Thursday Sessions

 
Thursday a.m. (Evergreen A)
SESSION C-2 Detectors & Sources
Organized by: V.E. Buhrke, Consultant, Portola Valley, CA
XRD & XRF
9:00 F22 RECENT ADVANCES IN HIGH-RESOLUTION SOURCES AND HIGH-RESOLUTION DETECTORS FOR SOFT X-RAY FLUORESCENCE ANALYSIS: TXRF-NEXAFS AND STJs—Invited

B. Beckhoff, Physikalisch-Technische Bundesanstalt, Berlin, Germany

9:30 F44 IMPROVEMENTS IN LOW-POWER END-WINDOW TRANSMISSION-TARGET X-RAY TUBES

C. Jensen, S.D. Liddiard, A. Reyes-Mena, M. Moras, D.C. Turner, MOXTEK, Inc., Orem, UT
S.M. Elliott, Thin Film Consulting, Longmont, CO

9:50 C08 STATUS OF COMPACT AND PORTABLE LASER-COMPTON SCATTERING SOURCE AT THE IDAHO ACCELERATOR CENTER

K. Chouffani, D. Wells, F. Harmon, Y. Toyoda, Idaho Accelerator Center, Pocatello, ID
J. Jones, G. Lancaster, Idaho National Engineering and Environmental Laboratory, Idaho Falls, ID

10:00 Break
10:40 C04 STATE-OF-THE-ART SILICON DETECTORS FOR X-RAY SPECTROSCOPY

P. Lechner, R. Hartmann, P. Holl, H. Soltau, PNSensor GmbH, München, Germany
N. Meidinger, G. Schaller, F. Schopper, L. Strüder, MPI für Physik, München, Germany
G. Lutz, R.H. Richter, MPI für extraterrestrische Physik, Garching,
Germany

11:00 C05 SILICON DRIFT DETECTORS FOR HIGH RESOLUTION, HIGH COUNT RATE X-RAY SPECTROSCOPY AT ROOM TEMPERATURE

P. Lechner, H. Soltau, PNSensor GmbH, München, Germany
C. Fiorini, A. Longoni, Politecnico di Milano, Milano, Italy
G. Lutz, MPI für Physik, München, Germany
L. Strüder, MPI für extraterrestrische Physik, Garching, Germany

11:20 C13  1- AND 2-DIMENSIONAL DETECTION SYSTEMS AND THE PROBLEM OF SAMPLE FLUORESCENCE IN X-RAY DIFFRACTOMETRY

M.J. Fransen, A.C. Vermeulen, PANalytical, Almelo, The Netherlands

11:40 D111 A NEW “VORTEX” DETECTOR SYSTEM FOR X-RAY POWDER DIFFRACTOMETRY

G. Fuginawa, M. Kuribayashi, J. Harada, Rigaku Corporation, Tokyo, Japan
S. Barkan, J.S. Iwanczyk, B.E. Patt, L. Feng, C.R. Tull, Photon Imaging, Inc.,
Northridge, CA

12:00 C16 NOVEL, PHOTON COUNTING X-RAY DETECTORS—Invited

R.D. Durst, Y. Diawara, D. Khazins, S. Medved, B. Becker, T. Thorson, Bruker
AXS, Inc., Madison, WI

Thursday a.m. (Evergreen B)
SESSION D-3 SYNCHROTRON APPLICATIONS: X-RAY DIFFRACTION & SCATTERING
Organized by: C. Lavoie, IBM, Yorktown Heights, NY
Co-chair: S. Eisebitt, BESSY GmbH, Berlin, Germany
XRD
8:30 D071 COHERENT X-RAY SCATTERING ON MAGNETIC NANOSTRUCTURES—Invited

S. Eisebitt, BESSY GmbH, Berlin, Germany

9:00 D017 TEXTURE AND MICROSTRUCTURE ANALYSIS WITH HIGH-ENERGY
SYNCHROTRON RADIATION—Invited

H.J. Bunge, Technical University of Clausthal, Clausthal-Zellerfeld, Germany

9:30 D035 DEPTH RESOLVED STRAIN ANALYSIS OF LATERAL NANOSTRUCTURES PRODUCED BY FOCUSED Ga ION IMPLANTATION IN GaAs

J. Grenzer, U. Pietsch, Institut of Physics, University of Potsdam, Potsdam, Germany
B. Köhler, Fraunhofer Institute for Nondestructive Testing, Dresden, Germany

