47th Annual  (1998) Denver X-ray Conference™
Antlers Doubletree Hotel
Colorado Springs, CO

August 3-7, 1998

98

47th Annual Denver X-ray Conference™
1998 Denver X-ray Conference™ Program Information

Program-At-A-Glance


Monday Workshops
Monday, August 3, 1998
am - XRD & XRF - XRD - XRF
pm - XRD & XRF - XRD - XRF
a.m. workshops: 9:00 a.m. – 12:00 noon
p.m. workshops: 2:00 p.m. – 5:00 p.m.


Workshops, Monday a.m.

XRD & XRF:

W-1 Specimen Preparation I: Methods in XRD & XRF (Summit III)

Chairs & Instructors: V. Buhrke, The Buhrke Co., Portola Valley, CA, R. Jenkins, ICDD, Newtown Square, PA and D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA. Invited contributions will also be given by M. Tuff, Garratt-Callahan, Millbrae, CA, D. Bruton, Construction Technologies, Skokie, IL, V. Kocman, Domtar Research Center, Canada and F. Feret, Arvida Research & Development Centre, Canada

For more than a decade, workshops on specimen preparation techniques for XRF and XRD have been an important part of the Denver X-ray Conference™. The demand to repeat and expand these specimen preparation workshops continues to grow and the Conference Organizing Committee is pleased to offer the workshop again. The three instructor/organizers listed above have been involved in the specimen preparation workshops since their inception, and just last year, they published a book which covers most of the relevant material. Additional specialized contributions will be given by invited instructors.

XRD:

W-2 The Design, Alignment, Calibration and Performance Characteristics of the Conventional Laboratory Diffractometer (Summit I & II)

Chairs & Instructors: J.P. Cline, National Institute of Standards and Technology, Gaithersburg, MD and R.W. Cheary, University of Technology Sydney, New South Wales, Australia

This workshop will discuss the basic design features of the conventional laboratory powder diffractometer and how to realize optimal performance through proper alignment and selection of optical components, i.e., divergence slits, sollar slits, etc. Various alignment procedures will be discussed with consideration given to the consequences of misalignment and mis-setting of components. Instrument calibration and performance will be evaluated through the use of NIST Standard Reference Materials and simulation of line profiles.

XRF:

W-3 XRF Standards (Learning Center)

Chairs & Instructors: G.R. Brammer, Brammer Standards Company, Inc., Houston, TX, J. Gilfrich, SFA, Inc./NRL, Washington, DC, Z. Mao, National Research Center for Certified Reference Materials, China, J. Heagney, Micromatter, Deer Harbor, WA and T.E. Gills, National Institute of Standards and Technology, Gaithersburg, MD

This workshop will describe the kinds of standards which are available for quantifying XRF analysis. The instructors’ organizations have sources of certified reference materials as well as other types of standards which can be used both for calibrating instruments and for testing accuracy of analysis.

Workshops, Monday p.m.

XRD & XRF:

W-4 Specimen Preparation II: Methods in XRD & XRF (Summit III)

Continuation of W-1

XRD:

W-5 Use of Total Pattern Fitting for Quantitative Phase Analysis (Summit I & II)

Chairs & Instructors: H. Toraya, Nagoya Institute of Technology, Japan, D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA and J.A. Kaduk, Amoco Corporation, Naperville, IL

This workshop is intended to focus on the applications of whole-powder pattern fitting techniques to the quantitative phase analysis of multi-component samples. Three pattern fitting techniques are introduced: the Rietveld method, the whole-powder-pattern decomposition (WPPD) method, and the method based on the observed pattern fitting. If we have structural models of all component materials, the Rietveld method may be straightforward. When we are missing structural information, the WPPD approach may be powerful. For speed and simplicity, the observed pattern fitting approach may prove equally effective for production quantitative analysis. Basic ideas of these techniques will be presented, and accuracy and precision will be discussed.

W-6 Reflectometry for Surface and Thin-Film Characterization (Freemont)

Chairs & Instructors: T.C. Huang, Consultant/IBM, San Jose, CA, R.L. Snyder, The Ohio State University, Columbus, OH, H.E. Göbel, Siemens AG, Germany and B. Lengeler, Institute of Physics, RWTH Aachen, Germany

The workshop covers the theoretical background, instrumental techniques and data evaluation of specular and diffuse X-ray reflectivity from flat surfaces and thin films. Applications from microelectronic and glass industries show the capability of this non-destructive technique to measure film thicknesses, densities and roughnesses. Comparative results with more common techniques (Ellipsometry, RBS, AFM) are shown.

XRF:

W-7 Working Close to Detection Limits: XRF (Learning Center)

Chairs & Instructors: J. Sieber, National Institute of Standards and Technology, Gaithersburg, MD, B. Holynska, University of Mining & Metallurgy, Poland, L. Currie, National Institute of Standards and Technology, Gaithersburg, MD and R. Van Grieken, University of Antwerp, Belgium The workshop will be focused on the fundamentals of trace analysis by X-ray fluorescence. The difficulties and advantages of the method will be pointed out in relation to each analytical version of XRF technique: WDXRF, EDXRF and TXRF. The organizers intend to encourage the participants to open discussion on the problems they have in their analytical practice.  

 

 

 

Tuesday Workshops
Tuesday, August 4, 1998
am - XRD & XRF - XRD - XRF
pm - XRD & XRF - XRD - XRF
a.m. workshops: 9:00 a.m. – 12:00 noon
p.m. workshops: 2:00 p.m. – 5:00 p.m.


Workshops, Tuesday a.m.

XRD & XRF:

W-8 Principles and Use of Microdiffraction & Microfluorescence I (Summit III)

Chairs & Instructors: M. Eatough, Sandia National Laboratory, Albuquerque, NM, R. Tissot, Sandia National Laboratory, Albuquerque, NM, D. Carpenter, Oak Ridge Centers for Manufacturing Tech., Oak Ridge, TN, P. DeHaven, IBM, Hopewell Junction, NY, K. Evans-Lutterodt, Lucent Technologies, Murray Hill, NJ, G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, R.P. Goehner, Sandia National Laboratory, Albuquerque, NM and J. Jordan-Sweet, IBM Research Division, Upton, NY

This full day workshop will cover an overview of microdiffraction and microfluorescence applications, instrumentation and new developments. The workshop will cover a full scope of methods from using in lab sources to synchrotron radiation as well as diffraction in the scanning electron microscope.

XRD:

W-9 Conclusions from the Intensity Round Robin: XRD (Summit I & II)

Chairs & Instructors: R. Jenkins, ICDD, Newtown Square, PA, D. Taylor, Emeritus, Pilkington Technology Centre, England and D. Rafaja, Charles University, Czech Republic

With the increasing interest in the use of fully digitized powder patterns for quantitative analysis, several years ago, ICDD established a program for the archiving of such data. Since these data were, and still are, being obtained using different types of diffractometers, and in different laboratories, the question arose as to how to calibrate the data. In order to quantify answers relating to the general problem of the variability in diffractometer sensitivity, an Intensity Round Robin was designed based on the use of corundum (SRM 1976). The round robin was run first in the US, with some overseas participation, then subsequently in the UK and the Czech Republic. Nearly 200 data sets were obtained from these tests. This workshop will present conclusions from these tests, and typical sources of error in comparative intensity measurements will be discussed. In practical exercises, the influence of such effects as detector dead-time, step size and smoothing, choice of divergence slits, surface roughness and micro-absorption in the specimen, and use of thin specimens will be covered.

