47th Annual (1998) Denver X-ray Conference™ Thursday Sessions Thursday, 6 August, 1998 am - XRD & XRF - XRD - XRF pm - XRD & XRF - XRD - XRF XRD & XRF: Session, Thursday a.m. (Summit I) Session C-3 Recent Advances in X-ray Optics I Organized by: C. MacDonald, University at Albany, SUNY, Albany, NY Co-Chair to be announced 8:30 D-100 Improved Multilayer Optics and XRD Applications – Invited C. Michaelsen, GKSS Research Center, Germany and H. Göbel, Siemens AG, Germany 9:00 C-1 Applications of Polycapillary Optics to Diffraction and Fluorescence – Invited W.M. Gibson and C. MacDonald, University of Albany, SUNY, Albany, NY 9:30 C-2 Refractive X-ray Lenses – Invited B. Lengeler, M. Richwin, C. Schroer, J. Tümmler, Institute of Physics, RWTH Aachen, Germany, A. Snigirev and I. Snigireva, European Synchrotron Radiation Facility, France 10:00 Break 10:30 D-47 The Use of a Multi-fiber Polycapillary X-ray Collimating Optic for General Purpose Powder Diffraction S. Bates, Kratos Analytical Inc., Chestnut Ridge, NY, Q. Xiao and P. Bly, X-ray Optical Systems Inc., Albany, NY 10:50 D-90 Applications of New X-ray Optical Components in Materials Research V. Kogan, Philips Analytical, The Netherlands and T. Ryan, Philips Analytical Mahwah, NJ 11:10 D-32 Evaluation of Parallel Beam Multilayer Optics for Powder Diffractometers S.T. Misture, S. Zdzieszynski, New York State College of Ceramics at Alfred University, Alfred, NY and R. Smith, Osmic, Inc., Troy, MI 11:30 D-43 Confocal Graded d-spacing Multilayer Beam Conditioning Optics B. Verman, L. Jiang, B. Kim, R. Smith and N. Grupido, Osmic, Inc., Troy, MI   XRD & XRF: Session, Thursday a.m. (Summit III) Session C-4 Recent Developments in Instrumentation & Data Treatment I Organized by: V. Buhrke, The Buhrke Co., Portola Valley, CA B. Vrebos, Philips Analytical, Almelo, The Netherlands 9:00 F-30 Correction of Matrix Effects in XRF Analysis F. Claisse, Corporation Scientifique Claisse, Canada 9:20 F-15 Adaptive Strategies for Enhancing Light-Element Analysis Using a Sequential Wavelength-Dispersive Analyzer, Including the Use of the Background- Fundamental Parameter Method and Integrated Intensity I. Klotzko and J.P. Groven, Kratos Analytical Inc., Chestnut Ridge, NY 9:40 F-6 Innovations in WDXRF Software and Methodology H.A. van Sprang, Philips Research Labs, The Netherlands 10:00 Break 10:30 F-49 Use of a High Resolution Si Drift Chamber in a X-ray Polarization Optical System J. Heckel, P. Klinger and R. Schramm, SPECTRO Analytical Instruments, Germany 10:50 F-52 A New Fluorescent X-ray Source for Monoenergetic Radiation D.V. Rao, The Abdus Salam International Centre for Theoretical Physics and Universita di Sassari, Italy, R. Cesareo, Universita di Sassari, Italy and G.E. Gigante, Universita di Roma "La Sapienza", Italy 11:10 F-19 SR-XRF on Geoarchaeological Samples from Ancient Turkey E. Friedman, T.J. Wilkinson, K.A. Yener, University of Chicago, Chicago, IL, C.E. Johnson, B. Lai, G. Jennings, S.M. Mini, E.E. Alp, Argonne National Laboratory, Argonne, IL, Y. Sato, Argonne National Laboratory, Argonne, IL and University of Tokyo, Japan and A. Alatas, Argonne National Laboratory, Argonne, IL and Illinois Institute of