9:50 D107 MEASUREMENT OF STRAIN FIELDS AROUND DOMAINS IN BaTiO3 USING X-RAY MICRODIFFRACTION

R.C. Rogan, E. Üstündag, M. Motahari, California Institute of Technology, Pasadena, CA
N. Tamura, Lawrence Berkeley National Laboratory, Berkeley, CA

10:10 Break
10:30 D062 FATIGUE CRACK STUDY USING X-RAY PHASE CONTRAST AND MULTIPLE ANGLE STEREOMETRY METHODS

K. Ignatiev, Georgia Institute of Technology, Atlanta, GA
S.R. Stock, Northwestern University, Chicago, IL

10:50 D043 PHASE IDENTIFICATION AND SEQUENCE CHARACTERIZATION IN Ni-Si THIN FILMS AT LOW TEMPERATURE

C. Coia, P. Desjardins, École Polytechnique de Montréal, Montréal, Canada
C. Lavoie, C. Detavernier, IBM, T.J. Watson Research Center, Yorktown Heights, NY

11:10 D013 THE USE OF X-RAY SCATTERING FOR MEDICAL DIAGNOSIS

K.D. Rodgers, A. Round, Cranfield University, Swindon, U.K.
C.J. Hall, Synchrotron Radiation Dept., SRS, Cheshire, U.K.
R.A. Lewis, Monash University, Australia
A. Hufton, Christie Hospital, Manchester, U.K.

11:30 D060 SYNCHROTRON X-RAY PHASE RADIOGRAPHY AND ABSORPTION MICRO-CT OF REGENERATING NEWT LIMBS

S.R. Stock, M. Gradassi, H.G. Simon, Northwestern University, Chicago IL
K. Ignatiev, Georgia Institute of Technology, Atlanta GA
I. Smolsky, H. Tsuruta, Stanford Synchrotron Radiation Lab., Stanford CA
F. De Carlo, Advanced Photon Source, Argonne IL

11:50  C07  SYNCHROTRON APPLICATIONS IN ARCHAEOMETALLURGY: ANALYSIS OF HIGH ZINC BRASS ASTROLABES

B. Newbury, M. Notis, G.S. Cargill, III, Lehigh University, Bethlehem, PA
B. Stephenson, Adler Planetarium & Astronomy Museum, Chicago, IL
J. Almer, D. Haeffner, B. Stephenson, Argonne National Laboratory, Argonne, IL

Thursday a.m. (Evergreen C)
SESSION D-4 STRESS ANALYSIS I
Organized by: C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY
Co-chair: T.R. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN
XRD
9:00 D037 IN SITU MEASUREMENT OF GROWTH STRESS IN ALUMINA SCALE—Invited

E.D. Specht, P.F. Tortorelli, K.L. More, Oak Ridge National Laboratory,
Oak Ridge, TN
P. Zschack, University of Illinois at Urbana-Champaign, Argonne, IL

9:30 D075 M.A.M. Bourke, Los Alamos National Laboratory, Los Alamos, NM
10:00 D051  SHOCK-INDUCED DEFORMATION OF TUNGSTEN POWDER

D.W. Richards, M.P. Kramer, J.W. House, D.P. Shea, D.A. Cunard, Air Force Research Laboratory, Eglin AFB, FL
R.J. De Angelis, University of Florida GERC, Shalimar, FL

10:20 Break
10:50 D053 RELAXATION OF RESIDUAL STRESS IN SHOT PEENED Ti-6Al-4V DUE TO FRETTING FATIGUE

S.A. Martinez, S. Sathish, S. Mall, M.P. Blodgett, Air Force Research Laboratory, Wright Patterson Air Force Base, OH

11:10 D099 POWDER DIFFRACTION PATTERN OF ORIENTED MAGNETIC PARTICLES INDUCED BY MAGNETIC FIELD

X. Luo, Fuzhou University, Fuzhou, China and East China Institute of Technology, Jiangxi, China
S. Liu, Fuzhou University, Fuzhou, China

