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The 53rd Annual DXC will be 2-6 August
Sheraton Steamboat Resort
Steamboat Springs, Colorado, USA.
Join us in the scenic mountains of Steamboat Springs, Colorado
for the 53rd Annual Denver X-ray Conference!
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Plenary Session
Red Hot X-rays
This year’s Plenary Session “Red Hot X-rays”
will explore different uses of X-rays in extreme conditions.
| Organized by: |
C. PREWITT, Carnegie Institution of Washington,
Washington, DC
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA |
“Laue Microdiffraction: An Energy-Scan Approach
to Single-Crystal Diffraction - An Old Technique as a Revolutionary
Solution for High-Pressure Crystallography”
P. DERA, Carnegie Institution of Washington, Geophysical Lab, Washington,
DC
“Diffraction Studies of Order-Disorder at High
Pressures and Temperatures”
J. PARISE, Department of Geosciences, Stony Brook University, Stony Brook,
NY
“The Structure of Liquid Al Alloys at High
Superheats Using High Energy X-rays”
M. KRAMER, Ames Laboratory, Iowa State University, Ames, IA
“Getting the Hot Structures”
K.F. KELTON, Department of Physics, Washington University, St. Louis, MO |
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Special Sessions—XRD & XRF |
| Synchrotron Applications (Full Day) |
| Organized by: |
C. LAVOIE, IBM T.J. Watson Research Center, Yorktown Heights, NY, 914.945.2180, clavoie@us.ibm.com |
| Co-chair |
T. VAN BUUREN, Lawrence Livermore National Laboratory, Livermore, CA |
“AXIOTAXY: A NEW TYPE OF TEXTURE IN THIN
FILMS”
C. Detavernier, Universiteit Gent, Gent, Belgium
“PROBING THE PHYSICAL AND ELECTRONIC PROPERTIES OF NANOMATERIALS”
T. van Buuren, Lawrence Livermore National Laboratory, Livermore, CA
"HIGH-RESOLUTION SYNCHROTRON RADIATION XRD AND MICROSTRUCTURE IMAGING
IN
6-DIM ORIENTATION-LOCATION SPACE BY THE MOVING AREA DETECTOR METHOD"
L. Wcislak, University of Denver, Denver, CO and NIST, Boulder, CO |
| Thin Films |
| Organized by: |
T.C. HUANG, EMERITUS, IBM Almaden Research Center, San Jose, CA, 408.578.4060, tinghuang@tinghuang.com |
“WDXRF ANALYSIS OF THIN LAYERS”
M. Dirken, PANalytical B.V., Almelo, The Netherlands
“GRAZING-INCIDENT X-RAY DIFFRACTION ANALYSES OF NOVEL MAGNETIC THIN
FILMS”
K. Inaba, Y. Ito, K. Omote, H. Toraya, Rigaku Corporation, Tokyo, Japan |
| New Developments in XRD & XRF
Instrumentation |
| Organized by: |
J.A. ANZELMO, Anzelmo & Associates, Madison, WI, 608.824.0254, jaanzelmo@aol.com |
| Abstracts should be submitted by technical
representatives of a manufacturer. They should discuss specifications and
applications concerning one of their newest and most important products.
Talks should include comments about software, XRD and XRF equipment, and
accessories. No mention of prices or a comparison with competitors'
products can be included. |
| Microbeam Analysis |
| Organized by: |
G.J. HAVRILLA, Los Alamos National Laboratory, Los Alamos, NM, 505.667.9627, havrilla@lanl.gov
T. MILLER, X-ray Optical Systems, Inc., East Greenbush, NY,
518.880.1500, tmiller@xos.com |
“COMBINATION OF SCANNING PROBE MICROSCOPE AND
X-RAY ANALYSIS”
K. Tsuji, Osaka City University, Osaka, Japan
“SAMPLING VOLUME EFFECTS FOR MICROBEAM DIFFRACTION”
I.C. Noyan, IBM T.J. Watson Research Center, Yorktown Heights, NY |
| X-ray Optics |
| Organized by: |
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, 607.871.2438, misture@alfred.edu |
“POLYCAPILLARY OPTICS IN MICRO X-RAY
FLUORESCENCE”
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
“QUANTITATIVE EVALUATION OF GRADED PARABOLIC MULTILAYER OPTICS”
J. Cline, D. Windover, A. Henins, National Institute of Standards & Technology,
Gaithersburg, MD |
| Detectors & Sources |
| Organized by: |
T.C. HUANG, Emeritus, IBM Almaden Research Center, San Jose, CA, 408.578.4060, tinghuang@tinghuang.com |
“PERFORMANCE OF A NEW ULTRA-FAST AND
ULTRA-LOW NOISE X-RAY DETECTOR”
K. Omote, A. Tsukiyama, M. Kuraibayashi, T. Saito, Rigaku Corporation, Tokyo, Japan |
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Special Sessions - XRD |
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Stress Analysis |
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Organized by: |
C.C. GOLDSMITH, IBM Microelectronics, Hopewell Junction, NY, 845.894.3683, cgoldsmi@us.ibm.com |
“TRANSIENT STRESS EFFECTS IN THIN FILMS DETERMINED BY X-RAY DIFFRACTION”
C.E. Murray, IBM Research, Yorktown Heights, NY |
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Rietveld Applications |
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Organized by: |
J.A. Kaduk, BP Chemicals, Naperville, IL,
630.420.4547, James.Kaduk@ineos.com |
Title: To Be Announced
W.I.F. David, Rutherford Appleton Laboratory, Oxfordshire, UK
"CRYSTAL CHEMISTRY AND ENERGETICS OF NEW NaNbO3-BASED PEROVSKITES"
H. Xu, University of California at Davis, Davis, CA |
