47th Annual (1998) Denver X-ray Conference™
Wednesday Sessions, including Plenary Session
Wednesday, 5 August, 1998
Plenary - XRD & XRF - XRD - XRF
"XRD/XRF - Now What?"- Summit I, II & III - 8:30 a.m. – 12:00 noon
Chairs: M.A. Zaitz, IBM, Hopewell Junction, NY
R.L. Snyder, The Ohio State University, Columbus, OH8:30 Welcoming Remarks – Ron Jenkins, ICDD, Newtown Square, PA
Presentation of Awards
- 1998 Birks Award to Horst Ebel, Institut für Angewandte und Technische Physik, Technische Universität Wien, Austria - Presented by: John Gilfrich, SFA, Inc./NRL, Washington, DC
- Hanawalt Award to Herbert Göbel, Siemens AG, Germany - Presented by: Robert L. Snyder, The Ohio State University, Columbus, OH
Plenary Session Remarks –
Mary Ann Zaitz, IBM, Hopewell Junction, NY
Robert L. Snyder, The Ohio State University, Columbus, OH
The following are invited papers:
9:00 D-106 X-RAY Optics
E. Spiller, Spiller X-ray Optics, Mt. Kisco, NY9:40 F-13 Microcalorimeter EDS with 3 eV Energy Resolution
J. Martinis, D.A. Wollman, K.D. Irwin, G.C. Hilton, L.L. Dulcie and N.F. Bergren, National Institute of Standards and Technology, Boulder, CO10:20 Break
10:40 F-31 XRF Detection Limits: How Low Can We Go?
G. Havrilla, Los Alamos National Lab., Los Alamos, NM11:20 D-105 Synchrotron Applications of Powder Diffraction and X- ray Absorption Spectroscopy
R. Harlow, (representing the Braggnet Group) The DuPont Company, Wilmington, DE
XRD & XRF - Session, Wednesday p.m. (Learning Center)
Session C-1 Synchrotron Applications of XRD & XRF
Organized by: R. Harlow, E.I. DuPont De Nemours & Co., Wilmington, DE
M. Hart, National Synchrotron Light Source, Upton, NY2:00 F-67 Applications of Microfluorescence in Earth Sciences - Invited
M. Rivers, S.R. Sutton, P. Eng and M. Newville, University of Chicago, Chicago, IL2:30 D-26 Solving Crystal Structures of Inorganic, Organic and Coordination Compounds Using Synchrotron Powder Data – Invited
J.A. Kaduk, Amoco Corporation, Naperville, IL3:00 D-23 Material Characterization by Means of Synchrotron Excited KOSSEL- Interferences
H.-J. Ullrich, J. Bauch and J. Brechbühl, University of Technology Dresden, Germany3:20 Break
3:40 C-3 Microtomography – Invited
J.H. Dunsmuir, M. Zhou, Exxon Research & Engineering Co., Annandale, NJ, M. Amabile, A. Lanzillotto and T. Leu, Sarnoff Corporation, Princeton, NJ4:10 F-27 Advances in X-ray Computed Microtomography at the NSLS
B.A. Dowd, A.B. Andrews, R. Marr, D.P. Siddons, K.W. Jones and A. Peskin, Brookhaven National Laboratory, Upton, NY4:30 D-109 Characterization of Strain in Thin Metal Films with Microdiffraction – Invited
J.L. Jordan-Sweet, I.C. Noyan, E.G. Liniger, S.K. Kaldor, IBM Research Division, Yorktown Heights, NY and P.-C. Wang, IBM Microelectronics Division, East Fishkill, NY5:00 D-41 Mapping of Residual Stress using the Microbeam Diffraction at the Advanced Photon Source, Argonne National Laboratory
Z. Cai, Y. Xu, W. Yun, B. Lai and J. Maser, Argonne National Laboratory, Argonne, ILXRD & XRF - Session, Wednesday p.m. (Summit I)
Session C-2 Developments in Detectors for X-ray Analysis