11:30 D123 STRAIN EFFECTS IN THIN FILM / Si SUBSTRATES REVEALED BY X-RAY MICRODIFFRACTION

C.E. Murray, I.C. Noyan, IBM, Yorktown Heights, NY
B. Lai, Z. Cai, Argonne National Laboratory, Argonne, IL

11:50 D082 RESIDUAL STRESSES IN THIN TaNx/Ta BILAYERS: ORIGIN AND EVOLUTION

K.J. Kozaczek, HyperNex, Inc., State College, PA

Thursday a.m. (Evergreen D)
SESSION F-2 TXRF
Organized by: M.A. Zaitz, IBM, Hopewell Junction, NY
XRF
9:00  F45 THE PERSPECTIVE OF TXRF FOR ENVIRONMENTAL ANALYSIS—Invited
S. Török, J. Osán, KFKI Atomic Energy Research Institute, Budapest, Hungary
B. Beckhoff, G. Ulm, Physikalisch-Technische Bundesanstalt, Berlin, Germany
E. Curis, Laboratoire de Biomathématique, Faculté de Pharmacie, Paris, France
9:30 F36 FOCUSED BEAM TXRF SYSTEM USING DOUBLY CURVED CRYSTALS—Invited
Z.W. Chen, X-ray Optical Systems, Inc., East Greenbush, NY
10:00 Break
10:30 F04 CHARACTERIZATION OF URBAN AIR POLLUTION BY TOTAL REFLECTION
X-RAY FLUORESCENCE
M. Schmeling, Loyola University Chicago, Chicago, IL
10:50 F09 TXRF ANALYSIS USING NANOLITER DROPLET METHODOLOGY IN
SEMICONDUCTOR APPLICATIONS
T.C. Miller, G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
C. Sparks, M. Beebe, International Sematech, Austin, TX
11:10 F23 A NOVEL TXRF INSTRUMENTATION FOR CONTAMINATION CONTROL ON
300 mm SILICON WAFERS EMPLOYING SYNCHROTRON RADIATION
B. Beckhoff, R. Fliegauf, G. Ulm, J. Weser, Physikalisch-Technische Bundesanstalt,
Berlin, Germany
T. Ehmann, L. Fabry, C. Mantler, S. Pahlke, Wacker Siltronic AG, Burghausen,
Germany

Thursday p.m. (Evergreen A)
SESSION C-3 X-RAY OPTICS
Organized by: G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
XRD & XRF
1:30 F01 DEPTH SENSITIVE X-RAY FLUORESCENCE ANALYSIS WITH X-RAY OPTICS— Invited

B. Kanngießer, W. Malzer, Technical University of Berlin, Berlin, Germany

2:00 C12 X-RAY OPTICS: THE DRIVING FORCE OF NEW TECHNOLOGIES FOR X-RAY ANALYSIS—Invited

N. Gao, D. Gibson, X-ray Optical Systems, Inc., East Greenbush, NY

2:30 F26 STEREOVIEW ELEMENTAL X-RAY IMAGING

G.J. Havrilla, T.C. Miller, Los Alamos National Laboratory, Los Alamos, NM
R.W. Morton, K.G. Huntley, ConocoPhillips, Bartlesville OK

2:50 C11 BEAM INTENSITY/DETECTOR CONFIGURATION OPTIMIZATION WITH
NUMERICAL METHODS

D. Kenning, KeyMaster Technologies, Kennewick, WA

3:10 Break
3:30 F27 ELEMENTAL IMAGING OF SEA URCHIN TOOTH

G.J. Havrilla, T.C. Miller, Los Alamos National Laboratory, Los Alamos, NM
S. Stock, Northwestern University, Chicago, IL

3:50 D032 MICROFOCUSING SOURCE AND MULTILAYER OPTICS BASED SAXS CAMERA

L. Jiang, S. Seshadri, B. Verman, B. Kim, Y. Platonov, Osmic, Inc.,
Auburn Hills, MI

4:10 D042  INTENSITY VS. RESOLUTION AND PEAK SHAPE IN X-RAY DIFFRACTION; SINGLE AND DOUBLE GOEBEL MIRROR CONFIGURATIONS COMPARED TO STANDARD PARAFOCUSING OPTICS