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Parallel Beam Diffraction |
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Organized by: |
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA,
404.894.1246, bob.snyder@mse.gatech.edu
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, 607.871.2438,
misture@alfred.edu |
“PARALLEL BEAM XRD: HIGH ACCURACY DATA FROM POWDERS AND POLYCRYSTALLINE THIN FILMS”
D.K. Bowen, Bede Scientific, Inc., Englewood, CO
"A REVIEW OF COMPACT, LOW-POWER, ON-LINE, DIFFRACTION-BASED
ANALYZERS"
H. Huang, X-ray Optical Systems, Inc., East Greenbush, NY |
| Polymers (Full Day) |
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Organized by: |
N.S. MURTHY, University of Vermont, Burlington, VT, 802.656.0308,
sanjeeva.murthy@uvm.edu
K.H. GARDNER, DuPont Company, Wilmington, DE, 302.695.2408, kenn.h.gardner@usa.dupont.com |
“STRUCTURE OF POLYMERS USING NEUTRON AND X-RAY FIBER DIFFRACTION”
T. Forsyth, Institut Laue Langevin, Grenoble, France and Keele University, Staffordshire, United Kingdom
“STRUCTURE DETERMINATION OF POLYMER FIBER USING DIRECT METHOD TECHNIQUES”
K.H. Gardner, DuPont Company, Wilmington, DE
“SIMULTANEOUS SAXS/WAXD STUDY OF IN-SITU POLYMER PROCESSING”
B. Hsiao, State Unive rsity of New York, Stony Brook, NY
“X-RAY SCATTERING AND DSC STUDIES OF PREMELTING EXOTHERMIC TRANSITIONS IN NYLON 6”
S.T. Correale, Honeywell International, Colonial Heights, VA,
N.S. Murthy, University of Vermont, Burlington, VT |
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Small Angle Scattering |
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Organized by: |
N.S. MURTHY, University of Vermont, Burlington, VT, 802.656.0308,
sanjeeva.murthy@uvm.edu
J.D. LONDONO, DuPont Company, Wilmington, DE, 302.695.1222, j-david.londono@usa.dupont.com |
“IN-SITU STUDIES OF PARTICLE GROWTH DYNAMICS IN A FLAME REACTOR”
G. Beaucage, University of Cincinnati, Cincinnati, OH
“IN-SITU STRUCTURAL STUDIES OF SEMICRYSTALLINE POLYMER BLENDS USING SYNCHROTRON RADIATION”
P. Thiyagarajan, Argonne National Laboratory, Argonne, IL
“FROM LAB TO FAB: THE DEVELOPMENT AND DEPLOYMENT OF NEW METROLOGY TECHNOLOGY
FOR THE GLOBAL SEMICONDUCTOR INDUSTRY”
B. Landes, Dow Chemical Company, Midland, MI |
| Industrial Applications of XRD |
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Organized by: |
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA, 404.894.1246,
bob.snyder@mse.gatech.edu
C.R. HUBBARD, Oak Ridge National Laboratories, Oak Ridge, TN, 865.574.4472, hubbardcr@ornl.gov |
“XRD INVESTIGATIONS IN ANHYDROUS AND HYDROUS CEMENTITIOUS SYSTEMS”
H. Poellmann, University of Halle, Halle, Germany
“CHARACTERIZATION OF STRUCTURAL FLUIDS DURING FLOW BY SMALL ANGLE NEUTRON SCATTERING”
A.I. Nakatani, Rohm and Haas Company, Spring House, PA
TITLE TO BE ANNOUNCED
J.D. Londono, DuPont Company, Wilmington, DE |
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Special Sessions - XRF |
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Quantitative XRF |
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Organized by: |
J.V. GILFRICH, EMERITUS, SFA, Inc./NRL, Bethesda, MD, 301.365.5070,
j.gilfrich@att.net |
“QUANTITATIVE PROCEDURES IN TXRF”
P. Wobrauschek, Atominstitut, Vienna, Austria
“ADVANCED PULSE PROCESSING AND ANALYTICAL METHODS FOR QUANTITATIVE ENERGY DISPERSIVE
XRF AND MICRO-XRF”
J. Nicolosi, EDAX, Inc., Mahwah, NJ |
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Trace Analysis |
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Organized by: |
M.A. ZAITZ, IBM, Hopewell Junction, NY, 845.894.6337, zaitz@us.ibm.com |
“TRACE ELEMENT ANALYSIS USING A BENCHTOP TXRF-SPECTROMETER”
H. Stosnach, Röntec GmbH, Berlin, Germany |
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Problem Solving/Industrial
Applications of XRF |
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Organized by: |
J.A. ANZELMO, Anzelmo & Associates, Madison, WI, 608.824.0254,
jaanzelmo@aol.com |
“XRF APPLICATIONS IN THE SILICA INDUSTRY”
M. Paige, US Silica, Berkeley Springs, WV
“APPLICATIONS OF SAMPLE PREPARATION FOR XRF ANALYSIS IN THE CEMENT AND CONCRETE
INDUSTRY”
D. Broton, Construction Technology Laboratories, Skokie, IL |
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Workshops - XRD & XRF |
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How to do Synchrotron Experiments |
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Organized by: |
I.C. NOYAN, IBM, Yorktown Heights, NY, noyan@us.ibm.com
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
J.A. KADUK, BP Chemicals, Naperville, IL, James.Kaduk@ineos.com |
| Synchrotron and neutron national user facilities offer the ability to
solve problems far beyond those which can be solved in a home laboratory.
The powder diffraction data at a synchrotron beam line can be
50,000-500,000 better than that collected at home! Often the major barrier
