K. Ignatiev, Georgia Institute of Technology, Atlanta GA
I. Smolsky, H. Tsuruta, Stanford Synchrotron Radiation Lab., Stanford CA
F. De Carlo, Advanced Photon Source, Argonne IL
|
|
11:50
|
C07 |
SYNCHROTRON APPLICATIONS IN ARCHAEOMETALLURGY: ANALYSIS OF
HIGH ZINC BRASS ASTROLABES
B. Newbury, M. Notis, G.S. Cargill, III, Lehigh University, Bethlehem, PA
B. Stephenson, Adler Planetarium & Astronomy Museum, Chicago, IL
J. Almer, D. Haeffner, B. Stephenson, Argonne National Laboratory, Argonne,
IL
|
Thursday a.m.
(Evergreen C)
SESSION D-4 STRESS ANALYSIS I
Organized by: C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY
Co-chair: T.R. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN
XRD |
| 9:00 |
D037 |
IN SITU MEASUREMENT OF
GROWTH STRESS IN ALUMINA SCALE—Invited
E.D. Specht, P.F. Tortorelli, K.L. More, Oak Ridge National Laboratory,
Oak Ridge, TN
P. Zschack, University of Illinois at Urbana-Champaign, Argonne, IL |
|
9:30 |
D075 |
M.A.M. Bourke, Los Alamos National Laboratory, Los Alamos, NM |
|
10:00 |
D051 |
SHOCK-INDUCED DEFORMATION OF TUNGSTEN POWDER
D.W. Richards, M.P. Kramer, J.W. House, D.P. Shea, D.A.
Cunard, Air Force Research Laboratory, Eglin AFB, FL
R.J. De Angelis, University of Florida GERC, Shalimar, FL |
|
10:20 |
Break |
|
|
10:50 |
D053 |
RELAXATION OF RESIDUAL STRESS IN SHOT PEENED Ti-6Al-4V DUE TO
FRETTING FATIGUE
S.A. Martinez, S. Sathish, S. Mall, M.P. Blodgett, Air Force Research
Laboratory, Wright Patterson Air Force Base, OH |
|
11:10 |
D099 |
POWDER DIFFRACTION PATTERN OF ORIENTED MAGNETIC PARTICLES
INDUCED BY MAGNETIC FIELD
X. Luo, Fuzhou University, Fuzhou, China and East China Institute of
Technology, Jiangxi, China
S. Liu, Fuzhou University, Fuzhou, China |
|
11:30 |
D123 |
STRAIN EFFECTS IN THIN FILM / Si SUBSTRATES REVEALED BY X-RAY
MICRODIFFRACTION
C.E. Murray, I.C. Noyan, IBM, Yorktown Heights, NY
B. Lai, Z. Cai, Argonne National Laboratory, Argonne, IL |
|
11:50 |
D082 |
RESIDUAL STRESSES IN THIN TaNx/Ta BILAYERS: ORIGIN AND
EVOLUTION
K.J. Kozaczek, HyperNex, Inc., State College, PA
|
Thursday a.m.