E.J. Peterson, W.L. Hults, J.A. Valdez, Los Alamos National Laboratory,
Los Alamos, NM
H. Cordes, J.B. Litteer, Bruker AXS, Madison, WI

4:30 D052 EVALUATION OF XRPD DATA FROM REFLECTION AND TRANSMISSION GEOMETRY INSTRUMENTS WITH MULTILAYER AND CRYSTAL OPTICS EMPLOYING POINT AND POSITION-SENSITIVE DETECTORS

S.T. Misture, M.D. Dolan, NYS College of Ceramics at Alfred University, Alfred, NY

4:50 D083 THE ART OF X-RAY ANALYSIS OF ART: IDENTIFYING PAINT PIGMENTS IN ANCIENT MASTERPIECES

J. te Nijenhuis, M.J. Fransen, PANalytical B.V., Almelo, The Netherlands

Thursday p.m. (Evergreen C)
SESSION D-5 STRESS ANALYSIS II
Organized by: C.C. Goldsmith, IBM Microelectronics, Hopewell Junction, NY
Co-chair: T.R. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN
XRD
1:40 D029 X-RAY STRESS ANALYSIS METHOD BASED ON LAUE SYMMETRIES FOR THIN FILMS

R. Yokoyama, J. Harada, Rigaku Corporation, Tokyo, Japan
K. Tanaka, Nagoya University, Nagoya, Japan

2:00 D061 STRAIN RELAXATION CALCULATIONS AND ERROR ANALYSIS: HIGH
RESOLUTION X-RAY DIFFRACTION RECIPROCAL SPACE MAPS

E.D. Meserole, A.M. Noori, M.S. Goorsky, UCLA, Los Angeles, CA

2:20 D077 COMPUTER SIMULATION OF DIFFRACTION TECHNIQUE APPLIED TO MEASUREMENTS OF SURFACE STRESS GRADIENTS

J.T. Assis, V.I. Monine, S.A. Filippov, A. Merendaz, Rio de Janeiro State University,
Rio de Janeiro, Brazil

2:40 D085 SELFCONSISTENT DETERMINATION OF THE X-RAY ELASTIC STRESS FACTORS OF POLYCRYSTALLINE MATERIALS FOR ARBITRARY CRYSTAL SYMMETRY AND GRAIN SHAPE

H. Wern, T. Brissier, M. Kreutzer, HTW des Saarlandes, Saarbrücken, Germany

3:00 D084 A NEW AND EFFICIENT METHOD TO DETERMINE STRAIN/STRESS DEPTH PROFILES FROM DIFFRACTION EXPERIMENTS

H. Wern, Ch. Klein, HTW des Saarlandes, Saarbrücken, Germany

3:20 Break
3:40 D105 EFFECT OF BEAM DIVERGENCE ON STRAIN DATA FROM NEUTRON
DIFFRACTION

E. Üstündag, R.A. Karnesky, California Institute of Technology, Pasadena, CA
I.C. Noyan, IBM, Yorktown Heights, NY
B. Clausen, Los Alamos National Laboratory, Los Alamos, NM
M.R. Daymond, Rutherford Appleton Laboratory, Oxon, United Kingdom
J.W. Richardson, Jr., Argonne National Laboratory, Argonne, IL

4:00 D023 STRESS ERRORS ASSOCIATED WITH MINIATURIZATION OF PUSAI ASSEMBLY X-RAY STRESS ANALYZER

T. Goto, Fukui University of Technology, Fukui, Japan

4:20 C09 DEVELOPMENT OF A NEW POSITRON LIFETIME SPECTROSCOPY TECHNIQUE FOR STRESS AND DEFECT CHARACTERIZATION IN THICK MATERIALS

F.A. Selim, D.P. Wells, J.F. Harmon, J. Kwofie, Idaho State University, Idaho
Accelerator Center, Pocatello, ID

