47th Annual (1998) Denver X-ray Conference™
Monday Workshops
Monday, August 3, 1998
am - XRD & XRF - XRD - XRF
pm - XRD & XRF - XRD - XRF
a.m. workshops: 9:00 a.m. – 12:00 noon
p.m. workshops: 2:00 p.m. – 5:00 p.m.
Workshops, Monday a.m.
W-1 Specimen Preparation I: Methods in XRD & XRF (Summit III)
Chairs & Instructors: V. Buhrke, The Buhrke Co., Portola Valley, CA, R. Jenkins, ICDD, Newtown Square, PA and D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA. Invited contributions will also be given by M. Tuff, Garratt-Callahan, Millbrae, CA, D. Bruton, Construction Technologies, Skokie, IL, V. Kocman, Domtar Research Center, Canada and F. Feret, Arvida Research & Development Centre, Canada
For more than a decade, workshops on specimen preparation techniques for XRF and XRD have been an important part of the Denver X-ray Conference™. The demand to repeat and expand these specimen preparation workshops continues to grow and the Conference Organizing Committee is pleased to offer the workshop again. The three instructor/organizers listed above have been involved in the specimen preparation workshops since their inception, and just last year, they published a book which covers most of the relevant material. Additional specialized contributions will be given by invited instructors.
W-2 The Design, Alignment, Calibration and Performance Characteristics of the Conventional Laboratory Diffractometer (Summit I & II)
Chairs & Instructors: J.P. Cline, National Institute of Standards and Technology, Gaithersburg, MD and R.W. Cheary, University of Technology Sydney, New South Wales, Australia
This workshop will discuss the basic design features of the conventional laboratory powder diffractometer and how to realize optimal performance through proper alignment and selection of optical components, i.e., divergence slits, sollar slits, etc. Various alignment procedures will be discussed with consideration given to the consequences of misalignment and mis-setting of components. Instrument calibration and performance will be evaluated through the use of NIST Standard Reference Materials and simulation of line profiles.
W-3 XRF Standards (Learning Center)
Chairs & Instructors: G.R. Brammer, Brammer Standards Company, Inc., Houston, TX, J. Gilfrich, SFA, Inc./NRL, Washington, DC, Z. Mao, National Research Center for Certified Reference Materials, China, J. Heagney, Micromatter, Deer Harbor, WA and T.E. Gills, National Institute of Standards and Technology, Gaithersburg, MD
This workshop will describe the kinds of standards which are available for quantifying XRF analysis. The instructors’ organizations have sources of certified reference materials as well as other types of standards which can be used both for calibrating instruments and for testing accuracy of analysis.
Workshops, Monday p.m.
W-4 Specimen Preparation II: Methods in XRD & XRF (Summit III)
Continuation of W-1
W-5 Use of Total Pattern Fitting for Quantitative Phase Analysis (Summit I & II)
Chairs & Instructors: H. Toraya, Nagoya Institute of Technology, Japan, D.K. Smith, Emeritus, The Pennsylvania State University, University Park, PA and J.A. Kaduk, Amoco Corporation, Naperville, IL
This workshop is intended to focus on the applications of whole-powder pattern fitting techniques to the quantitative phase analysis of multi-component samples. Three pattern fitting techniques are introduced: the Rietveld method, the whole-powder-pattern decomposition (WPPD) method, and the method based on the observed pattern fitting. If we have structural models of all component materials, the Rietveld method may be straightforward. When we are missing structural information, the WPPD approach may be powerful. For speed and simplicity, the observed pattern fitting approach may prove equally effective for production quantitative analysis. Basic ideas of these techniques will be presented, and accuracy and precision will be discussed.
W-6 Reflectometry for Surface and Thin-Film Characterization (Freemont)
Chairs & Instructors: T.C. Huang, Consultant/IBM, San Jose, CA, R.L. Snyder, The Ohio State University, Columbus, OH, H.E. Göbel, Siemens AG, Germany and B. Lengeler, Institute of Physics, RWTH Aachen, Germany
The workshop covers the theoretical background, instrumental techniques and data evaluation of specular and diffuse X-ray reflectivity from flat surfaces and thin films. Applications from microelectronic and glass industries show the capability of this non-destructive technique to measure film thicknesses, densities and roughnesses. Comparative results with more common techniques (Ellipsometry, RBS, AFM) are shown.
W-7 Working Close to Detection Limits: XRF (Learning Center)
Chairs & Instructors: J. Sieber, National Institute of Standards and Technology, Gaithersburg, MD, B. Holynska, University of Mining & Metallurgy, Poland, L. Currie, National Institute of Standards and Technology, Gaithersburg, MD and R. Van Grieken, University of Antwerp, Belgium The workshop will be focused on the fundamentals of trace analysis by X-ray fluorescence. The difficulties and advantages of the method will be pointed out in relation to each analytical version of XRF technique: WDXRF, EDXRF and TXRF. The organizers intend to encourage the participants to open discussion on the problems they have in their analytical practice.
