2004 Denver X-ray Conference < Call For Papers

The 53rd Annual DXC will be 2-6 August
Sheraton Steamboat
Resort
Steamboat Springs, Colorado, USA.

Join us in the scenic mountains of Steamboat Springs, Colorado
 for the 53rd Annual Denver X-ray Conference!

Plenary Session
Red Hot X-rays
This year’s Plenary Session “Red Hot X-rays” 
will explore different uses of X-rays in extreme conditions.

Organized by: C. PREWITT, Carnegie Institution of Washington, Washington, DC
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA

“Laue Microdiffraction: An Energy-Scan Approach to Single-Crystal Diffraction - An Old Technique as a Revolutionary Solution for High-Pressure Crystallography”
P. DERA, Carnegie Institution of Washington, Geophysical Lab, Washington, DC

“Diffraction Studies of Order-Disorder at High Pressures and Temperatures”
J. PARISE, Department of Geosciences, Stony Brook University, Stony Brook, NY

“The Structure of Liquid Al Alloys at High Superheats Using High Energy X-rays”
M. KRAMER, Ames Laboratory, Iowa State University, Ames, IA

“Getting the Hot Structures”
K.F. KELTON, Department of Physics, Washington University, St. Louis, MO

 

Special Sessions—XRD & XRF

Synchrotron Applications (Full Day)
Organized by: C. LAVOIE, IBM T.J. Watson Research Center, Yorktown Heights, NY, 914.945.2180, clavoie@us.ibm.com
 Co-chair T. VAN BUUREN, Lawrence Livermore National Laboratory, Livermore, CA
“AXIOTAXY: A NEW TYPE OF TEXTURE IN THIN FILMS”
C. Detavernier, Universiteit Gent, Gent, Belgium
“PROBING THE PHYSICAL AND ELECTRONIC PROPERTIES OF NANOMATERIALS”
T. van Buuren, Lawrence Livermore National Laboratory, Livermore, CA
"HIGH-RESOLUTION SYNCHROTRON RADIATION XRD AND MICROSTRUCTURE IMAGING IN
6-DIM ORIENTATION-LOCATION SPACE BY THE MOVING AREA DETECTOR METHOD"
L. Wcislak, University of Denver, Denver, CO and NIST, Boulder, CO
Thin Films
Organized by: T.C. HUANG, EMERITUS, IBM Almaden Research Center, San Jose, CA, 408.578.4060, tinghuang@tinghuang.com
“WDXRF ANALYSIS OF THIN LAYERS”
M. Dirken, PANalytical B.V., Almelo, The Netherlands
“GRAZING-INCIDENT X-RAY DIFFRACTION ANALYSES OF NOVEL MAGNETIC THIN FILMS”
K. Inaba, Y. Ito, K. Omote, H. Toraya, Rigaku Corporation, Tokyo, Japan
New Developments in XRD & XRF Instrumentation
Organized by: J.A. ANZELMO, Anzelmo & Associates, Madison, WI, 608.824.0254, jaanzelmo@aol.com
Abstracts should be submitted by technical representatives of a manufacturer. They should discuss specifications and applications concerning one of their newest and most important products. Talks should include comments about software, XRD and XRF equipment, and accessories. No mention of prices or a comparison with competitors' products can be included.
Microbeam Analysis
Organized by: G.J. HAVRILLA, Los Alamos National Laboratory, Los Alamos, NM, 505.667.9627, havrilla@lanl.gov
T. MILLER,  X-ray Optical Systems, Inc., East Greenbush, NY, 518.880.1500, tmiller@xos.com
“COMBINATION OF SCANNING PROBE MICROSCOPE AND X-RAY ANALYSIS”
K. Tsuji, Osaka City University, Osaka, Japan
“SAMPLING VOLUME EFFECTS FOR MICROBEAM DIFFRACTION”
I.C. Noyan, IBM T.J. Watson Research Center, Yorktown Heights, NY
X-ray Optics
Organized by: S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, 607.871.2438, misture@alfred.edu
“POLYCAPILLARY OPTICS IN MICRO X-RAY FLUORESCENCE”
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
“QUANTITATIVE EVALUATION OF GRADED PARABOLIC MULTILAYER OPTICS”
J. Cline, D. Windover, A. Henins, National Institute of Standards & Technology, Gaithersburg, MD
Detectors & Sources
Organized by: T.C. HUANG, Emeritus, IBM Almaden Research Center, San Jose, CA, 408.578.4060, tinghuang@tinghuang.com
“PERFORMANCE OF A NEW ULTRA-FAST AND ULTRA-LOW NOISE X-RAY DETECTOR”
K. Omote, A. Tsukiyama, M. Kuraibayashi, T. Saito, Rigaku Corporation, Tokyo, Japan
   
