47th Annual (1998) Denver X-ray Conference™
Tuesday Workshops
Tuesday, August 4, 1998
am - XRD & XRF - XRD - XRF
pm - XRD & XRF - XRD - XRF
a.m. workshops: 9:00 a.m. – 12:00 noon
p.m. workshops: 2:00 p.m. – 5:00 p.m.
Workshops, Tuesday a.m.
W-8 Principles and Use of Microdiffraction & Microfluorescence I (Summit III)
Chairs & Instructors: M. Eatough, Sandia National Laboratory, Albuquerque, NM, R. Tissot, Sandia National Laboratory, Albuquerque, NM, D. Carpenter, Oak Ridge Centers for Manufacturing Tech., Oak Ridge, TN, P. DeHaven, IBM, Hopewell Junction, NY, K. Evans-Lutterodt, Lucent Technologies, Murray Hill, NJ, G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, R.P. Goehner, Sandia National Laboratory, Albuquerque, NM and J. Jordan-Sweet, IBM Research Division, Upton, NY
This full day workshop will cover an overview of microdiffraction and microfluorescence applications, instrumentation and new developments. The workshop will cover a full scope of methods from using in lab sources to synchrotron radiation as well as diffraction in the scanning electron microscope.
W-9 Conclusions from the Intensity Round Robin: XRD (Summit I & II)
Chairs & Instructors: R. Jenkins, ICDD, Newtown Square, PA, D. Taylor, Emeritus, Pilkington Technology Centre, England and D. Rafaja, Charles University, Czech Republic
With the increasing interest in the use of fully digitized powder patterns for quantitative analysis, several years ago, ICDD established a program for the archiving of such data. Since these data were, and still are, being obtained using different types of diffractometers, and in different laboratories, the question arose as to how to calibrate the data. In order to quantify answers relating to the general problem of the variability in diffractometer sensitivity, an Intensity Round Robin was designed based on the use of corundum (SRM 1976). The round robin was run first in the US, with some overseas participation, then subsequently in the UK and the Czech Republic. Nearly 200 data sets were obtained from these tests. This workshop will present conclusions from these tests, and typical sources of error in comparative intensity measurements will be discussed. In practical exercises, the influence of such effects as detector dead-time, step size and smoothing, choice of divergence slits, surface roughness and micro-absorption in the specimen, and use of thin specimens will be covered.
W-10 Applications of TXRF (Learning Center)
Chairs & Instructors: P. Wobrauschek, Atominstitut of the Austrian Universities, Austria, P. Pianetta, Stanford University, Stanford, CA, C. Streli, Atominstitut of the Austrian Universities, Austria and B. Vrebos, Philips Analytical, The Netherlands
Total reflection XRF is an extremely sensitive spectrochemical technique for ultra trace element analysis, and has found applications in the field of environmental contaminants, medical research and, in particular, is almost ideal in the nondestructive analysis of surface impurities on Si wafers. Another challenging application is the characterization of thin layers on a substrate, or the depth profiling below the surface. The instrumental requirements for TXRF (including the light elements), the necessary environment for the experiments, and the data evaluation and interpretation procedures will be presented and discussed.
Workshops, Tuesday p.m.
W-11 Principles and Use of Microdiffraction & Microfluorescence II (Summit III)
Continuation of W-8
W-12 Diffractometer Optics (Summit I & II)
Chairs & Instructors: I.C. Noyan, IBM Research Division, Yorktown Heights, NY, C.C. Goldsmith, IBM Microelectronics Division, Hopewell Junction, NY and T.L. Nunes, IBM Microelectronics Division, Hopewell Junction, NY
In this workshop, we will investigate the effect of specimen displacement on the accuracy of the lattice parameters and residual stresses measured with various diffractometer optics and discuss the relative merits of various extrapolation parameters.
W-13 High Temperature XRD (Freemont)
Chairs & Instructors: C.R. Hubbard, Oak Ridge National Laboratories, Oak Ridge, TN, S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY and E.A. Payzant, Oak Ridge National Laboratories, Oak Ridge, TN
Experimental techniques for high temperature, atmosphere-controlled powder diffraction will be covered in detail, including temperature measurement and control, specimen mounting, and detector arrangements. Data analysis approaches to eliminate systematic diffraction angle errors and provide accurate structural data will be presented, along with illustrative applications of the in-situ method.
W-14 Quantitative Techniques and Errors in XRF (Learning Center)
Chairs & Instructors: J. Anzelmo, Bruker AXS, Inc., Madison, WI, R. Jenkins, ICDD, Newtown Square, PA and K. Mauser, Bruker AXS GmbH, Germany
This workshop will discuss the philosophy of algorithm selection for processing intensities into concentrations and the errors associated with those techniques. There will also be a discussion of errors in general.