XRF:

W-10 Applications of TXRF (Learning Center)

Chairs & Instructors: P. Wobrauschek, Atominstitut of the Austrian Universities, Austria, P. Pianetta, Stanford University, Stanford, CA, C. Streli, Atominstitut of the Austrian Universities, Austria and B. Vrebos, Philips Analytical, The Netherlands

Total reflection XRF is an extremely sensitive spectrochemical technique for ultra trace element analysis, and has found applications in the field of environmental contaminants, medical research and, in particular, is almost ideal in the nondestructive analysis of surface impurities on Si wafers. Another challenging application is the characterization of thin layers on a substrate, or the depth profiling below the surface. The instrumental requirements for TXRF (including the light elements), the necessary environment for the experiments, and the data evaluation and interpretation procedures will be presented and discussed.

Workshops, Tuesday p.m.

XRD & XRF:

W-11 Principles and Use of Microdiffraction & Microfluorescence II (Summit III)

Continuation of W-8

XRD:

W-12 Diffractometer Optics (Summit I & II)

Chairs & Instructors: I.C. Noyan, IBM Research Division, Yorktown Heights, NY, C.C. Goldsmith, IBM Microelectronics Division, Hopewell Junction, NY and T.L. Nunes, IBM Microelectronics Division, Hopewell Junction, NY

In this workshop, we will investigate the effect of specimen displacement on the accuracy of the lattice parameters and residual stresses measured with various diffractometer optics and discuss the relative merits of various extrapolation parameters.

W-13 High Temperature XRD (Freemont)

Chairs & Instructors: C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN, S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY and E.A. Payzant, Oak Ridge National Laboratories, Oak Ridge, TN

Experimental techniques for high temperature, atmosphere-controlled powder diffraction will be covered in detail, including temperature measurement and control, specimen mounting, and detector arrangements. Data analysis approaches to eliminate systematic diffraction angle errors and provide accurate structural data will be presented, along with illustrative applications of the in-situ method.

XRF:

W-14 Quantitative Techniques and Errors in XRF (Learning Center)

Chairs & Instructors: J. Anzelmo, Bruker AXS, Inc., Madison, WI, R. Jenkins, ICDD, Newtown Square, PA and K. Mauser, Bruker AXS GmbH, Germany
This workshop will discuss the philosophy of algorithm selection for processing intensities into concentrations and the errors associated with those techniques. There will also be a discussion of errors in general.

 

XRF Poster Session
TXRF - XRF Instrumentation and Techniques - Applications of XRF
Monday, 3 August, 1998
(Summit I, II & III)
(6:30 p.m. – 8:30 p.m., authors present)
The XRF Poster Session will be held in conjunction with the Bruker AXS, Inc. mixer.

Chairs: H. Ebel, Technische Universität Wien, Austria
P. Wobrauschek, Atominstitut of the Austrian Universities, Austria
Session chairs will select the three best papers for awards.


TXRF:

F-1 Analysis of Silicon Carbide Using Total Reflection X-ray Fluorescence (TXRF)
D. Werho and T. Wetteroth, Motorola, Inc., Mesa, AZ

F-44 Use of Multiple Reflection Method in TXRF
M.A. Kumakhov, Institute for Roentgen Optics, Russia

F-23 Suppression of Spurious Peaks Appearing on TXRF Spectra
S. Terada and K. Nishihagi, Technos Co., Ltd., Japan

F-4 Thin Film Sorbents for TXRF Analysis
A.P. Morovov, L.D. Danilin, V.V. Zhmailo, Yu. V. Ignat'ev, A.E. Lakhtikov, V.V. Nazarov, M.G. Vasin, V.V. Chulkov and V.N. Funin, RFNC-VNIIEF, Russia

F-68 SR-TXRF of low Z-Elements - Applications and Results
C. Streli, P. Wobrauschek, P. Kregsamer, H. Gatterbauer, R. Görgl, Atominstitut of the Austrian Universities, Austria, P. Pianetta, Stanford University, Stanford, CA, S. Pahlke, L. Fabry, Wacker SILTRONIC, Germany, L. Palmetshofer, University of Linz, Austria, M. Schmeling, University of Antwerp, Belgium and L. Brehm, DOW Chemical, Midland, MI

XRF Instrumentation and Techniques:

F-2 Wide Angle Geometry EDXRF Spectrometers with Secondary Target Mode
B. Yokhin, Jordan Valley AR, Israel

F-66 High Resolution X-ray Detectors based on Al/AlxOy/Al Tunnel Junctions and Superconducting Ir/Au Phase Transition Thermometers
J. Höhne, M. Altmann, G. Angloher, P. Hettl, J. Jochum, T. Nüßle, S. Pfnür, M.L. Sarsa, J. Schnagl, S. Wänninger and F.v. Feilitzsch, Technical University Munich, Germany

F-26 On The Energy Dependence of the Detector Efficiency of a Si-PIN Diode
H. Ebel, M. Mantler, S. Saxinger, R. Svagera, B. Wernsperger, Technische Universität Wien, Austria, P. Wobrauschek, Atominstitut der Österreichischen Universitäten, Austria and A.C. Huber, AMPTEK, Inc., Bedford, MA

F-50 Chemin: A Miniaturized CCD-Based Instrument for Simultaneous X-ray Diffraction (XRD) and X-ray Fluorescence (XRF) Analysis
D.L. Bish, D.T. Vaniman, S.J. Chipera, Los Alamos National Laboratory, Los Alamos, NM, S.A. Collins, T. Elliott, Jet Propulsion Lab, Pasadena, CA and D.F. Blake, NASA Ames Research Center, Moffett Field, CA

F-61 The Detection of Long Wavelength X-rays Using Synthetic Multilayer Analyzers
T. Arai and T. Shoji, Rigaku Industrial Corp., Japan

F-62 Ultra Soft X-ray Spectrometer for Compact Synchrotron Radiation Source
J. Tsuji, K. Taniguchi, Osaka Electro-Communication University, Japan and S. Ikeda, Ritsumeikan University, Japan

F-55 X-ray Energy Loss Spectrometry - A Possibility
H.D. Pandey, Steel Authority of India Limited, India

F-47 XEFS and EXEFS
J. Kawai and K. Hayashi, Kyoto University, Japan

F-51 Considerations on the Detection Limit of TEY (total electron yield)
M. Ebel, H. Ebel and R. Svagera, Technische Universität Wien, Austria

Applications of XRF:

F-21 Analysis of Major and Minor Elements in Gold Jewelry by XRF Modified Proportional Factor Method
C. Yuanpan, W. Hua and Y. Zhongping, China National Nonferrous Metals Industry Corporation, China

F-3 Applications of Micro XRF for Analysis of Japanese Traditional Glass and Artifacts
K. Sugihara, M. Satoh, Seiko Instruments, Inc., Japan, Y. Hayakawa, Tokyo National Research Institute of Cultural Properties, Japan, A. Saito, Science University of Tokyo, Japan and T. Sasaki, Tokyo National Museum, Japan

F-22 Principles of Modified Proportional Factor Method in XRF Analysis
C. Yuanpan, W. Hua and Y. Zhongping, China National Nonferrous Metals Industry Corporation, China

F-36 Analysis of Metal Alloys by EDXRF, Its Accuracy and Reliability
V.I. Smolniakov and I.A. Koltoun, Russian Academy of Sciences (PNPI RAS), Russia

F-35 Experimental Investigations of Possibilities of High-Accuracy Analysis
V.I. Smolniakov and I.A. Koltoun, Russian Academy of Sciences (PNPI RAS), Russia, I.K. Fadeeva, Nord-West Assay Office of the Russian Federation, Russia and G.I. Popovets, AAC "Minresursexpertiza" (MINEX), Russia

F-24 Accuracy in Rapid, Routine Standardless WDXRF Analysis of Loose Powders
R.F. Hamilton, Air Products and Chemicals, Inc., Allentown, PA

F-59 Influence of Surface Roughness on the Angle Resolved Total X-ray Reflection Fluorescence of Thin Films
C. Weiss, S. Taeubert, E. Zschech, AMD, Germany, T. Hossain, AMD, Austin, TX and H.-J. Ullrich, TU Dresden, Germany

F-32 XRF Analysis of Fused Beads: A Unified Calibration Method for Various Dilutions and Fluxes
M. Banzhaf and K. Mauser, Bruker AXS, GmbH, Germany

 

XRD Poster Session
Non Ambient XRD - Stress - XRD Instrumentation - XRD Applications - Crystal Structures
Tuesday, 4 August , 1998
(Summit I, II & III)
(6:30 p.m. – 8:30 p.m., authors present)
The XRD Poster Session will be held in conjunction with the MDI and Rigaku/USA mixer.