(Evergreen D)
SESSION F-2 TXRF
Organized by: M.A. Zaitz, IBM, Hopewell Junction, NY
XRF |
| 9:00 |
F45 |
THE PERSPECTIVE OF TXRF
FOR ENVIRONMENTAL ANALYSIS—Invited
S. Török, J. Osán, KFKI Atomic Energy Research Institute, Budapest,
Hungary
B. Beckhoff, G. Ulm, Physikalisch-Technische Bundesanstalt, Berlin,
Germany
E. Curis, Laboratoire de Biomathématique, Faculté de Pharmacie, Paris,
France |
|
9:30 |
F36 |
FOCUSED BEAM TXRF SYSTEM USING DOUBLY CURVED CRYSTALS—Invited
Z.W. Chen, X-ray Optical Systems, Inc., East Greenbush, NY |
|
10:00 |
Break |
|
|
10:30 |
F04 |
CHARACTERIZATION OF URBAN AIR POLLUTION BY TOTAL REFLECTION
X-RAY FLUORESCENCE
M. Schmeling, Loyola University Chicago, Chicago, IL |
|
10:50 |
F09 |
TXRF ANALYSIS USING NANOLITER DROPLET METHODOLOGY IN
SEMICONDUCTOR APPLICATIONS
T.C. Miller, G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
C. Sparks, M. Beebe, International Sematech, Austin, TX |
|
11:10 |
F23 |
A NOVEL TXRF INSTRUMENTATION FOR CONTAMINATION CONTROL ON
300 mm SILICON WAFERS EMPLOYING SYNCHROTRON RADIATION
B. Beckhoff, R. Fliegauf, G. Ulm, J. Weser, Physikalisch-Technische
Bundesanstalt,
Berlin, Germany
T. Ehmann, L. Fabry, C. Mantler, S. Pahlke, Wacker Siltronic AG,
Burghausen,
Germany |
Thursday p.m.
(Evergreen A)
SESSION C-3 X-RAY OPTICS
Organized by: G.J. Havrilla, Los Alamos National Laboratory, Los Alamos,
NM
XRD & XRF |
| 1:30 |
F01 |
DEPTH SENSITIVE X-RAY
FLUORESCENCE ANALYSIS WITH X-RAY OPTICS— Invited
B. Kanngießer, W. Malzer, Technical University of Berlin, Berlin, Germany |
|
2:00 |
C12 |
X-RAY OPTICS: THE DRIVING FORCE OF NEW TECHNOLOGIES FOR X-RAY
ANALYSIS—Invited
N. Gao, D. Gibson, X-ray Optical Systems, Inc., East Greenbush, NY |
|
2:30 |
F26 |
STEREOVIEW ELEMENTAL X-RAY IMAGING
G.J. Havrilla, T.C. Miller, Los Alamos National Laboratory, Los Alamos, NM
R.W. Morton, K.G. Huntley, ConocoPhillips, Bartlesville OK |
|
2:50 |
C11 |
BEAM INTENSITY/DETECTOR CONFIGURATION OPTIMIZATION WITH
NUMERICAL METHODS
D. Kenning, KeyMaster Technologies, Kennewick, WA |
|
3:10 |
Break |
|
|
3:30 |
F27 |
ELEMENTAL IMAGING OF SEA URCHIN TOOTH
G.J. Havrilla, T.C. Miller, Los Alamos National Laboratory, Los Alamos, NM
S. Stock, Northwestern University, Chicago, IL |
|
3:50 |
D032 |
MICROFOCUSING SOURCE AND MULTILAYER OPTICS BASED SAXS CAMERA
L. Jiang, S. Seshadri, B. Verman, B. Kim, Y. Platonov, Osmic, Inc.,
Auburn Hills, MI |
|
4:10 |
D042 |
INTENSITY VS. RESOLUTION AND PEAK SHAPE IN X-RAY DIFFRACTION;
SINGLE AND DOUBLE GOEBEL MIRROR CONFIGURATIONS COMPARED TO STANDARD PARAFOCUSING OPTICS
E.J. Peterson, W.L. Hults, J.A. Valdez, Los Alamos National Laboratory,
Los Alamos, NM
H. Cordes, J.B. Litteer, Bruker AXS, Madison, WI |
|
4:30 |
D052 |
EVALUATION OF XRPD DATA FROM REFLECTION AND TRANSMISSION
GEOMETRY INSTRUMENTS WITH MULTILAYER AND CRYSTAL OPTICS EMPLOYING POINT AND POSITION-SENSITIVE DETECTORS
S.T. Misture, M.D. Dolan, NYS College of Ceramics at Alfred University,
Alfred, NY |
|
4:50 |
D083 |
THE ART OF X-RAY ANALYSIS OF ART: IDENTIFYING PAINT PIGMENTS IN
ANCIENT MASTERPIECES
J. te Nijenhuis, M.J. Fransen, PANalytical B.V., Almelo, The Netherlands
|
Thursday p.m.