Special Sessions - XRD
Stress Analysis
Organized by: C.C. GOLDSMITH, IBM Microelectronics, Hopewell Junction, NY, 845.894.3683, cgoldsmi@us.ibm.com
“TRANSIENT STRESS EFFECTS IN THIN FILMS DETERMINED BY X-RAY DIFFRACTION”
C.E. Murray, IBM Research, Yorktown Heights, NY
Rietveld Applications
Organized by: J.A. Kaduk, BP Chemicals, Naperville, IL, 630.420.4547, James.Kaduk@ineos.com
Title: To Be Announced
W.I.F. David, Rutherford Appleton Laboratory, Oxfordshire, UK
"CRYSTAL CHEMISTRY AND ENERGETICS OF NEW NaNbO3-BASED PEROVSKITES"
H. Xu, University of California at Davis, Davis, CA
Parallel Beam Diffraction
Organized by: R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA, 404.894.1246, bob.snyder@mse.gatech.edu
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, 607.871.2438, misture@alfred.edu
 “PARALLEL BEAM XRD: HIGH ACCURACY DATA FROM POWDERS AND POLYCRYSTALLINE THIN FILMS”
D.K. Bowen, Bede Scientific, Inc., Englewood, CO
"A REVIEW OF COMPACT, LOW-POWER, ON-LINE, DIFFRACTION-BASED ANALYZERS" 
H. Huang, X-ray Optical Systems, Inc., East Greenbush, NY
Polymers (Full Day)
Organized by: N.S. MURTHY, University of Vermont, Burlington, VT, 802.656.0308, sanjeeva.murthy@uvm.edu
K.H. GARDNER, DuPont Company, Wilmington, DE, 302.695.2408, kenn.h.gardner@usa.dupont.com
“STRUCTURE OF POLYMERS USING NEUTRON AND X-RAY FIBER DIFFRACTION”
T. Forsyth, Institut Laue Langevin, Grenoble, France and Keele University, Staffordshire, United Kingdom
“STRUCTURE DETERMINATION OF POLYMER FIBER USING DIRECT METHOD TECHNIQUES”
K.H. Gardner, DuPont Company, Wilmington, DE
“SIMULTANEOUS SAXS/WAXD STUDY OF IN-SITU POLYMER PROCESSING”
B. Hsiao, State Unive rsity of New York, Stony Brook, NY
“X-RAY SCATTERING AND DSC STUDIES OF PREMELTING EXOTHERMIC TRANSITIONS IN NYLON 6”
S.T. Correale, Honeywell International, Colonial Heights, VA,
N.S. Murthy, University of Vermont, Burlington, VT
Small Angle Scattering
Organized by: N.S. MURTHY, University of Vermont, Burlington, VT, 802.656.0308, sanjeeva.murthy@uvm.edu
J.D. LONDONO, DuPont Company, Wilmington, DE, 302.695.1222, j-david.londono@usa.dupont.com
“IN-SITU STUDIES OF PARTICLE GROWTH DYNAMICS IN A FLAME REACTOR”
G. Beaucage, University of Cincinnati, Cincinnati, OH
“IN-SITU STRUCTURAL STUDIES OF SEMICRYSTALLINE POLYMER BLENDS USING SYNCHROTRON RADIATION”
P. Thiyagarajan, Argonne National Laboratory, Argonne, IL
“FROM LAB TO FAB: THE DEVELOPMENT AND DEPLOYMENT OF NEW METROLOGY TECHNOLOGY
FOR THE GLOBAL SEMICONDUCTOR INDUSTRY”
B. Landes, Dow Chemical Company, Midland, MI
Industrial Applications of XRD
Organized by: R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA, 404.894.1246,
bob.snyder@mse.gatech.edu
C.R. HUBBARD, Oak Ridge National Laboratories, Oak Ridge, TN, 865.574.4472, hubbardcr@ornl.gov
“XRD INVESTIGATIONS IN ANHYDROUS AND HYDROUS CEMENTITIOUS SYSTEMS”
H. Poellmann, University of Halle, Halle, Germany
“CHARACTERIZATION OF STRUCTURAL FLUIDS DURING FLOW BY SMALL ANGLE NEUTRON SCATTERING”
A.I. Nakatani, Rohm and Haas Company, Spring House, PA
TITLE TO BE ANNOUNCED
J.D. Londono, DuPont Company, Wilmington, DE
   