Chairs: D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA
T.N. Blanton, Eastman Kodak Company, Rochester, NY
Session chairs will select the three best papers for awards.


Non Ambient XRD:

D-94 Thermal Characterization of a High Temperature XRD Furnace
E.A. Payzant and H. Wang, Oak Ridge National Laboratory, Oak Ridge, TN

D-93 Use of Low Temperature XRD to Study Phase Transitions During Freeze-Drying of Aqueous Mannitol Solutions
R.K. Cavatur and R. Suryanarayanan, University of Minnesota, Minneapolis, MN

D-37 High Temperature XRD Under Controlled Relative Humidity: Application in the Investigation of a Pharmaceutical Solid- State Reaction
S.K. Rastogi, R. Suryanarayanan, University of Minnesota, MN and M. Zakrzewski, Philips Analytical, The Netherlands

D-44 Phase Formation of the Pb-2223 High Temperature Superconductor in the (Bi, Pb)-Sr-Ca-Cu-O System
W. Wong-Ng and L.P. Cook, National Institute of Standards and Technology, Gaithersburg, MD

Stress:

D-7 An Improved Method for Analysis of Dislocation Densities in Heavily Deformed and Irradiated HCP Metals
R.D. Sage, J.E. Winegar and M. Griffiths, Chalk River Laboratories, Canada

D-76 X-ray Stress Measurement of Sintered Fe-Cr/TiN Composites
T. Sasaki, S. Takago, Y. Hirose, Kanazawa University, Japan and M. Miyano, RIKEN Corporation, Japan

D-77 A Study of Fatigue Fracture Mechanism with Shot-Peened Material
S. Takahashi, Y. Hirose, Kanazawa University, Japan and M. Hashimoto, Sumitomo Heavy Industries LTD, Japan

D-8 Effects of Thermal Cycles on Residual Stress for Nitrided and Sulphonitrided Hot Work Die Steel (SKD61)
K. Yatsushiro, M. Hihara, Yamanashi Industrial Technology Center, Japan, K. Okada, S. Yabuuchi, Yamanashi University, Japan and M. Kuramoto, Polytechnic University, Japan

D-10 Measurements of Residual Stresses in Micron Regions by Using Synchrotron Excited KOSSEL-Diffraction
J. Brechbühl, J. Bauch and H.-J. Ullrich, TU Dresden, Germany

D-9 Further Applications of KOSSEL-Technique by Means of Synchrotron Beam Excitation
J. Bauch, J. Brechbühl, H.-J. Ullrich, TU Dresden, Germany

D-75 X-ray Fractographic Study of Sintered Fe-Cr steel/TiN System Composite Materials
S. Takago, T. Sasaki, Y. Hirose, Kanazawa University, Japan and M. Miyano, RIKEN Corporation, Japan

D-50 A Direct Algorithm for Solving III-Conditioned Linear Algebraic Systems
X.J. Xue, S.K. Kurtz, The Pennsylvania State University, University Park, PA, K.J. Kozaczek and D.S. Kurtz, HyperNex, Inc., State College, PA

XRD Instrumentation:

F-39 Experimental Investigation of Kumakhov Polycapillary Lenses
S.V. Nikitina, N.S. Ibraimov, Institute for Roentgen Optics, Russia and V.Ya. Schovkoun, Kurchatov Institute of Atomic Energy, Russia

D-74 Proposal of Method to Make Pole Figure Using Imaging Plate
T. Goto, T. Sasaki, Y. Hirose, Kanazawa University, Japan and S. Nagasima, formerly Yokohama National University, Japan

D-78 Laterally Graded Multilayer Mirrors
J. Pedulla, J. Pedulla and Associates, Silver Spring, MD, S.M. Owens and R.D. Deslattes, National Institute of Standards and Technology, Gaithersburg, MD

D-96 An Electrochemical Cell for In-Situ X-ray Characterization
M. Rodriguez, D. Ingersoll and D.H. Doughty, Sandia National Laboratories, Albuquerque, NM

D-3 Using Guinier Films to get Intensity Data Files
N.O. Ersson, Uppsala University, Sweden

D-113 Diffraction-, Fluorescence-, and Phase Contrast Imaging with Micrometer Resolution at the ESRF Beamline ID22
M. Drakopoulus, C. Raven, A. Simionovici, I. Snigireva and A. Snigirev, ESRF, France

XRD Applications:

D-4 X-ray Diffraction Studies of the PbO-SrO System
W. Wong-Ng, J.P. Cline, L.P. Cook, National Institute of Standards and Technology, Gaithersburg, MD and W. Greenwood, University of Maryland, College Park, MD

D-111 Dynamic In Situ X-ray Characterization of High Tech- Alloys
M. Haller and R.L. Snyder, The Ohio State University, Columbus, OH

D-5 Optical and XRD Screening of SiC Substrates
E. Fantner, T. Ryan, Philips Analytical, Mahwah, NJ and I. Ferguson, Emcore Corporation, Somerset, NJ

D-6 Application of X-ray Diffraction in Evaluating the Fate of Environmental Contaminants
D. Frank and B. Zavala, U.S. Environmental Protection Agency, Seattle, WA

D-40 In-situ Diffraction Study of Brownmillerite-Type Mixed Conductors
S.A. Speakman and S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY

D-61 Characterization of Metal Benzotriazoles and Related Polymers
S.J. Wasson, U.S. Environmental Protection Agency, Research Triangle Park, NC, M.C. Kerzic, J.W. Hall, Wingate University, Wingate, NC, M.A. Cates and J.R. Wasson, Advanced Materials, New Hill, NC

D-102 Quantitative X-ray Diffractometry and Structural Analysis of Magnesium Titanate Mixtures Using The Rietveld Refinement
G. Kimmel and J. Zabicky, Ben-Gurion University of the Negev, Israel

D-80 An XRD Morphology Index for Talcs
H.J. Holland and M.J. Murtagh, Corning Incorporated, Corning, NY

D-108 An Increment Method for Quantitative X-ray Diffraction Phase Analysis of Samples Containing Amorphous Material
G. Chu, Fushun Petroleum Institute, P.R. China

D-81 Accurate Texture Measurements on Highly Textured Materials Using Single Line Rocking Curves
M. Vaudin, National Institute of Standards and Technology, Gaithersburg, MD

D-65 GT-XTRA Website: Georgia Tech X-ray Diffraction Teaching Resource Archive
C. Bradford, D.Y. Chiang, M.A. Davidson, J.D. Haase, M.A. Langøy, T.A. Polley and S. Stock, Georgia Institute of Technology, Atlanta, GA