Technology, Chicago, IL 11:30 F-46 Local Atomic Image of 0.02% Zn in GaAs wafer Using X-ray Fluorescence Holography K. Hayashi, T. Yamamoto, J. Kawai, Kyoto University, Japan, M. Suzuki, S. Goto, SPring-8, Japan, S. Hayakawa and Y. Gohshi, University of Tokyo, Japan   XRD: Session, Thursday a.m. (Freemont) Session D-3 Thin Films I: Orientation, Stress, Thickness Organized by: I.C. Noyan, IBM, Yorktown Heights, NY D. Rafaja, Charles University, Czech Republic 8:30 D-13 First Observation of Anisotropic In-Plane Texture in Co Recording Media – Invited K. Omote and J. Harada, Rigaku Corporation, Japan 9:00 D-30 Texture Analysis of MgO Thin Films on Crystalline and Amorphous Substrates R.J. Kennedy and P.A. Stampe, Florida A&M University, Tallahassee, FL 9:20 D-22 Texture Determination in Highly Stressed PVD Thin Films P. Scardi, M. Leoni and Y.H. Dong, University of Trento, Italy 9:40 D-98 Equipment and Methods for Texture Analysis in Thin Films J.A. Szpunar, H. Li, M. Glavicic and P. Blandford, McGill University, Canada 10:00 Break 10:30 D-38 Texture Analysis in Thin Films Using an Area Detector U. Preckwinkel, K. Smith, B. He, Bruker Analytical X-ray Systems, Inc., Madison, WI, B. Schey and B. Stritzker, Universitaet Augsburg, Germany 10:50 D-19 Residual Stress Determination with XRD in Sputter Deposited MnZn Ferrite Films K. van den Aker, J. Daams, J. Donkers, Philips Centre for Manufacturing Technology and M. Gillies, Philips Research, The Netherlands 11:10 D-95 Piezoelectric Characterization of Pb(Mg1/3Nb2/3)O3-PbTiO3 (70/30) Epitaxial Thin Films Using In-Situ X-ray Diffraction T. Watkins and E.A. Payzant, Oak Ridge National Laboratory, Oak Ridge, TN, J-P. Maria and S. Trolier-McKinstry, The Pennsylvania State University, University Park, PA   XRD: Session, Thursday a.m. (Learning Center) Session D-4 Innovative Applications of Rietveld Analysis Organized by: R.A. Young, Georgia Institute of Technology, Atlanta, GA D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM 9:00 D-16 New Developments in Microstructure Analysis via Rietveld Refinement – Invited A. Le Bail, Université du Maine, France 9:30 D-45 The Certification of SRMs 1878a and 1879a for Analysis of Quartz and Cristobalite Content J.P. Cline, National Institute of Standards and Technology, Gaithersburg, MD and R.B. Von Dreele, Los Alamos National Laboratory, Los Alamos, NM 9:50 D-18 Separation and Quantification of Amorphous Phases Using the Rietveld Full Pattern Analysis of Some Industrial Semi-crystalline Materials P. Riello, P. Canton and G. Fagherazzi, Universitŕ di Venezia, Italy 10:10 Break 10:40 D-33 Texture by Rietveld Refinement – Invited D. Balzar, National Institute of Standards and Technology, Boulder, CO 11:10 D-24 The Contribution of Powder Diffraction Methods to Structural Coordination Chemistry N. Masciocchi and A. Sironi, Universitŕ di Milano, Italy 11:30 D-97 Quantitative Analysis of the Phase Transformations in Nanocrystalline Materials Via Rietveld Refinement X. Bokhimi, A. Morales, O. Novaro, The National University of Mexico, Mexico, T. López, R. Gómez, Universidad Autónoma Metropolitana Iztapalapa, Mexico and A. García-Ruiz, The National Polytechnic Institute (IPN), Mexico 11:50 D-21 Relaxor Perovskite Ferroelectrics: Structural Aspects of Diffuse Phase Transitions S.A. Ivanov, Karpov' Institute of Physical Chemistry, Russia, N.W. Thomas, S. Ananta, University of Leeds, United Kingdom, R. Tellgren and H. Rundlof, University of Uppsala, Sweden XRF: Session, Thursday a.m. (Summit II) Session F-2 Practical Problems in XRF I Organized by: V. Kocman, Domtar Research Center, Canada F. Feret, Arvida Research & Development Centre, Canada 9:00 F-69 Reliable Analysis of Silicates – Invited T. Ahmedali, McGill University, Montreal, Canada 9:30 F-8 Comparison of Preparation and Analysis Methods for Small Rock Samples R. Harmel, O. Haupt, M. Schäfer and W. Dannecker, University of Hamburg, Germany 9:50 F-11 Logical Steps in the Automated Lachance XRF Matrix Correction Method Utilizing an Electronic Spreadsheet A.J. Klimasara, OSRAM SYLVANIA Development, Inc., Beverly, MA 10:10 Break 10:40 F-10 How is Superb Repeatability (r) Transformed to Good Reproducibility (R) in Routine Analysis of High Alloy Steel by XRF? – Invited B. Larsson, AB Sandvik Steel, Sweden 11:10 F-42 Comparison Between Wavelength Dispersive and Energy Dispersive X-ray Fluorescence Spectrometry for the Determination of Additive and Trace Elements in Lubricants M. Van Driessche, Texaco Technology Gent, Belgium XRD & XRF: Session, Thursday p.m. (Summit I) Session C-5 Recent Advances in X-ray Optics II Organized by: H. Göbel, Siemens AG, Germany W.M. Gibson, University at Albany, SUNY, Albany, NY 2:00 D-71 Development of X-ray Microfocus Tubes for Diffraction and Imaging Applications G. Fraser, Bede Scientific Instruments Limited, United Kingdom 2:20 F-20 Monochromators for Ti-La , C-Ka , B-Ka and Li-Ka Radiation Lines Y. Platonov, J. Rodriguez, L. Gomez, D. Broadway, Osmic, Inc., Troy, MI and N. Salashchenko, IPM RAS, Russia 2:40 F-38 Using Arc Curvature Matrix to Modelise the Behavior of X-ray Lenses. Example of a square X-ray Lens J. Berlu, Commissariat á l’Energie Atomique, France 3:00 Break 3:30 F-43 Development of X-ray Polycapillary Optics M.A. Kumakhov, Institute for Roentgen Optics, Russia 3:50 D-84 Polycapillary X-ray Lenses V. Kogan and J. Bethke, Philips Analytical, The Netherlands 4:10 F-40 Parametric X-ray Radiation in X-ray Tubes: Theoretical Consideration I.D. Feranchuk, Byelorussian State University, Belarus, A. Ulyanenkov, Byelorussian State University, Belarus and Rigaku Corporation, Japan, N. Osaka, K. Omote and J. Harada, Rigaku Corporation, Japan   XRD & XRF: Session, Thursday p.m. (Summit III) Session C-6 Recent Developments in Instrumentation & Data Treatment II Organized by: G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM B. O’Connor, Curtin University of Technology, Australia 2:00 D-83 Differential Evolution: An Evolution Strategy for Genetic Algorithms for Universal Curve and Parameter Fitting and Refinement Applied to Powder Diffraction and Fresnel Reflectivity Profiles D.H. Howell and R.A. Clapp, Diffraction Technology Pty Ltd, Australia 2:20 D-86 Scientific Collaboration Over the Internet at Neutron and X-ray Beamlines M.C. Wright and C.R. Hubbard, Oak Ridge National Laboratory, Oak Ridge, TN 2:40 D-88 Extracting Peak-Height