Special Sessions - XRF

Quantitative XRF
Organized by: J.V. GILFRICH, EMERITUS, SFA, Inc./NRL, Bethesda, MD, 301.365.5070, j.gilfrich@att.net
“QUANTITATIVE PROCEDURES IN TXRF”
P. Wobrauschek, Atominstitut, Vienna, Austria
“ADVANCED PULSE PROCESSING AND ANALYTICAL METHODS FOR QUANTITATIVE ENERGY DISPERSIVE
XRF AND MICRO-XRF”
J. Nicolosi, EDAX, Inc., Mahwah, NJ
Trace Analysis
Organized by: M.A. ZAITZ, IBM, Hopewell Junction, NY, 845.894.6337, zaitz@us.ibm.com
“TRACE ELEMENT ANALYSIS USING A BENCHTOP TXRF-SPECTROMETER”
H. Stosnach, Röntec GmbH, Berlin, Germany
Problem Solving/Industrial Applications of XRF
Organized by: J.A. ANZELMO, Anzelmo & Associates, Madison, WI, 608.824.0254, jaanzelmo@aol.com
“XRF APPLICATIONS IN THE SILICA INDUSTRY”
M. Paige, US Silica, Berkeley Springs, WV
“APPLICATIONS OF SAMPLE PREPARATION FOR XRF ANALYSIS IN THE CEMENT AND CONCRETE INDUSTRY”
D. Broton, Construction Technology Laboratories, Skokie, IL
  