Crystal Structures:

D-2 Rietveld Crystal Structure Refinement for a Natural Specimen of the Mineral Chromite
D. Makuyana and B. O'Connor, Curtin University of Technology, Australia

D-1 Crystal Structures and Reference X-ray Powder Patterns of Ba4Ti10Al2O27, Ba4Ti11MgO27 and Ba4Ti11ZnO27
J.A. Kaduk, Amoco Corporation, Naperville, IL, B.H. Toby, W. Wong-Ng, National Institute of Standards and Technology, Gaithersburg, MD and W. Greenwood, University of Maryland, College Park, MD

D-79 Ab Initio Synchrotron Powder Structures of Metal Phosphonates
A. Cabeza, M.A.G. Aranda and S. Bruque, Universidad de Málaga, Spain

D-29 Microstructure of Clay-Polymer Composites T.N. Blanton, D. Majumdar and S.M. Melpolder, Eastman Kodak Company, Rochester, NY

Wednesday Sessions, including Plenary Session
Wednesday, 5 August, 1998
Plenary - XRD & XRF - XRD - XRF


"XRD/XRF - Now What?"- Summit I, II & III  - 8:30 a.m. – 12:00 noon
Chairs: M.A. Zaitz, IBM, Hopewell Junction, NY
R.L. Snyder, The Ohio State University, Columbus, OH

8:30 Welcoming Remarks – Ron Jenkins, ICDD, Newtown Square, PA

Presentation of Awards

  • 1998 Birks Award to Horst Ebel, Institut für Angewandte und Technische Physik, Technische Universität Wien, Austria - Presented by: John Gilfrich, SFA, Inc./NRL, Washington, DC
  • Hanawalt Award to Herbert Göbel, Siemens AG, Germany  - Presented by: Robert L. Snyder, The Ohio State University, Columbus, OH

Plenary Session Remarks –
Mary Ann Zaitz, IBM, Hopewell Junction, NY
Robert L. Snyder, The Ohio State University, Columbus, OH


The following are invited papers:

9:00 D-106 X-RAY Optics
E. Spiller, Spiller X-ray Optics, Mt. Kisco, NY

9:40 F-13 Microcalorimeter EDS with 3 eV Energy Resolution
J. Martinis, D.A. Wollman, K.D. Irwin, G.C. Hilton, L.L. Dulcie and N.F. Bergren, National Institute of Standards and Technology, Boulder, CO

10:20 Break

10:40 F-31 XRF Detection Limits: How Low Can We Go?
G. Havrilla, Los Alamos National Lab., Los Alamos, NM

11:20 D-105 Synchrotron Applications of Powder Diffraction and X- ray Absorption Spectroscopy
R. Harlow, (representing the Braggnet Group) The DuPont Company, Wilmington, DE


XRD & XRF - Session, Wednesday p.m. (Learning Center)

Session C-1 Synchrotron Applications of XRD & XRF
Organized by: R. Harlow, E.I. DuPont De Nemours & Co., Wilmington, DE
M. Hart, National Synchrotron Light Source, Upton, NY

2:00 F-67 Applications of Microfluorescence in Earth Sciences - Invited
M. Rivers, S.R. Sutton, P. Eng and M. Newville, University of Chicago, Chicago, IL

2:30 D-26 Solving Crystal Structures of Inorganic, Organic and Coordination Compounds Using Synchrotron Powder Data – Invited
J.A. Kaduk, Amoco Corporation, Naperville, IL

3:00 D-23 Material Characterization by Means of Synchrotron Excited KOSSEL- Interferences
H.-J. Ullrich, J. Bauch and J. Brechbühl, University of Technology Dresden, Germany

3:20 Break

3:40 C-3 Microtomography – Invited
J.H. Dunsmuir, M. Zhou, Exxon Research & Engineering Co., Annandale, NJ, M. Amabile, A. Lanzillotto and T. Leu, Sarnoff Corporation, Princeton, NJ

4:10 F-27 Advances in X-ray Computed Microtomography at the NSLS
B.A. Dowd, A.B. Andrews, R. Marr, D.P. Siddons, K.W. Jones and A. Peskin, Brookhaven National Laboratory, Upton, NY

4:30 D-109 Characterization of Strain in Thin Metal Films with Microdiffraction – Invited
J.L. Jordan-Sweet, I.C. Noyan, E.G. Liniger, S.K. Kaldor, IBM Research Division, Yorktown Heights, NY and P.-C. Wang, IBM Microelectronics Division, East Fishkill, NY

5:00 D-41 Mapping of Residual Stress using the Microbeam Diffraction at the Advanced Photon Source, Argonne National Laboratory
Z. Cai, Y. Xu, W. Yun, B. Lai and J. Maser, Argonne National Laboratory, Argonne, IL

XRD & XRF - Session, Wednesday p.m. (Summit I)

Session C-2 Developments in Detectors for X-ray Analysis
Organized by: J. Martinis, National Institute of Standards and Technology, Boulder, CO
T. Blanton, Eastman Kodak Company, Rochester, NY

2:00 F-64 The X-ray Fluorescence Detector System Used on the Mars Pathfinder Mission – Invited
J.A. Pantazis, A.C. Huber, AMPTEK, Inc., Bedford, MA and T. Economou, University of Chicago, Chicago, IL

2:30 D-55 The Use of CCD Detectors for X-ray Diffraction – Invited
R.D. Durst, C. Campana, B. He and J. Phillips, Bruker AXS, Inc., Madison, WI

3:00 D-63 Characterization and Correction of Non-Uniform Count Rate Across an INEL CPS 120 Position-Sensitive Detector
S.J. Chipera and D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM

3:20 Break

3:50 F-12 High-Resolution X-ray Detectors Based on Superconducting Tunnel Junctions for EDXRF and Microanalysis Applications – Invited
M. Frank, C.A. Mears, S.E. Labov, L.J. Hiller, S. Friedrich, M.A. Lindeman, H. Netel, D. Chow, B. Niderost, Lawrence Livermore National Laboratory, Livermore, CA and A.T. Barfknecht, Conductus, Inc., Sunnyvale, CA

4:20 D-53 XRD Applications of Multiple, Flexible Fiber-optic Arrays Directly Coupled to Image Intensified CCD's
D.S. Kurtz, K.J. Kozaczek and P. Moran, HyperNex, Inc., State College, PA

4:40 D-68 Measuring Diffraction of Synchrotron Radiation with a CCD Detector
J. Phillips, U. Preckwinkel, Bruker AXS, Inc., Madison, WI, Y.J. Lee, C. Cahil, J. Parisi, SUNY Stony Brook and D. Cox, Brookhaven National Laboratory

XRD: Session, Wednesday p.m. (Freemont)

Session D-1 Residual Stresses
Organized by: V. Hauk, RWTH Aachen, Germany
P. Predecki, University of Denver, Denver, CO

2:00 D-25 Structural and Residual Stress Analysis by X-ray Diffraction on Polymeric Materials and Composits – Invited
V. Hauk, RWTH Aachen, Germany

2:30 D-52 Accessing the Elastic Properties of Materials with Diffraction Methods
T. Gnäupel-Herold, National Institute of Standards and Technology, Gaithersburg, MD and University of Maryland, MD, P.C. Brand and H.J. Prask, National Institute of Standards and Technology, Gaithersburg, MD

2:50 D-59 Measuring Residual Stress Versus Residual Strain
P. Rangaswamy and M.B. Prime, Los Alamos National Laboratory, Los Alamos, NM