Organized by: J. Martinis, National Institute of Standards and Technology, Boulder, CO
T. Blanton, Eastman Kodak Company, Rochester, NY2:00 F-64 The X-ray Fluorescence Detector System Used on the Mars Pathfinder Mission – Invited
J.A. Pantazis, A.C. Huber, AMPTEK, Inc., Bedford, MA and T. Economou, University of Chicago, Chicago, IL2:30 D-55 The Use of CCD Detectors for X-ray Diffraction – Invited
R.D. Durst, C. Campana, B. He and J. Phillips, Bruker AXS, Inc., Madison, WI3:00 D-63 Characterization and Correction of Non-Uniform Count Rate Across an INEL CPS 120 Position-Sensitive Detector
S.J. Chipera and D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM3:20 Break
3:50 F-12 High-Resolution X-ray Detectors Based on Superconducting Tunnel Junctions for EDXRF and Microanalysis Applications – Invited
M. Frank, C.A. Mears, S.E. Labov, L.J. Hiller, S. Friedrich, M.A. Lindeman, H. Netel, D. Chow, B. Niderost, Lawrence Livermore National Laboratory, Livermore, CA and A.T. Barfknecht, Conductus, Inc., Sunnyvale, CA4:20 D-53 XRD Applications of Multiple, Flexible Fiber-optic Arrays Directly Coupled to Image Intensified CCD's
D.S. Kurtz, K.J. Kozaczek and P. Moran, HyperNex, Inc., State College, PA4:40 D-68 Measuring Diffraction of Synchrotron Radiation with a CCD Detector
J. Phillips, U. Preckwinkel, Bruker AXS, Inc., Madison, WI, Y.J. Lee, C. Cahil, J. Parisi, SUNY Stony Brook and D. Cox, Brookhaven National LaboratoryXRD: Session, Wednesday p.m. (Freemont)
Session D-1 Residual Stresses
Organized by: V. Hauk, RWTH Aachen, Germany
P. Predecki, University of Denver, Denver, CO2:00 D-25 Structural and Residual Stress Analysis by X-ray Diffraction on Polymeric Materials and Composits – Invited
V. Hauk, RWTH Aachen, Germany2:30 D-52 Accessing the Elastic Properties of Materials with Diffraction Methods
T. Gnäupel-Herold, National Institute of Standards and Technology, Gaithersburg, MD and University of Maryland, MD, P.C. Brand and H.J. Prask, National Institute of Standards and Technology, Gaithersburg, MD2:50 D-59 Measuring Residual Stress Versus Residual Strain
P. Rangaswamy and M.B. Prime, Los Alamos National Laboratory, Los Alamos, NM3:10 Break
3:30 D-87 X-ray Analysis of the Mechanical State of a Nickel Based Multicrystal on the Mesoscopic Scale: Role of the Grain Orientation and its Boundary
F. Eberl and J.L. Lebrun, LM3-ENSAM Paris, France3:50 D-99 Analysis by X-ray Diffraction of the Mechanical Behaviour of Austenitic and Ferritic Phases of a Cast Duplex Stainless Steel
L. Meirdi, J.L. Lebrun, LM-3 ENSAM Paris, France and K. Inal, ENSAM Metz-4, France4:10 D-34 X-ray Residual Stress Measurement Configuration by Computer Simulation
B. He, Bruker AXS, Inc., Madison, WI4:30 D-35 Advantages of Using 2D Detectors for Residual Stress Measurements
B. He, U. Preckwinkel and K.L. Smith, Bruker AXS, Inc., Madison, WIXRD: Session, Wednesday p.m. (Summit III)
Session D-2 Diffraction Applications
Organized by: D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA
R. Barton, DuPont Experimental Station, Wilmington, DE2:00 D-85 Determining the Crystallite Size Distribution and Kinetic Growth Parameter q * of a Material by Profile Fitting
