2009 Denver X-ray Conference Information:

Program

DXC Sponsors:

Chemplex

Panalytical

Media Sponsors:

Ios Press

Materials Today

 

 

 

 

The 58th Annual DXC will be held 27-31 July 2009, Crowne Plaza Hotel, Colorado Springs, Colorado, U.S.A.

WORKSHOPS - MONDAY & TUESDAY, 27 & 28 JULY

Monday 9:00 a.m.–12:00 noon

XRD & XRF

ADVANCES IN DETECTOR TECHNOLOGY (PIKES PEAK 1 & 2)
Organizer and Instructors:
T.N. Blanton, Eastman Kodak Company, Rochester, NY, tblanton@icdd.com
M. Fransen, PANalytical B.V., Almelo, The Netherlands
B.B. He, Bruker AXS, Madison, WI
P. Salficky, DECTRIS Ltd., Baden, Switzerland
Recent advances in X-ray detectors used for XRD and XRF allow for measurements with high sensitivity, high speed, and high accuracy. New detectors for phase identification, elemental analysis, texture, structure elucidation, etc., are available for users to take advantage of today. This workshop will cover recent developments in theory, instrumentation, data collection and analysis, as well as advantages and disadvantages of advanced X-ray detectors used for materials characterization.

XRD

QUANTITATIVE RIETVELD ANALYSIS I (PIKES PEAK 3 & 4)
Organizers and Instructors:
S.T. Misture, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
R.L. Snyder, Georgia Institute of Technology, Atlanta, GA, bob.snyder@mse.gatech.edu
A. Kern, Bruker AXS GmbH, Karlsruhe, Germany
As Rietveld analysis has become popular, the applicability in quantitative phase analysis has become clear. The workshop will center on the use of Rietveld analysis for quantitative phase analysis but will begin with a general description of the method for the novice user. We will focus, however, on the pitfalls and traps, then provide tips for successful quantification using Rietveld analysis. More advanced topics will include analysis of specimens with amorphous content, as well as an evaluation of the likely errors in the analysis.

XRF

BASIC XRF (GOLD CAMP)
Organizer and Instructors:
W.T. Elam, Ametek/EDAX Research Group and University of Washington APL, Seattle, WA, wtelam@apl.washington.edu
G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
This workshop provides a basic introduction to the principles of XRF, and is specifically aimed at those new to the field. It will start with a general overview of the technique, followed by more specific details of the basic principles. The emphasis will be on understanding how to use XRF and what its capabilities are. In the second half of the workshop, a few selected applications will be presented. The focus of this segment will be to provide an understanding of how the basic principles effect actual practice.

SPECIMEN PREPARATION I (CENTENNIAL)
Organizer and Instructors:
J.A. Anzelmo, Anzelmo & Associates, Inc., Madison, WI, jaanzelmo@aol.com
P. Daigle, Corporation Scientifique Claisse, Sainte-Foy, Quebec, Canada
L. Jacobs, Wyoming Analytical Laboratories, Golden, CO
L. Arias, Bruker AXS, Madison, WI
This workshop will begin in the morning with a review of liquid analysis techniques and equipment (Arias). A discussion of sample preparation physics, and basic operations and equipment for powder preparation and fusion will follow (Anzelmo). The afternoon session begins with a discussion of the preparation of coal, fly-ash, and other service laboratory applications (Jacobs). This will be followed by a discussion of the fusion of difficult samples, including peroxide fusions (Daigle).

Monday 2:00 p.m.–5:00 p.m.

XRD

QUANTITATIVE RIETVELD ANALYSIS II (PIKES PEAK 3 & 4)
See Quantitative Rietveld Analysis I.

PAIR DISTRIBUTION FUNCTION GOLD CAMP
Organizer and Instructors:
V. Petkov, Central Michigan University, Mt. Pleasant, MI, petkov@phy.cmich.edu
M. Gateshki, PANalytical B.V., Almelo, The Netherlands
K. Chapman, Argonne National Laboratory, Lemont, IL
This workshop will offer practical training on in-house (Gateshki) and synchrotron high-energy X-ray diffraction experiments aimed at atomic PDFs analysis. Introduction to PDFs basics and training on 3D structure determination/refinement based on atomic PDFs will also be done (Petkov and Chapman).