(Evergreen C)
SESSION D-5 STRESS ANALYSIS II
Organized by: C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY
Co-chair: T.R. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN
XRD |
| 1:40 |
D029 |
X-RAY STRESS ANALYSIS
METHOD BASED ON LAUE SYMMETRIES FOR THIN FILMS
R. Yokoyama, J. Harada, Rigaku Corporation, Tokyo, Japan
K. Tanaka, Nagoya University, Nagoya, Japan |
|
2:00 |
D061 |
STRAIN RELAXATION CALCULATIONS AND ERROR ANALYSIS: HIGH
RESOLUTION X-RAY DIFFRACTION RECIPROCAL SPACE MAPS
E.D. Meserole, A.M. Noori, M.S. Goorsky, UCLA, Los Angeles, CA |
|
2:20 |
D077 |
COMPUTER SIMULATION OF DIFFRACTION TECHNIQUE APPLIED TO
MEASUREMENTS OF SURFACE STRESS GRADIENTS
J.T. Assis, V.I. Monine, S.A. Filippov, A. Merendaz, Rio de Janeiro State
University,
Rio de Janeiro, Brazil |
|
2:40 |
D085 |
SELFCONSISTENT DETERMINATION OF THE X-RAY ELASTIC STRESS FACTORS
OF POLYCRYSTALLINE MATERIALS FOR ARBITRARY CRYSTAL SYMMETRY AND GRAIN SHAPE
H. Wern, T. Brissier, M. Kreutzer, HTW des Saarlandes, Saarbrücken,
Germany |
|
3:00 |
D084 |
A NEW AND EFFICIENT METHOD TO DETERMINE STRAIN/STRESS DEPTH
PROFILES FROM DIFFRACTION EXPERIMENTS
H. Wern, Ch. Klein, HTW des Saarlandes, Saarbrücken, Germany |
|
3:20 |
Break |
|
|
3:40 |
D105 |
EFFECT OF BEAM DIVERGENCE ON STRAIN DATA FROM NEUTRON
DIFFRACTION
E. Üstündag, R.A. Karnesky, California Institute of Technology,
Pasadena, CA
I.C. Noyan, IBM, Yorktown Heights, NY
B. Clausen, Los Alamos National Laboratory, Los Alamos, NM
M.R. Daymond, Rutherford Appleton Laboratory, Oxon, United Kingdom
J.W. Richardson, Jr., Argonne National Laboratory, Argonne, IL |
|
4:00 |
D023 |
STRESS ERRORS ASSOCIATED WITH MINIATURIZATION OF PUSAI ASSEMBLY
X-RAY STRESS ANALYZER
T. Goto, Fukui University of Technology, Fukui, Japan |
|
4:20 |
C09 |
DEVELOPMENT OF A NEW POSITRON LIFETIME SPECTROSCOPY TECHNIQUE
FOR STRESS AND DEFECT CHARACTERIZATION IN THICK MATERIALS
F.A. Selim, D.P. Wells, J.F. Harmon, J. Kwofie, Idaho State University,
Idaho
Accelerator Center, Pocatello, ID |
|
4:40 |
D132 |
UPGRADES OF THE X-RAY AND NEUTRON DIFFRACTION RESIDUAL STRESS
MAPPING FACILITIES AT ORNL
C.R. Hubbard, T.R. Watkins, S. Spooner, S. Craig, M.C. Wright, Oak Ridge
National Laboratory, Oak Ridge, TN
|
Thursday
p.m. (Evergreen B)
SESSION D-6 INDUSTRIAL APPLICATIONS
Organized by: R.L. Snyder, Georgia Institute of Technology, Atlanta, GA
C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN
XRD |
| 1:30 |
D126 |
XRD FOR
INDUSTRY: SELECTED EXAMPLES FROM A SMALL PRIVATE LABORATORY—Invited