3:10 Break

3:30 D-87 X-ray Analysis of the Mechanical State of a Nickel Based Multicrystal on the Mesoscopic Scale: Role of the Grain Orientation and its Boundary
F. Eberl and J.L. Lebrun, LM3-ENSAM Paris, France

3:50 D-99 Analysis by X-ray Diffraction of the Mechanical Behaviour of Austenitic and Ferritic Phases of a Cast Duplex Stainless Steel
L. Meirdi, J.L. Lebrun, LM-3 ENSAM Paris, France and K. Inal, ENSAM Metz-4, France

4:10 D-34 X-ray Residual Stress Measurement Configuration by Computer Simulation
B. He, Bruker AXS, Inc., Madison, WI

4:30 D-35 Advantages of Using 2D Detectors for Residual Stress Measurements
B. He, U. Preckwinkel and K.L. Smith, Bruker AXS, Inc., Madison, WI

XRD: Session, Wednesday p.m. (Summit III)

Session D-2 Diffraction Applications
Organized by: D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA
R. Barton, DuPont Experimental Station, Wilmington, DE

2:00 D-85 Determining the Crystallite Size Distribution and Kinetic Growth Parameter q * of a Material by Profile Fitting
B. York, IBM Materials Laboratory, San Jose, CA

2:20 D-17 An INVESTIGATION of X-ray Line Profiles from Sintered and Powdered Reference Materials Using a Fundamental Parameters Convolution Procedure
R.W. Cheary, B.K. Gan and M. Berkahn, University of Technology Sydney, Australia

2:40 D-64 X-ray Diffraction Signatures of Defects in Nanocrystalline Materials
J.D. Makinson, J.S. Lee, S.H. Magner, R.J. De Angelis and W.N. Weins, University of Nebraska, Lincoln, NE

3:00 D-56 Comparison Between Orientation-Dependent Stored Energy of Cold Rolled and Stress Relieved Interstitial Free Steel
N. Rajmohan, J.A. Szpunar, McGill University, Canada, Y. Hayakawa, Kawasaki Steel Corporation, Japan and J.H. Root, Atomic Energy of Canada Limited, Canada

3:20 Break

3:40 D-27 Use of ODF Data to Quantitatively Describe Fiber Textures
W.F. Hosford, J. O’Brien, University of Michigan, Ann Arbor, MI, J. House, Air Force Research Laboratory, Eglin AFB, FL and R. De Angelis, University of Nebraska, Lincoln, NE

4:00 D-31 Quantitative Description of Fiber Textures in Cubic Metals
R. De Angelis, T. Snyder, University of Nebraska, Lincoln, NE, J. House, Air Force Research Laboratory, Eglin AFB, FL and W. Hosford, University of Michigan, Ann Arbor, MI

4:20 D-60 Avoiding Non-Random Orientation of Powdered Polycrystalline Materials
A. Cabeza, E.R. Losilla, H.S. Martínez-Tapia, A. Jiménez-Morales, S. Bruque and M.A.G. Aranda, Universidad de Málaga, Spain

4:40 D-91 Correlation of Near Surface Morphology of Polypropylene and Paint Adhesion Studied by Grazing Incidence X-ray Diffraction
A.R. Drews, D.F. Mielewski and H.K. Plummer, Ford Research Laboratory, Dearborn, MI

XRF: Session, Wednesday p.m. (Summit II)

Session F-1 Application of XRF to the Analysis of Thin Films
Organized by: R. Wilson, Rigaku/USA, Inc., Danvers, MA
M. Madden, Intel Corp., Santa Clara, CA

2:00 F-25 Thin Film Density Determination by Multiple Radiation Energy Dispersive X-ray Reflectivity
D. Windover, CIEEM, Rensselaer Polytechnic Institute, Troy, NY and S.L. Lee, US Army ARDEC, Benét Laboratories, Watervliet, NY

2:20 F-18 BST Thin Film Evaluation Using X-ray Fluorescence and Reflectivity Method
M. Funahashi, M. Kuraoka, Fujimura, H. Kohno, Rigaku Industrial Corporation, Japan and R. Wilson, Rigaku/USA, Inc., Danvers, MA

2:40 F-57 Development of an XRF Metrology Method for Composition and Thickness of Barium Strontium Titanate Thin Films
T. Remmel and D. Werho, Motorola, Inc., Tempe, AZ

3:00 F-53 High-Sensitivity EDXRF Analysis of Angstrom Level Ultrathin Films
D. Kloos, Veeco Instruments, Ronkonkoma, NY

3:20 Break

3:50 F-28 Sample Preparation Limitations in Trace Element Analysis Quantification Using Micro-X-ray Fluorescence
L. Colletti and G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM

4:10 F-34 Layer Thickness and Homogeneity by Micro X-ray Fluorescence Analysis
M. Haschke, W. Scholz, A. Wittkopp, Röntgenanalytik Messtechnik GmbH, Germany, J. Nicolosi and B. Scruggs, EDAX Inc., Mahwah, NJ

4:30 F-37 Novel Approach for Determination of Material Density Using Surface Propagating X-rays
K. Hayashi, J. Kawai, T. Horiuchi and K. Matsushige, Kyoto University, Japan

 

Thursday Sessions
Thursday, 6 August, 1998
am - XRD & XRF - XRD - XRF
pm - XRD & XRF - XRD - XRF


XRD & XRF: Session, Thursday a.m. (Summit I)

Session C-3 Recent Advances in X-ray Optics I
Organized by: C. MacDonald, University at Albany, SUNY, Albany, NY
Co-Chair to be announced

8:30 D-100 Improved Multilayer Optics and XRD Applications – Invited
C. Michaelsen, GKSS Research Center, Germany and H. Göbel, Siemens AG, Germany

9:00 C-1 Applications of Polycapillary Optics to Diffraction and Fluorescence – Invited
W.M. Gibson and C. MacDonald, University of Albany, SUNY, Albany, NY

9:30 C-2 Refractive X-ray Lenses – Invited
B. Lengeler, M. Richwin, C. Schroer, J. Tümmler, Institute of Physics, RWTH Aachen, Germany, A. Snigirev and I. Snigireva, European Synchrotron Radiation Facility, France

10:00 Break

10:30 D-47 The Use of a Multi-fiber Polycapillary X-ray Collimating Optic for General Purpose Powder Diffraction
S. Bates, Kratos Analytical Inc., Chestnut Ridge, NY, Q. Xiao and P. Bly, X-ray Optical Systems Inc., Albany, NY

10:50 D-90 Applications of New X-ray Optical Components in Materials Research
V. Kogan, Philips Analytical, The Netherlands and T. Ryan, Philips Analytical Mahwah, NJ

11:10 D-32 Evaluation of Parallel Beam Multilayer Optics for Powder Diffractometers
S.T. Misture, S. Zdzieszynski, New York State College of Ceramics at Alfred University, Alfred, NY and R. Smith, Osmic, Inc., Troy, MI

11:30 D-43 Confocal Graded d-spacing Multilayer Beam Conditioning Optics
B. Verman, L. Jiang, B. Kim, R. Smith and N. Grupido, Osmic, Inc., Troy, MI
 

XRD & XRF: Session, Thursday a.m. (Summit III)

Session C-4 Recent Developments in Instrumentation & Data Treatment I
Organized by: V. Buhrke, The Buhrke Co., Portola Valley, CA
B. Vrebos, Philips Analytical, Almelo, The Netherlands

9:00 F-30 Correction of Matrix Effects in XRF Analysis
F. Claisse, Corporation Scientifique Claisse, Canada