B. York, IBM Materials Laboratory, San Jose, CA2:20 D-17 An INVESTIGATION of X-ray Line Profiles from Sintered and Powdered Reference Materials Using a Fundamental Parameters Convolution Procedure
R.W. Cheary, B.K. Gan and M. Berkahn, University of Technology Sydney, Australia2:40 D-64 X-ray Diffraction Signatures of Defects in Nanocrystalline Materials
J.D. Makinson, J.S. Lee, S.H. Magner, R.J. De Angelis and W.N. Weins, University of Nebraska, Lincoln, NE3:00 D-56 Comparison Between Orientation-Dependent Stored Energy of Cold Rolled and Stress Relieved Interstitial Free Steel
N. Rajmohan, J.A. Szpunar, McGill University, Canada, Y. Hayakawa, Kawasaki Steel Corporation, Japan and J.H. Root, Atomic Energy of Canada Limited, Canada3:20 Break
3:40 D-27 Use of ODF Data to Quantitatively Describe Fiber Textures
W.F. Hosford, J. O’Brien, University of Michigan, Ann Arbor, MI, J. House, Air Force Research Laboratory, Eglin AFB, FL and R. De Angelis, University of Nebraska, Lincoln, NE4:00 D-31 Quantitative Description of Fiber Textures in Cubic Metals
R. De Angelis, T. Snyder, University of Nebraska, Lincoln, NE, J. House, Air Force Research Laboratory, Eglin AFB, FL and W. Hosford, University of Michigan, Ann Arbor, MI4:20 D-60 Avoiding Non-Random Orientation of Powdered Polycrystalline Materials
A. Cabeza, E.R. Losilla, H.S. Martínez-Tapia, A. Jiménez-Morales, S. Bruque and M.A.G. Aranda, Universidad de Málaga, Spain4:40 D-91 Correlation of Near Surface Morphology of Polypropylene and Paint Adhesion Studied by Grazing Incidence X-ray Diffraction
A.R. Drews, D.F. Mielewski and H.K. Plummer, Ford Research Laboratory, Dearborn, MIXRF: Session, Wednesday p.m. (Summit II)
Session F-1 Application of XRF to the Analysis of Thin Films
Organized by: R. Wilson, Rigaku/USA, Inc., Danvers, MA
M. Madden, Intel Corp., Santa Clara, CA2:00 F-25 Thin Film Density Determination by Multiple Radiation Energy Dispersive X-ray Reflectivity
D. Windover, CIEEM, Rensselaer Polytechnic Institute, Troy, NY and S.L. Lee, US Army ARDEC, Benét Laboratories, Watervliet, NY2:20 F-18 BST Thin Film Evaluation Using X-ray Fluorescence and Reflectivity Method
M. Funahashi, M. Kuraoka, Fujimura, H. Kohno, Rigaku Industrial Corporation, Japan and R. Wilson, Rigaku/USA, Inc., Danvers, MA2:40 F-57 Development of an XRF Metrology Method for Composition and Thickness of Barium Strontium Titanate Thin Films
T. Remmel and D. Werho, Motorola, Inc., Tempe, AZ3:00 F-53 High-Sensitivity EDXRF Analysis of Angstrom Level Ultrathin Films
D. Kloos, Veeco Instruments, Ronkonkoma, NY3:20 Break
3:50 F-28 Sample Preparation Limitations in Trace Element Analysis Quantification Using Micro-X-ray Fluorescence
L. Colletti and G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM4:10 F-34 Layer Thickness and Homogeneity by Micro X-ray Fluorescence Analysis
M. Haschke, W. Scholz, A. Wittkopp, Röntgenanalytik Messtechnik GmbH, Germany, J. Nicolosi and B. Scruggs, EDAX Inc., Mahwah, NJ4:30 F-37 Novel Approach for Determination of Material Density Using Surface Propagating X-rays
K. Hayashi, J. Kawai, T. Horiuchi and K. Matsushige, Kyoto University, Japan