d-I Data From Rietveld Analyses for the Powder Diffraction File D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA and R.A. Young, Georgia Institute of Technology, Atlanta, GA 3:00 D-51 Evolution of Powder Diffraction Databases and Search/Match Schemes J. Faber, R. Jenkins, F. Needham and C. Weth, International Centre for Diffraction Data, Newtown Square, PA 3:20 Break 3:40 D-72 Characterization of Surfaces and Thin Films by Unique Resolution XRD Methods T. Kinefuchi, K. Endo, T. Kikuchi, K. Inaba, R. Yokoyama, T. Ozawa, K. Omote and J. Harada, Rigaku Corporation, Japan 4:00 D-101 Automatic Diffraction Systems for Industrial Quality Control A. Haase, Rich. Seifert & Co., Germany 4:20 D-42 Reverse Geometry X-ray Diffraction Method W.P. Dubé, D.W. Fitting, T.A. Siewert, National Institute of Standards and Technology, Boulder, CO and R. Albert, Digiray Inc., San Ramon, CA 4:40 D-46 Status of the Development of SRM 640c J.P. Cline, R.D. Deslattes, J. Staudenmann, E.G. Kessler, Jr., L.T. Hudson and A. Henins, National Institute of Standards and Technology, Gaithersburg, MD XRD: Session, Thursday p.m. (Freemont) Session D-5 Thin Films II: Orientation, Stress, Thickness Organized by: T.C. Huang, Consultant/IBM, San Jose, CA P. Scardi, University of Trento, Italy 2:00 D-54 Modeling of X-ray Diffraction Stress Analysis in Metallic Interconnects with Sharp Fiber Textures X.J. Xue, S.K. Kurtz, The Pennsylvania State University, University Park, PA, K.J. Kozaczek and D.S. Kurtz, HyperNex, Inc., State College, PA 2:20 D-49 Estimation of Residual Stresses in Polycrystalline Aluminum and Copper Interconnects with Chi-square Fitting X.J. Xue, S.K. Kurtz, The Pennsylvania State University, University Park, PA, K.J. Kozaczek and D.S. Kurtz, HyperNex, Inc., State College, PA 2:40 D-73 Temperature Resolved Evaluation of Residual Stresses in an a -Al2O3 Scale Using Parallel Beam X-ray Diffraction M. Groß, V. Kolarik, W. Engel, Fraunhofer Institute für Chemische Technologie, Germany and L. Singheiser, Forschungszentrum Jülich GmbH, Germany 3:00 F-9 Investigation of the Interfacial Structure of Ultra-Thin Platinum Films Using X-ray Reflectivity D.M. Solina, R.W. Cheary, S. Dligatch, G.M. McCredie, P. Lynch and P. Swift, University of Technology Sydney, Australia 3:20 Break 3:40 D-15 X-ray Reflectivity and Diffuse Scattering from Thin SiO2 Films on Si Substrate A. Ulyanenkov, K. Omote and J. Harada, Rigaku Corporation, Japan 4:00 D-14 New Methods for Reflectivity/Diffraction Studies of Thin Films T. Kikuchi and J. Harada, Rigaku Corporation, Japan 4:20 D-36 High Resolution X-ray Diffraction and Photoluminescence Correlation as an Accurate and Nondestructive Evaluation Technique for PHEMT Structures A. Torabi, S.K. Brierley, P.S. Lyman, W.E. Quinn and W.E. Hoke, Raytheon Microelectronics Center, Andover, MA 4:40 D-20 Grazing Incidence X-ray Diffraction from Semiconductor Quantum Wires A. Ulyanenkov, University of Potsdam, Germany and Institute for Nuclear Problems, Belarus, T. Baumbach, Fraunhofer Institut für Zerstörungsfreie Prüfverfahren, Germany, N. Darowski and U. Pietsch, University of Potsdam, Germany , K. H. Wang and A. Forchel, University of Würzburg, Germany 