H.E. Goebel, Emeritus, Siemens AG, Munich,
Germany |
| 2:00 |
D072 |
X-RAY
DIFFRACTION AT DUPONT CENTRAL RESEARCH AND DEVELOPMENT— Invited
T.G. Amos, M.K. Crawford, Experimental Station,
DuPont Central R&D,
Wilmington, DE
W.E. Guise Jr., DuPont Central R&D, Advanced Photon Source, Argonne
National Laboratory, Argonne, IL |
| 2:30 |
D024 |
X-RAY
DIFFRACTION AND MORE AT GE GLOBAL RESEARCH CENTER—Invited
Y. Gao, GE Global Research Center, Niskayuna, NY
|
| 3:00 |
D059 |
ROCKING
CURVE ANALYSIS OF ZINC OXIDE THIN FILMS—Invited
G.R. Kowach, Bell Laboratories, Lucent
Technologies, Murray Hill, NJ |
| 3:30 |
Break |
|
| 3:50 |
D115 |
MATERIALS
CHARACTERIZATION USING A NOVEL SIMULTANEOUS NEAR INFRARED/X-RAY
DIFFRACTION INSTRUMENT
T. Blanton, C. Barnes, J. Putrelo, A. Yeboah, S.
Switalski, Eastman Kodak
Company, Rochester, NY |
| 4:10 |
D131 |
TEXTURE
MEASUREMENTS ON LONG-LENGTHS OF HIGH TEMPERATURE SUPERCONDUCTORS
J.L. Reeves, V. Selvamanickam, SuperPower Inc.,
Schenectady, NY
H. Huang, J. Burdett, X-Ray Optical Systems, East Greenbush, NY
R.L. Snyder, Georgia Institute of Technology, Atlanta, GA |
| 4:30 |
D014 |
A COMPARISON
OF NEW AND TRADITIONAL ROUTES FOR PROSTHETIC COATING FABRICATION
K.D. Rogers, S.E. Etok, Cranfield University,
Swindon, UK
R. Scott, Biomet-Merck, Swindon, Wiltshire, UK |
| 4:50 |
D133 |
X-RAY
DIFFRACTION AT IBM—Invited
C.C. Goldsmith, I.C. Noyan, IBM, Yorktown
Heights, NY |
Thursday
p.m. (Evergreen D)
SESSION F-3 QUANTITATIVE XRF
Organized by: J. Gilfrich, Emeritus, SFA, Inc./NRL, Bethesda, MD
Co-chair: W.T. Elam, University of Washington, Redmond, WA
XRF |
| 2:00 |
F03 |
QUANTITATIVE
ANALYSIS BY X-RAY INDUCED TOTAL ELECTRON YIELD (TEY) COMPARED TO XRFA—Invited
H. Ebel, Institut für Festkörperphysik, Vienna
University of Technology, Vienna,
Austria |
| 2:30 |
F51 |
CONSIDERATIONS
FOR OPTIMIZING PRECISION AND ACCURACY OF MULTILAYER THIN FILM MEASUREMENTS
BY EDXRF—Invited
A. Wittkopp, Thermo Noran, Middleton, WI |
| 3:00 |
F05 |
STANDARDLESS
FP ANALYSIS OF THIN FILMS AND MULTIPLE LAYER COATINGS
W.T. Elam, R.B. Shen, B. Scruggs, J. Nicolosi,
EDAX, Inc., Mahwah, NJ |
| 3:20 |
Break |
|
| 3:50 |
F25 |
IMPROVEMENTS
IN XRF SPECIMEN PREPARATION USING THE DRIED RESIDUE METHOD: GALLIUM IN
PLUTONIUM
C.G. Worley, Los Alamos National Laboratory, Los
Alamos, NM |
| 4:10 |
F37 |
HALF
ABSORBTION PEAK—A SPECTRAL ARTIFACT
D. Kenning, KeyMaster Technologies, Kennewick, WA |
For more
information please contact Denise Flaherty - flaherty@icdd.com
|
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