9:20 F-15 Adaptive Strategies for Enhancing Light-Element Analysis Using a Sequential Wavelength-Dispersive Analyzer, Including the Use of the Background- Fundamental Parameter Method and Integrated Intensity
I. Klotzko and J.P. Groven, Kratos Analytical Inc., Chestnut Ridge, NY

9:40 F-6 Innovations in WDXRF Software and Methodology
H.A. van Sprang, Philips Research Labs, The Netherlands

10:00 Break

10:30 F-49 Use of a High Resolution Si Drift Chamber in a X-ray Polarization Optical System
J. Heckel, P. Klinger and R. Schramm, SPECTRO Analytical Instruments, Germany

10:50 F-52 A New Fluorescent X-ray Source for Monoenergetic Radiation
D.V. Rao, The Abdus Salam International Centre for Theoretical Physics and Universita di Sassari, Italy, R. Cesareo, Universita di Sassari, Italy and G.E. Gigante, Universita di Roma "La Sapienza", Italy

11:10 F-19 SR-XRF on Geoarchaeological Samples from Ancient Turkey
E. Friedman, T.J. Wilkinson, K.A. Yener, University of Chicago, Chicago, IL, C.E. Johnson, B. Lai, G. Jennings, S.M. Mini, E.E. Alp, Argonne National Laboratory, Argonne, IL, Y. Sato, Argonne National Laboratory, Argonne, IL and University of Tokyo, Japan and A. Alatas, Argonne National Laboratory, Argonne, IL and Illinois Institute of Technology, Chicago, IL

11:30 F-46 Local Atomic Image of 0.02% Zn in GaAs wafer Using X-ray Fluorescence Holography
K. Hayashi, T. Yamamoto, J. Kawai, Kyoto University, Japan, M. Suzuki, S. Goto, SPring-8, Japan, S. Hayakawa and Y. Gohshi, University of Tokyo, Japan
 
XRD: Session, Thursday a.m. (Freemont)

Session D-3 Thin Films I: Orientation, Stress, Thickness
Organized by: I.C. Noyan, IBM, Yorktown Heights, NY
D. Rafaja, Charles University, Czech Republic

8:30 D-13 First Observation of Anisotropic In-Plane Texture in Co Recording Media – Invited
K. Omote and J. Harada, Rigaku Corporation, Japan

9:00 D-30 Texture Analysis of MgO Thin Films on Crystalline and Amorphous Substrates
R.J. Kennedy and P.A. Stampe, Florida A&M University, Tallahassee, FL

9:20 D-22 Texture Determination in Highly Stressed PVD Thin Films
P. Scardi, M. Leoni and Y.H. Dong, University of Trento, Italy

9:40 D-98 Equipment and Methods for Texture Analysis in Thin Films
J.A. Szpunar, H. Li, M. Glavicic and P. Blandford, McGill University, Canada

10:00 Break

10:30 D-38 Texture Analysis in Thin Films Using an Area Detector
U. Preckwinkel, K. Smith, B. He, Bruker Analytical X-ray Systems, Inc., Madison, WI, B. Schey and B. Stritzker, Universitaet Augsburg, Germany

10:50 D-19 Residual Stress Determination with XRD in Sputter Deposited MnZn Ferrite Films
K. van den Aker, J. Daams, J. Donkers, Philips Centre for Manufacturing Technology and M. Gillies, Philips Research, The Netherlands

11:10 D-95 Piezoelectric Characterization of Pb(Mg1/3Nb2/3)O3-PbTiO3 (70/30) Epitaxial Thin Films Using In-Situ X-ray Diffraction
T. Watkins and E.A. Payzant, Oak Ridge National Laboratory, Oak Ridge, TN, J-P. Maria and S. Trolier-McKinstry, The Pennsylvania State University, University Park, PA
 

XRD: Session, Thursday a.m. (Learning Center)

Session D-4 Innovative Applications of Rietveld Analysis
Organized by: R.A. Young, Georgia Institute of Technology, Atlanta, GA
D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM

9:00 D-16 New Developments in Microstructure Analysis via Rietveld Refinement – Invited
A. Le Bail, Université du Maine, France

9:30 D-45 The Certification of SRMs 1878a and 1879a for Analysis of Quartz and Cristobalite Content
J.P. Cline, National Institute of Standards and Technology, Gaithersburg, MD and R.B. Von Dreele, Los Alamos National Laboratory, Los Alamos, NM

9:50 D-18 Separation and Quantification of Amorphous Phases Using the Rietveld Full Pattern Analysis of Some Industrial Semi-crystalline Materials
P. Riello, P. Canton and G. Fagherazzi, Università di Venezia, Italy

10:10 Break

10:40 D-33 Texture by Rietveld Refinement – Invited
D. Balzar, National Institute of Standards and Technology, Boulder, CO

11:10 D-24 The Contribution of Powder Diffraction Methods to Structural Coordination Chemistry
N. Masciocchi and A. Sironi, Università di Milano, Italy

11:30 D-97 Quantitative Analysis of the Phase Transformations in Nanocrystalline Materials Via Rietveld Refinement
X. Bokhimi, A. Morales, O. Novaro, The National University of Mexico, Mexico, T. López, R. Gómez, Universidad Autónoma Metropolitana Iztapalapa, Mexico and A. García-Ruiz, The National Polytechnic Institute (IPN), Mexico

11:50 D-21 Relaxor Perovskite Ferroelectrics: Structural Aspects of Diffuse Phase Transitions
S.A. Ivanov, Karpov' Institute of Physical Chemistry, Russia, N.W. Thomas, S. Ananta, University of Leeds, United Kingdom, R. Tellgren and H. Rundlof, University of Uppsala, Sweden

XRF: Session, Thursday a.m. (Summit II)

Session F-2 Practical Problems in XRF I
Organized by: V. Kocman, Domtar Research Center, Canada
F. Feret, Arvida Research & Development Centre, Canada

9:00 F-69 Reliable Analysis of Silicates – Invited
T. Ahmedali, McGill University, Montreal, Canada

9:30 F-8 Comparison of Preparation and Analysis Methods for Small Rock Samples
R. Harmel, O. Haupt, M. Schäfer and W. Dannecker, University of Hamburg, Germany

9:50 F-11 Logical Steps in the Automated Lachance XRF Matrix Correction Method Utilizing an Electronic Spreadsheet
A.J. Klimasara, OSRAM SYLVANIA Development, Inc., Beverly, MA

10:10 Break

10:40 F-10 How is Superb Repeatability (r) Transformed to Good Reproducibility (R) in Routine Analysis of High Alloy Steel by XRF? – Invited
B. Larsson, AB Sandvik Steel, Sweden

11:10 F-42 Comparison Between Wavelength Dispersive and Energy Dispersive X-ray Fluorescence Spectrometry for the Determination of Additive and Trace Elements in Lubricants
M. Van Driessche, Texaco Technology Gent, Belgium

XRD & XRF: Session, Thursday p.m. (Summit I)

Session C-5 Recent Advances in X-ray Optics II
Organized by: H. Göbel, Siemens AG, Germany
W.M. Gibson, University at Albany, SUNY, Albany, NY

2:00 D-71 Development of X-ray Microfocus Tubes for Diffraction and Imaging Applications
G. Fraser, Bede Scientific Instruments Limited, United Kingdom

2:20 F-20 Monochromators for Ti-La , C-Ka , B-Ka and Li-Ka Radiation Lines
Y. Platonov, J. Rodriguez, L. Gomez, D. Broadway, Osmic, Inc., Troy, MI and N. Salashchenko, IPM RAS, Russia