XRF

BENEFITS AND LIMITATIONS OF HANDHELD XRF (PIKES PEAK 1 & 2)
Organizer and Instructors:
K. Russell, Innov-X Systems, Woburn, MA, krussell@innovxsys.com
M. Kreiner, Oxford Instruments, Elk Grove Village, IL
S. Piorek, Thermo Fisher Scientific, Billerica, MA
B. Kaiser, Bruker AXS, West Jordan, UT
P. Palmer, San Francisco State University, San Francisco, CA
This workshop will give an overview of Handheld XRF as a powerful analytical tool on its own, as well as in conjunction with other analytical techniques. The benefits and limitations of Handheld XRF will be illustrated through discussions of its technology; its application in industry, research, and the field; and its use as an instructional tool in the academic arena.

SPECIMEN PREPARATION II (CENTENNIAL)
See Specimen Preparation I.

Tuesday 9:00 a.m.–12:00 noon

XRD & XRF

X-RAY SOURCES/OPTICS DEVELOPMENT AND INTEGRATION (CENTENNIAL)
Organizers and Instructors:
A. Khounsary, APS—Argonne National Laboratory, Argonne, IL, amk@aps.anl.gov
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, havrilla@lanl.gov
J. Wiesmann, Incoatec GmbH, Geesthacht, Germany
A. Michette, King’s College London, London, United Kingdom
S. Kamtekar, N. Gao, X-ray Optical Systems, Inc., East Greenbush, NY
Source-optics integration to provide high X-ray throughput is of paramount importance for efficient utilization of any X-ray source. There are several optical systems, each with its own characteristics, capabilities, advantages and disadvantages and unique application niches. This workshop will provide basic knowledge about X-ray optics (such as multilayer optics, polycapillary optics, doubly curved crystal optics, and monocapillary optics) with emphasis on the integration of optics and the source. One of the objectives in this workshop is to help users understand the basic working principles and performance characteristics of these optics. Attendees will learn the selection, function, and capabilities of an X-ray optical system for optimal source-optics performance.

XRD

PHASE IDENTIFICATION—METHODS AND TOOLS (PIKES PEAK 1 & 2)
Organizer and Instructors:
T.G. Fawcett, International Centre for Diffraction Data, Newtown Square, PA, dxcfawcett@outlook.com
C.E. Crowder, S.N. Kabekkodu, International Centre for Diffraction Data, Newtown Square, PA
Integration of powder and single crystal databases has resulted in tremendous growth in the Powder Diffraction File™. Over 650,000 material data sets have been published with PDF-4+ and PDF-4/Organics, each exceeding 300,000 entries. Each entry is also getting more complex in terms of content and context, whereby bibliographic information, quality analyses, physical properties and experimental conditions are recorded. The growth in entry numbers, context, and content alters, and significantly improves, the phase identification processes. The workshop will focus on improved methods for phase identification that utilize data mining, pattern simulation, and multivariate analyses. We will also discuss methods used to evaluate the phase identification results and performance.

XRF

TRACE ANALYSIS (PIKES PEAK 3 & 4)
Organizer:
M.A. Zaitz, IBM, Hopewell Junction, NY, zaitz@us.ibm.com
A. Martin, Thermo Fisher Scientific, Sugar Land, TX
B.Cross, CrossRoads Scientific, El Granada, CA
C. Streli, P. Wobrauschek, Atominstitut, Vienna University of Technology, Vienna, Austria
R. Phillips, Thermo Fisher Scientific, West Palm Beach, FL

This workshop provides a comprehensive review of the basic fundamentals for both the beginner and experienced X-ray Fluorescence spectroscopist. Topics to be covered include the definitions of various types of trace levels and their limits of detection. Key to this technique is the understanding of the sources of background and the ways to reduce it. Different excitation sources, coupled with optics, used to optimize the conditions for trace analysis will be outlined. Methods to reduce scattering, which directly adds to the background, will be outlined including the use of X-ray polarization, secondary targets and filtering, etc. Examples of the use of these techniques in both EDS and WDS x-ray fluorescence will be given. A basic introduction will be given on techniques specifically designed for trace analysis, such as Total Reflection X-ray Fluorescence (TXRF). Also, the key issues behind quantitative analysis will be discussed, for the XRF techniques that are available in trace analysis.