5:00 D-12 Thin Films Characterization by Synchrotron X-ray Micro- Diffraction Using Grazing Exit Conditions T. Noma, Canon Research Center, Japan and A. Iida, Photon Factory, Institute of Materials Structure Science, Japan XRD: Session, Thursday p.m. (Learning Center) Session D-6 Impact of Rietveld Analysis & Use of Calculated Patterns in Quantitative Phase Analysis Organized by: R.L. Snyder, The Ohio State University, Columbus, OH R. Jenkins, ICDD, Newtown Square, PA 1:30 D-89 Quantitative Analysis of Complex Mixtures Using Fully Digitized Patterns – Invited D.K. Smith, Emeritus and G.G. Johnson, Jr., The Pennsylvania State University, University Park, PA 2:00 D-62 The Role of Rietveld Analysis in Full-Pattern Fitting Methods – Invited D.L. Bish, Los Alamos National Laboratory, Los Alamos, NM 2:30 D-110 Calculated Three-Dimensional X-ray Diffraction Patterns of Small and Disordered Crystals – Invited R.C. Reynolds, Dartmouth College, Hanover, NH 3:00 D-104 Reference Intensity Ratios – Invited Q. Johnson and R.S. Zhou, Materials Data, Inc., Livermore, CA 3:30 Break 3:50 D-48 Identification of Unknown Polycrystalline Phases in Wavelet Space Using Full Pattern PDF Reference Files S. Bates, Kratos Analytical Inc., Chestnut Ridge, NY 4:10 D-69 Quantitative XRD Analysis of Coal Combustion By- Products by the Rietveld Method II. Testing with Standard Mixtures R.S. Winburn, B.R. Jarabek, D.G. Grier and G.J. McCarthy, North Dakota State University, Fargo, ND 4:30 D-28 Influence of Refinement Strategy on Rietveld Phase Composition Determinations B. O'Connor and D. Li, Curtin University of Technology, Australia 4:50 D-11 Routine Quantitative Phase Analysis of Niobium-bearing Lateritic Ores D. Kampata, J. Naud and P. Sonnet, Université Catholique de Louvain, Belgium 5:10 D-57 Accuracy in the Quantitative Phase Analysis of a - and b -Si3N4: Error Estimation and Round Robin H. Toraya and S. Hayashi, Nagoya Institute of Technology, Japan XRF: Session, Thursday p.m. (Summit II) Session F-3 Practical Problems in XRF II Organized by: T. Harding, Spectrace Instruments, Inc., Fort Collins, CO S. Piorek, Metorex, Inc., Ewing, NJ 2:00 F-70 Pushing the Detection Limites in Sychrotron TXRF – Invited P. Pianetta, Stanford University, Stanford, CA 2:30 F-71 Practical Detection Limit in XRF Analysis – Invited Y. Gohshi, National Institute for Environmental Studies, Japan 3:00 Break 3:30 F-60 On-Line, EDXRF Analysis of Waterborne Metals at Parts Per Billion Levels – Invited D. Connolly, C. Walker, DETORA Analytical, Inc., Alliance, OH and S. Piorek, Metorex, Inc., Ewing, NJ 4:00 F-17 Trace Element Analysis of Geoarchaeological Samples by X-ray Fluorescence and XANES Techniques E.S. Friedman, T.J. Wilkinson, K.A. Yener, University of Chicago, Chicago, IL, G. Jennings, G. Knapp, C.E. Johnson, S.M. Mini, E.E. Alp, Argonne National Laboratory, Argonne, IL, A. Alatas, Argonne National Laboratory, Argonne, IL and Illinois Institute of Technology, Chicago, IL and Y. Sato, Argonne National Laboratory, Argonne, IL and University of Tokyo, Japan 4:20 F-14 Using Microsample X-ray Analysis (MXA) for Integrated Circuit Process Control A. Robbins and D. Clark Turner, Process Analytics, Orem, UT