2:40 F-38 Using Arc Curvature Matrix to Modelise the Behavior of X-ray Lenses. Example of a square X-ray Lens
J. Berlu, Commissariat á l’Energie Atomique, France

3:00 Break

3:30 F-43 Development of X-ray Polycapillary Optics
M.A. Kumakhov, Institute for Roentgen Optics, Russia

3:50 D-84 Polycapillary X-ray Lenses
V. Kogan and J. Bethke, Philips Analytical, The Netherlands

4:10 F-40 Parametric X-ray Radiation in X-ray Tubes: Theoretical Consideration
I.D. Feranchuk, Byelorussian State University, Belarus, A. Ulyanenkov, Byelorussian State University, Belarus and Rigaku Corporation, Japan, N. Osaka, K. Omote and J. Harada, Rigaku Corporation, Japan
 

XRD & XRF: Session, Thursday p.m. (Summit III)

Session C-6 Recent Developments in Instrumentation & Data Treatment II
Organized by: G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
B. O’Connor, Curtin University of Technology, Australia

2:00 D-83 Differential Evolution: An Evolution Strategy for Genetic Algorithms for Universal Curve and Parameter Fitting and Refinement Applied to Powder Diffraction and Fresnel Reflectivity Profiles
D.H. Howell and R.A. Clapp, Diffraction Technology Pty Ltd, Australia

2:20 D-86 Scientific Collaboration Over the Internet at Neutron and X-ray Beamlines
M.C. Wright and C.R. Hubbard, Oak Ridge National Laboratory, Oak Ridge, TN

2:40 D-88 Extracting Peak-Height d-I Data From Rietveld Analyses for the Powder Diffraction File
D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA and R.A. Young, Georgia Institute of Technology, Atlanta, GA

3:00 D-51 Evolution of Powder Diffraction Databases and Search/Match Schemes
J. Faber, R. Jenkins, F. Needham and C. Weth, International Centre for Diffraction Data, Newtown Square, PA

3:20 Break

3:40 D-72 Characterization of Surfaces and Thin Films by Unique Resolution XRD Methods
T. Kinefuchi, K. Endo, T. Kikuchi, K. Inaba, R. Yokoyama, T. Ozawa, K. Omote and J. Harada, Rigaku Corporation, Japan

4:00 D-101 Automatic Diffraction Systems for Industrial Quality Control
A. Haase, Rich. Seifert & Co., Germany

4:20 D-42 Reverse Geometry X-ray Diffraction Method
W.P. Dubé, D.W. Fitting, T.A. Siewert, National Institute of Standards and Technology, Boulder, CO and R. Albert, Digiray Inc., San Ramon, CA

4:40 D-46 Status of the Development of SRM 640c
J.P. Cline, R.D. Deslattes, J. Staudenmann, E.G. Kessler, Jr., L.T. Hudson and A. Henins, National Institute of Standards and Technology, Gaithersburg, MD

XRD: Session, Thursday p.m. (Freemont)

Session D-5 Thin Films II: Orientation, Stress, Thickness
Organized by: T.C. Huang, Consultant/IBM, San Jose, CA
P. Scardi, University of Trento, Italy

2:00 D-54 Modeling of X-ray Diffraction Stress Analysis in Metallic Interconnects with Sharp Fiber Textures
X.J. Xue, S.K. Kurtz, The Pennsylvania State University, University Park, PA, K.J. Kozaczek and D.S. Kurtz, HyperNex, Inc., State College, PA

2:20 D-49 Estimation of Residual Stresses in Polycrystalline Aluminum and Copper Interconnects with Chi-square Fitting
X.J. Xue, S.K. Kurtz, The Pennsylvania State University, University Park, PA, K.J. Kozaczek and D.S. Kurtz, HyperNex, Inc., State College, PA

2:40 D-73 Temperature Resolved Evaluation of Residual Stresses in an a -Al2O3 Scale Using Parallel Beam X-ray Diffraction
M. Groß, V. Kolarik, W. Engel, Fraunhofer Institute für Chemische Technologie, Germany and L. Singheiser, Forschungszentrum Jülich GmbH, Germany

3:00 F-9 Investigation of the Interfacial Structure of Ultra-Thin Platinum Films Using X-ray Reflectivity
D.M. Solina, R.W. Cheary, S. Dligatch, G.M. McCredie, P. Lynch and P. Swift, University of Technology Sydney, Australia

3:20 Break

3:40 D-15 X-ray Reflectivity and Diffuse Scattering from Thin SiO2 Films on Si Substrate
A. Ulyanenkov, K. Omote and J. Harada, Rigaku Corporation, Japan

4:00 D-14 New Methods for Reflectivity/Diffraction Studies of Thin Films
T. Kikuchi and J. Harada, Rigaku Corporation, Japan

4:20 D-36 High Resolution X-ray Diffraction and Photoluminescence Correlation as an Accurate and Nondestructive Evaluation Technique for PHEMT Structures
A. Torabi, S.K. Brierley, P.S. Lyman, W.E. Quinn and W.E. Hoke, Raytheon Microelectronics Center, Andover, MA

4:40 D-20 Grazing Incidence X-ray Diffraction from Semiconductor Quantum Wires
A. Ulyanenkov, University of Potsdam, Germany and Institute for Nuclear Problems, Belarus, T. Baumbach, Fraunhofer Institut für Zerstörungsfreie Prüfverfahren, Germany, N. Darowski and U. Pietsch, University of Potsdam, Germany , K. H. Wang and A. Forchel, University of Würzburg, Germany

5:00 D-12 Thin Films Characterization by Synchrotron X-ray Micro- Diffraction Using Grazing Exit Conditions
T. Noma, Canon Research Center, Japan and A. Iida, Photon Factory, Institute of Materials Structure Science, Japan

XRD: Session, Thursday p.m. (Learning Center)

Session D-6 Impact of Rietveld Analysis & Use of Calculated Patterns in Quantitative Phase
Analysis
Organized by: R.L. Snyder, The Ohio State University, Columbus, OH
R. Jenkins, ICDD, Newtown Square, PA

1:30 D-89 Quantitative Analysis of Complex Mixtures Using Fully Digitized Patterns – Invited
D.K. Smith, Emeritus and G.G. Johnson, Jr., The Pennsylvania State University, University Park, PA

2:00 D-62 The Role of Rietveld Analysis in Full-Pattern Fitting Methods – Invited
D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM

2:30 D-110 Calculated Three-Dimensional X-ray Diffraction Patterns of Small and Disordered Crystals – Invited
R.C. Reynolds, Dartmouth College, Hanover, NH

3:00 D-104 Reference Intensity Ratios – Invited
Q. Johnson and R.S. Zhou, Materials Data, Inc., Livermore, CA

3:30 Break

3:50 D-48 Identification of Unknown Polycrystalline Phases in Wavelet Space Using Full Pattern PDF Reference Files
S. Bates, Kratos Analytical Inc., Chestnut Ridge, NY

4:10 D-69 Quantitative XRD Analysis of Coal Combustion By- Products by the Rietveld Method II. Testing with Standard Mixtures
R.S. Winburn, B.R. Jarabek, D.G. Grier and G.J. McCarthy, North Dakota State University, Fargo, ND

4:30 D-28 Influence of Refinement Strategy on Rietveld Phase Composition Determinations
B. O'Connor and D. Li, Curtin University of Technology, Australia

4:50 D-11 Routine Quantitative Phase Analysis of Niobium-bearing Lateritic Ores
D. Kampata, J. Naud and P. Sonnet, Université Catholique de Louvain, Belgium