4:40 D132 UPGRADES OF THE X-RAY AND NEUTRON DIFFRACTION RESIDUAL STRESS MAPPING FACILITIES AT ORNL

C.R. Hubbard, T.R. Watkins, S. Spooner, S. Craig, M.C. Wright, Oak Ridge National Laboratory, Oak Ridge, TN

Thursday p.m. (Evergreen B)
SESSION D-6 INDUSTRIAL APPLICATIONS
Organized by: R.L. Snyder, Georgia Institute of Technology, Atlanta, GA
C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN
XRD
1:30 D126 XRD FOR INDUSTRY: SELECTED EXAMPLES FROM A SMALL PRIVATE LABORATORY—Invited

H.E. Goebel, Emeritus, Siemens AG, Munich, Germany

2:00 D072 X-RAY DIFFRACTION AT DUPONT CENTRAL RESEARCH AND DEVELOPMENT— Invited

T.G. Amos, M.K. Crawford, Experimental Station, DuPont Central R&D,
Wilmington, DE
W.E. Guise Jr., DuPont Central R&D, Advanced Photon Source, Argonne National Laboratory, Argonne, IL

2:30 D024 X-RAY DIFFRACTION AND MORE AT GE GLOBAL RESEARCH CENTER—Invited

Y. Gao, GE Global Research Center, Niskayuna, NY
  

3:00 D059 ROCKING CURVE ANALYSIS OF ZINC OXIDE THIN FILMS—Invited

G.R. Kowach, Bell Laboratories, Lucent Technologies, Murray Hill, NJ

3:30 Break
3:50  D115 MATERIALS CHARACTERIZATION USING A NOVEL SIMULTANEOUS NEAR INFRARED/X-RAY DIFFRACTION INSTRUMENT

T. Blanton, C. Barnes, J. Putrelo, A. Yeboah, S. Switalski, Eastman Kodak
Company, Rochester, NY

4:10 D131 TEXTURE MEASUREMENTS ON LONG-LENGTHS OF HIGH TEMPERATURE SUPERCONDUCTORS

J.L. Reeves, V. Selvamanickam, SuperPower Inc., Schenectady, NY
H. Huang, J. Burdett, X-Ray Optical Systems, East Greenbush, NY
R.L. Snyder, Georgia Institute of Technology, Atlanta, GA

4:30 D014 A COMPARISON OF NEW AND TRADITIONAL ROUTES FOR PROSTHETIC COATING FABRICATION

K.D. Rogers, S.E. Etok, Cranfield University, Swindon, UK
R. Scott, Biomet-Merck, Swindon, Wiltshire, UK

4:50 D133 X-RAY DIFFRACTION AT IBM—Invited

C.C. Goldsmith, I.C. Noyan, IBM, Yorktown Heights, NY

Thursday p.m. (Evergreen D)
SESSION F-3 QUANTITATIVE XRF
Organized by: J. Gilfrich, Emeritus, SFA, Inc./NRL, Bethesda, MD
Co-chair: W.T. Elam, University of Washington, Redmond, WA
XRF
2:00 F03 QUANTITATIVE ANALYSIS BY X-RAY INDUCED TOTAL ELECTRON YIELD (TEY) COMPARED TO XRFA—Invited

H. Ebel, Institut für Festkörperphysik, Vienna University of Technology, Vienna,
Austria

2:30 F51 CONSIDERATIONS FOR OPTIMIZING PRECISION AND ACCURACY OF MULTILAYER THIN FILM MEASUREMENTS BY EDXRF—Invited

A. Wittkopp, Thermo Noran, Middleton, WI

3:00 F05 STANDARDLESS FP ANALYSIS OF THIN FILMS AND MULTIPLE LAYER COATINGS

W.T. Elam, R.B. Shen, B. Scruggs, J. Nicolosi, EDAX, Inc., Mahwah, NJ

3:20 Break
3:50 F25 IMPROVEMENTS IN XRF SPECIMEN PREPARATION USING THE DRIED RESIDUE METHOD: GALLIUM IN PLUTONIUM

C.G. Worley, Los Alamos National Laboratory, Los Alamos, NM

4:10 F37  HALF ABSORBTION PEAK—A SPECTRAL ARTIFACT

D. Kenning, KeyMaster Technologies, Kennewick, WA

 

 

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