Workshops - XRD & XRF

How to do Synchrotron Experiments
Organized by: I.C. NOYAN, IBM, Yorktown Heights, NY, noyan@us.ibm.com
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
J.A. KADUK, BP Chemicals, Naperville, IL, James.Kaduk@ineos.com
Synchrotron and neutron national user facilities offer the ability to solve problems far beyond those which can be solved in a home laboratory. The powder diffraction data at a synchrotron beam line can be 50,000-500,000 better than that collected at home! Often the major barrier to making use of such capabilities is the "activation energy" one - not knowing what they can do, who to contact, or how to get access. In this Workshop, we will try to dispel the myth that access is difficult, and show what facilities exist, how to access them, and who to contact. We'll emphasize powder diffraction (X-ray and neutron) and X-ray spectroscopy, but also include small-angle scattering and other techniques. Beware! National user facilities are addictive - once you start using them, you won't want to stop!
X-ray Physics
Organized by: W.T. ELAM, University of Washington, Seattle, WA, wtelam@u.washington.edu
The X-ray Physics workshop will start with a description of the interactions of X-rays with atoms. These will then be used to develop the physics of X-ray measurements of materials, which are collections of atoms. Topics to be covered include XRD, XRF, XAFS, TXRF, and detector physics (including superconducting detectors). It is our intention that at least half of the material will be useful to anyone with a technical Bachelor's degree, with the remainder aimed at the PhD level.
Principles and Use of Microdiffraction & Microfluorescence
Organized by: T.N. BLANTON, Eastman Kodak Company, Rochester, NY, tblanton@icdd.com
This workshop will cover characterization of materials using micro X-ray diffraction, micro X-ray fluorescence, and electron backscattered diffraction techniques. The instructors will cover why one would use micro techniques, the equipment, experimental procedures used to perform data collection, analysis of data, and examples of how these micro analysis methods have been used to solve materials problems.
Optics
Organized by: S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
G.J. HAVRILLA, Los Alamos National Laboratory, Los Alamos, NM, havrilla@lanl.gov
There are a myriad of X-ray optics on the market and each one has its own unique capabilities in terms of X-ray spectrometry. This workshop will provide the basic knowledge about X-ray optics including: multilayer optics, crystal optics, polycapillary optics and moncapillary optics. One objective is to help users understand the basic working principles and performance characteristics of these optics. Attendees will learn the function of an optical system in an x-ray instrument. Applications of these optics and their capabilities will be presented.
Workshops - XRD
Small Angle Scattering
Organized by: N.S. MURTHY, University of Vermont, Burlington, VT, sanjeeva.murthy@uvm.edu
J.D. LONDONO, DuPont Company, Wilmington, DE, j-david.londono@usa.dupont.com
Small-angle scattering provides structural information on length scales of 1 to 100 nm. Typical applications include characterization of particles (colloids, proteins and polymers in solution), pore size analysis (ceramics, metals and polymers), and nanostructures such as lamellae in semicrystalline polymers. The workshop will introduce new users to the instrumentation, data analysis and interpretation while providing a sufficiently broad overview for experienced users to identify new opportunities in three areas: 1) Neutron scattering and its application to polymers and proteins. 2) X-ray scattering including ultra-small angle x-ray scattering with examples from ceramics. 3) In-situ x-ray scattering using synchrotron radiation for studying crystallization and fiber-formation in polymers. The three sections of the workshop will be given by three experienced instructors who, with their different approaches, will give a broad overview of the entire field.
Microbeam X-ray Stress Analysis
Organized by: I.C. NOYAN, IBM, Yorktown Heights, NY, noyan@us.ibm.com
This workshop is designed to introduce the attendees to the measurement of applied and residual stresses using x-ray diffraction. Both theoretical fundamentals and practical aspects of the measurement, will be discussed, including basic stress analysis theory and its extensions to microbeam systems including white beam, pink beam and monochromatic techniques, measurement volume considerations, instrument stability, focusing optics, and dedicated synchrotron instruments for stress measurements.
Rietveld Applications (Full Day)
Organized by: A. KERN, Bruker AXS GmbH, Karlsruhe, Germany, arnt.kern@bruker-axs.de
J. FABER, International Centre for Diffraction Data, Newtown Square, PA, faber@icdd.com
Description to be announced
Specimen Preparation—XRD
Organized by: T. FAWCETT, International Centre for Diffraction Data, Newtown Square, PA, dxcfawcett@outlook.com
Specimen preparation is often the limiting step for obtaining good results in any diffraction experiment. Preparation methods can influence the precision and accuracy of peak positions, intensities, and intensity profiles, the basic measurements required for qualitative and quantitative analyses. The presentation will focus on crystallite and particle effects, orientation and texture, and how they influence the resulting data and what steps can be taken to reduce or eliminate these influences. Preparation techniques for different instrumentation and sample holders will be covered and examples will be given for a wide range of materials such as minerals, metals and pharmaceuticals. Tricks of the trade taken from the literature and global x-ray community will be discussed.
Total Pattern Analysis
Organized by: J. FABER, International Centre for Diffraction Data, Newtown Square, PA, faber@icdd.com
T. FAWCETT, International Centre for Diffraction Data, Newtown Square, PA, dxcfawcett@outlook.com
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA, bob.snyder@mse.gatech.edu
Description to be announced
Workshops - XRF
Specimen Preparation—XRF (Full day)
Organized by: J.A. ANZELMO, Anzelmo & Associates, Madison, WI, jaanzelmo@aol.com
D. BROTON, Construction Technology Labs, Skokie, IL, dbroton@ctlgroup.com
This workshop covers the basics and specific details of sampling and specimen preparation for a wide variety of materials. Novel approaches to preparing specimens for analysis come from instructors with many years of experience applying various techniques to real-world samples. Whether an analyst is new to x-rays techniques or experienced, the workshop provides both broad topics and specialized techniques developed for a specific analytical goal.
Thin Film XRF Analysis
Organized by: M. DIRKEN, PANalytical, Almelo, The Netherlands, mark.dirken@panalytical.com
This workshop provides an introduction to the analysis of layered materials and is intended for the X-ray spectroscopist who encounters this analysis for the first time. This is highlighted by ED-XRF and WD- XRF examples focusing on practical issues including problems of finite thickness and line selection.
Quantitative XRF (Full day)
Organized by: M. MANTLER, Vienna University of Technology, Vienna, Austria, mmantler@xrm.atp.tuwien.ac.at

Part 1:

  • Fundamentals
  • Classical fundamental parameter models and mathematical foundation
  • Computed (theoretical) influence coefficients and their mathematical relationship to fundamental parameter models
  • Compensation Methods
  • Error analysis and error propagation, iteration schemes, determination of elements by difference

Part 2:
Selected special cases and methods.
This year the focus will be placed on Monte Carlo methods:

  • Mathematical and statistical principles
  • Applications: Irregularly shaped specimens, inhomogeneous specimens, micro-XRF, unusual geometrical situations.
  • What means "quantitative analysis" with inhomogeneous specimens?
  • Practical aspects: Accuracy and computing times
Fundamentals of XRF
Organized by: L. Creasy, Timet North American Operation, Morgantown, PA, larry.creasy@timet.com
This workshop is intended to provide a basic background of the principles of XRF, specifically directed to those new to the field. It will consist of an general overview of the technique, followed by more specific details of particular applications by experts in those applications, to provide an understanding of the use of the principles previously described.


For more information please contact Denise Zulli - zulli@icdd.com