5:10 D-57 Accuracy in the Quantitative Phase Analysis of a - and b -Si3N4: Error Estimation and Round Robin
H. Toraya and S. Hayashi, Nagoya Institute of Technology, Japan

XRF: Session, Thursday p.m. (Summit II)

Session F-3 Practical Problems in XRF II
Organized by: T. Harding, Spectrace Instruments, Inc., Fort Collins, CO
S. Piorek, Metorex, Inc., Ewing, NJ

2:00 F-70 Pushing the Detection Limites in Sychrotron TXRF – Invited
P. Pianetta, Stanford University, Stanford, CA

2:30 F-71 Practical Detection Limit in XRF Analysis – Invited
Y. Gohshi, National Institute for Environmental Studies, Japan

3:00 Break

3:30 F-60 On-Line, EDXRF Analysis of Waterborne Metals at Parts Per Billion Levels – Invited
D. Connolly, C. Walker, DETORA Analytical, Inc., Alliance, OH and S. Piorek, Metorex, Inc., Ewing, NJ

4:00 F-17 Trace Element Analysis of Geoarchaeological Samples by X-ray Fluorescence and XANES Techniques
E.S. Friedman, T.J. Wilkinson, K.A. Yener, University of Chicago, Chicago, IL, G. Jennings, G. Knapp, C.E. Johnson, S.M. Mini, E.E. Alp, Argonne National Laboratory, Argonne, IL, A. Alatas, Argonne National Laboratory, Argonne, IL and Illinois Institute of Technology, Chicago, IL and Y. Sato, Argonne National Laboratory, Argonne, IL and University of Tokyo, Japan

4:20 F-14 Using Microsample X-ray Analysis (MXA) for Integrated Circuit Process Control
A. Robbins and D. Clark Turner, Process Analytics, Orem, UT

 

Friday Sessions
Friday, 7 August,1998
am XRD & XRF - XRD - XRF


XRD & XRF: Session, Friday a.m. (Summit III)

Session C-7 Micro XRF/XRD
Organized by: D. Carpenter, Martin Marietta Energy Systems, Inc., Oak Ridge, TN
C. Goldsmith, IBM, Hopewell Junction, NY

8:10 F-65 Microanalysis by Means of X-ray Beams Generated in Laboratory and Synchrotron Sources – Invited
K. Janssens, University of Antwerp (UIA), Belgium

8:40 F-29 Optimizing the Focal Spot Size and Elemental Sensitivity of a Monolithic Polycapillary Optic
C.G. Worley, L.P. Colletti and G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM

9:00 F-41 A Modified Approach to Homogeneity Testing at Microscale
M. Mattiuzzi and A. Markowicz, IAEA Laboratories, Austria

9:20 F-33 XRF Mapping: New Tools for Distribution Analyses
B. Scruggs, L. Herczeg, J. Nicolosi, EDAX Inc., Mahwah, NJ, and M. Haschke, Röntgenanalytik Messtechnik GmbH, Germany

9:40 F-45 Use of Kumakhov Lenses in MXRFA
A.S. Scherbakov, S.V. Nikitina and N.S. Ibraimov, Institute for Roentgen Optics, Russia

10:00 Break

10:20 D-92 An Overview of Microbeam X-ray Diffraction Below 20 Microns – Invited
B. York, IBM Materials Laboratory, San Jose, CA

10:50 D-67 Polychromatic Synchrotron X-ray Diffraction Quantification of Grain Subdivision Accompanying Large Deformations of Copper
G.C. Butler, R. Morano, D.L. McDowell and S.R. Stock, Georgia Institute of Technology, Atlanta, GA

11:10 D-66 Mesotexture, Crack Deflection and Fatigue Crack Closure in Al-Li 2090
J.D. Haase and S.R. Stock, Georgia Institute of Technology, Atlanta, GA

11:30 D-58 Diffracted X-rays Mapping and Distribution of Grains in Aluminum Using a Scanning X-ray Analytical Microscope
Y. Hosokawa, Horiba, Ltd., Japan, Y. Miyoshi, The University of Shiga Prefecture, Japan, D. Carpenter, Oak Ridge Centers for Manufacturing Tech., Oak Ridge, TN, H. Corry, Oxford Instruments UK, United Kingdom and P.R. Mainwaring, Oxford Instruments America, Inc., Concord, MA
 
XRD: Session, Friday a.m. (Freemont)

Session D-7 Materials Process Characterization by Diffraction
Organized by: C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN
S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY

8:30 D-112 High-Temperature Studies with Oven Cameras – Hanawalt Award Lecture
H.E. Göbel, Siemens AG, Germany

9:10 D-39 Phase Transformations in Ceramic Fast-Ion Conductors – Invited
S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY

9:35 D-107 Time Resolved Characterization of Crystallization and Phase Transformations by HTXRD – Invited
E.A. Payzant, Oak Ridge National Laboratory, Oak Ridge, TN

10:00 Break

10:20 D-103 In Situ Texture Analysis and Process Control – Invited
J.A. Szpunar and P. Blandford, McGill University, Canada

10:50 D-70 Non-ambient m-diffraction – Invited
T. Wroblewski, HASYLAB, Germany

11:20 D-114 High Pressure and Temperature diffraction at ESRF – Invited
D. Heusermann, ESRF, France
 
XRF: Session, Friday a.m. (Summit I)

Session F-4 Environmental Applications of XRF
Organized by: B. Holynska, University of Mining & Metallurgy, Poland
J.V. Gilfrich, SFA, Inc./NRL, Washington, DC

8:30 F-63 Application of EDXRF Techniques in Aquatic Environment – Invited
B. Holynska, University of Mining and Metallurgy, Poland

9:00 F-56 Applications of Synchrotron Radiation-Based XRF and Micro-XANES Spectroscopies to Environmental Problems
P.M. Bertsch and D.B. Hunter, The University of Georgia, Aiken, SC

9:20 F-72 Use of XRF in an Ultra Clean Environment – Invited
Y. Gohshi, National Institute for Environmental Studies, Japan

9:50 F-48 Development of an Automated Sampling and Measuring Device for Airbourne Particulate Matter Using an EDXRF
C. Schäfer, Spectro Analytical Instruments, Germany, O. Haupt, R. Harmel and W. Dannecker, University of Hamburg, Germany

10:10 Break

10:30 F-5 Specimen Preparation for Analysis of Natural and Drinking Waters
Y.N. Makarovska, L.P. Eksperiandova, A.B. Blank and I.I. Fokina, Institute for Single Crystals of National Acad. Sci., Ukraine

10:50 F-58 Application of Micro X-ray Fluorescence for Analysis of Trace Elements in Waste Water and Industrial Streams
R. Nelson and D. Kloos, Veeco Instruments, Westminster, CA

11:10 F-7 Automated Monitoring of Stack Gas Emissions by EDXRF
O. Haupt, R. Harmel, W. Dannecker, University of Hamburg, Germany, J.Heckel and C. Schäfer, Spectro Analytical Instruments, Germany

11:30 F-16 In-situ Environmental XRF
W.T. Elam, Naval Research Laboratory, Washington, DC, J.W. Adams, US Army Engineer Waterways Experiment Station, Vicksburg, MS, K.R. Hudson, J.V. Gilfrich, SFA, Inc., Landover, MD and B.J. McDonald, University of Toledo, Toledo, OH

11:50 F-54 A Comprehensive Particulate Pollution Study in the Work-Zones of a Sponge Iron Plant Using XRF & XRD
H.D. Pandey, C.D. Mishra and S.R. Mediratta, Steel Authority of India Limited, India