to making use of such capabilities is the "activation energy"
one - not knowing what they can do, who to contact, or how to get access.
In this Workshop, we will try to dispel the myth that access is difficult,
and show what facilities exist, how to access them, and who to contact.
We'll emphasize powder diffraction (X-ray and neutron) and X-ray
spectroscopy, but also include small-angle scattering and other
techniques. Beware! National user facilities are addictive - once you
start using them, you won't want to stop! |
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X-ray Physics |
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Organized by: |
W.T. ELAM, University of Washington, Seattle, WA, wtelam@u.washington.edu |
| The X-ray Physics workshop will start with a description of the
interactions of X-rays with atoms. These will then be used to develop the
physics of X-ray measurements of materials, which are collections of
atoms. Topics to be covered include XRD, XRF, XAFS, TXRF, and detector
physics (including superconducting detectors). It is our intention that at
least half of the material will be useful to anyone with a technical
Bachelor's degree, with the remainder aimed at the PhD level. |
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Principles and Use of Microdiffraction & Microfluorescence |
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Organized by: |
T.N. BLANTON, Eastman Kodak Company, Rochester, NY, thomas.blanton@kodak.com |
| This workshop will cover characterization of materials using micro
X-ray diffraction, micro X-ray fluorescence, and electron backscattered
diffraction techniques. The instructors will cover why one would use micro
techniques, the equipment, experimental procedures used to perform data
collection, analysis of data, and examples of how these micro analysis
methods have been used to solve materials problems. |
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Optics |
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Organized by: |
S.T. MISTURE, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
G.J. HAVRILLA, Los Alamos National Laboratory, Los Alamos, NM, havrilla@lanl.gov |
| There are a myriad of X-ray optics on the market and each one has its
own unique capabilities in terms of X-ray spectrometry. This workshop will
provide the basic knowledge about X-ray optics including: multilayer
optics, crystal optics, polycapillary optics and moncapillary optics. One
objective is to help users understand the basic working principles and
performance characteristics of these optics. Attendees will learn the
function of an optical system in an x-ray instrument. Applications of
these optics and their capabilities will be presented. |
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Workshops - XRD |
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Small Angle Scattering |
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Organized by: |
N.S. MURTHY, University of Vermont, Burlington, VT, sanjeeva.murthy@uvm.edu
J.D. LONDONO, DuPont Company, Wilmington, DE, j-david.londono@usa.dupont.com |
| Small-angle scattering provides structural information on length scales
of 1 to 100 nm. Typical applications include characterization of particles
(colloids, proteins and polymers in solution), pore size analysis
(ceramics, metals and polymers), and nanostructures such as lamellae in
semicrystalline polymers. The workshop will introduce new users to the
instrumentation, data analysis and interpretation while providing a
sufficiently broad overview for experienced users to identify new
opportunities in three areas: 1) Neutron scattering and its application to
polymers and proteins. 2) X-ray scattering including ultra-small angle
x-ray scattering with examples from ceramics. 3) In-situ x-ray scattering
using synchrotron radiation for studying crystallization and
fiber-formation in polymers. The three sections of the workshop will be
given by three experienced instructors who, with their different
approaches, will give a broad overview of the entire field. |
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Microbeam X-ray Stress Analysis |
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Organized by: |
I.C. NOYAN, IBM, Yorktown Heights, NY, noyan@us.ibm.com |
| This workshop is designed to introduce the attendees to the measurement
of applied and residual stresses using x-ray diffraction. Both theoretical
fundamentals and practical aspects of the measurement, will be discussed,
including basic stress analysis theory and its extensions to microbeam
systems including white beam, pink beam and monochromatic techniques,
measurement volume considerations, instrument stability, focusing optics,
and dedicated synchrotron instruments for stress measurements. |