QUANTITATIVE ANALYSIS I (GOLD CAMP)
Organizer and Instructors:
M. Mantler, Vienna University of Technology, Vienna, Austria, michael.mantler@ifp.tuwien.ac.at
B. Vrebos, PANalytical B.V., Almelo, The Netherlands
W.T. Elam, University of Washington, Seattle, WA
1. Theoretical and mathematical foundation: Classical fundamental parameter models.
2. Practical application: Working curves and influence coefficients, compensation methods.

Tuesday 2:00 p.m.–5:00 p.m.

XRD

LINE PROFILE ANALYSIS PIKES (PEAK 1 & 2)
Organizers and Instructors:
I.C. Noyan, Columbia University, New York, NY, icn2@columbia.edu
D. Balzar, University of Denver, Denver, CO, balzar@du.edu
A. Ying, Columbia University, New York, NY
Line profile analysis has evolved into a powerful technique for assessing crystallite size, strain, and defects in materials. The workshop will focus on the determination of these properties by Rietveld refinement and other Whole Powder Pattern Fitting (WPPF) programs. A brief theoretical overview will be followed by a practical tutorial with recipes and examples of the determination of crystallite-size distribution and dislocation density in different materials.

STRUCTURE SOLUTION PIKES (PEAK 3 & 4)
Organizer and Instructors:
S.T. Misture, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu
A. Kern, Bruker AXS GmbH, Karlsruhe, Germany
This workshop will focus on extracting crystal structures from powder diffraction data. As a first step, we will cover the process of indexing powder patterns using modern software with error corrections. Structure solutions using the simulated annealing and charge flipping approaches will be highlighted. In particular, we will show how heavy atom and equal atom problems can be approached using the two different methods. For the simulated annealing approach, we will demonstrate the use of individual atoms as well as the use of rigid bodies. Finally, the workshop will include a discussion of Fourier synthesis and chemical knowledge to reach full descriptions of structures.

XRF

QUANTITATIVE ANALYSIS II (GOLD CAMP)
Organizer and Instructors:
M. Mantler, Vienna University of Technology, Vienna, Austria, michael.mantler@ifp.tuwien.ac.at
B. Vrebos, PANalytical B.V., Almelo, The Netherlands
W.T. Elam, University of Washington, Seattle, WA
1. How accurate is XRF? (e.g., standardless methods, light elements and low-energy lines, trace-analysis).
2. Obtaining net-intensities: Detector (spectrometer) response function; separation of overlapping peaks/deconvolution; background subtraction; artifacts in spectra.

STRATEGIES FOR ADVANCED MATERIALS ANALYSIS WITH LAB & SR X-RAY SPECTROSCOPY (CENTENNIAL)
Organizer and Instructors:
S. Hayakawa, Hiroshima University, Hiroshima, Japan, hayakawa@hiroshima-u.ac.jp
J. Kawai, Kyoto University, Kyoto, Japan
I. Nakai, Tokyo University of Science, Tokyo, Japan
Y. Muramatsu, University of Hyogo, Hyogo, Japan
H. Wakita, Fukuoka University, Fukuoka, Japan
XRF has made great advances in trace sensitivity and in spatial resolution with the use of synchrotron light sources. Moreover, characterization of trace elements in advanced materials has been realized by using X-ray absorption spectroscopy with the XRF yields method. To realize similar performance with the conventional X-ray sources, many state-of-the-art instruments have been invented. In this workshop, a review will be made on the present status of trace and micro analysis with the laboratory and the synchrotron light sources, and a strategy of choice will be indicated according to the samples to be analyzed.