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Rietveld Applications (Full Day) |
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Organized by: |
A. KERN, Bruker AXS GmbH, Karlsruhe, Germany, arnt.kern@bruker-axs.de
J. FABER, International Centre for Diffraction Data, Newtown Square, PA, faber@icdd.com |
| Description to be announced |
| Specimen Preparation—XRD |
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Organized by: |
T. FAWCETT, International Centre for Diffraction Data, Newtown Square, PA, fawcett@icdd.com |
| Specimen preparation is often the limiting step for obtaining good
results in any diffraction experiment. Preparation methods can influence
the precision and accuracy of peak positions, intensities, and intensity profiles, the basic
measurements required for qualitative and quantitative analyses. The
presentation will focus on crystallite and particle effects, orientation
and texture, and how they influence the resulting data and what steps can
be taken to reduce or eliminate these influences. Preparation techniques for different instrumentation and sample holders will be covered and
examples will be given for a wide range of materials such as minerals,
metals and pharmaceuticals. Tricks of the trade taken from the literature
and global x-ray community will be discussed. |
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Total Pattern Analysis |
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Organized by: |
J. FABER, International Centre for Diffraction Data, Newtown Square, PA, faber@icdd.com
T. FAWCETT, International Centre for Diffraction Data, Newtown Square, PA, fawcett@icdd.com
R.L. SNYDER, Georgia Institute of Technology, Atlanta, GA, bob.snyder@mse.gatech.edu |
| Description to be announced |
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Workshops - XRF |
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Specimen Preparation—XRF (Full day) |
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Organized by: |
J.A. ANZELMO, Anzelmo & Associates, Madison, WI, jaanzelmo@aol.com
D. BROTON, Construction Technology Labs, Skokie, IL, dbroton@ctlgroup.com |
| This workshop covers the basics and specific details of sampling and
specimen preparation for a wide variety of materials. Novel approaches to
preparing specimens for analysis come from instructors with many years of
experience applying various techniques to real-world samples. Whether an
analyst is new to x-rays techniques or experienced, the workshop provides
both broad topics and specialized techniques developed for a specific
analytical goal. |
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Thin Film XRF Analysis |
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Organized by: |
M. DIRKEN, PANalytical, Almelo, The Netherlands, mark.dirken@panalytical.com |
| This workshop provides an introduction to the analysis of layered
materials and is intended for the X-ray spectroscopist who encounters this
analysis for the first time. This is highlighted by ED-XRF and WD- XRF
examples focusing on practical issues including problems of finite
thickness and line selection. |
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Quantitative XRF (Full day) |
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Organized by: |
M. MANTLER, Vienna University of Technology, Vienna, Austria, mmantler@xrm.atp.tuwien.ac.at |
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Part 1:
- Fundamentals
- Classical fundamental parameter models and mathematical foundation
- Computed (theoretical) influence coefficients and their mathematical
relationship to fundamental parameter models
- Compensation Methods
- Error analysis and error propagation, iteration schemes,
determination of elements by difference
Part 2:
Selected special cases and methods.
This year the focus will be placed on Monte Carlo methods:
- Mathematical and statistical principles
- Applications: Irregularly shaped specimens, inhomogeneous specimens,
micro-XRF, unusual geometrical situations.
- What means "quantitative analysis" with inhomogeneous
specimens?
- Practical aspects: Accuracy and computing times
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Fundamentals of XRF |
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Organized by: |
L. Creasy, Timet North American Operation, Morgantown, PA, larry.creasy@timet.com |
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This workshop is intended to provide a basic background of the principles
of XRF, specifically directed to those new to the field. It will consist
of an general overview of the technique, followed by more specific details
of particular applications by experts in those applications, to provide an
understanding of the use of the principles previously described. |
For more
information please contact Denise Flaherty - flaherty@icdd.com
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