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48th Annual (1999) Denver X-ray Conference™
Friday, 6 August
Sessions

Morning Sessions only

Session, Friday a.m. (Twilight)

XRD & XRF: 
Session C-4  
NON-TRADITIONAL PARADIGMS IN DATA PROCESSING
 
Organized by: H. Wern, HTW des Saarlandes, University of Applied Sciences, Germany
I.C. Noyan, IBM, Yorktown Heights, NY
8:30 D-041 COMPARISON OF WAVELET AND TRADITIONAL METHODS TO EVALUATE RESIDUAL STRESS GRADIENTS MEASURED BY X-RAY DIFFRACTION — Invited
L. Suominen, Stresstech Oy, Jyvaskyla, Finland
D. Carr, American Stress Technologies, Inc., Pittsburgh, PA
9:00 D-020 EVALUATION OF RESIDUAL STRESS GRADIENTS BY DIFFRACTION METHODS WITH WAVELETS; A NEURAL NETWORK APPROACH — Invited
H. Wern, HTW des Saarlandes, University of Applied Sciences, Germany
9:30 D-008 MATHEMATICAL PROPERTIES OF DIFFRACTION POLE FIGURES
H. Schaeben, Freiberg University of Technology and Mining, Germany
9:50 D-011 THE DE LA VALLEE POUSSIN DISTRIBUTION IN TEXTURE ANALYSIS
H. Schaeben, Freiberg University of Technology and Mining, Germany
10:10 Break  
10:30 D-091 A NEW FUNDAMENTAL PARAMETERS APPROACH
A. Coelho, A. Kern, Bruker AXS GmbH, Germany
P.J. LaPuma, Bruker AXS, Inc., Madison, WI
10:50 D-050 X’PERT TEXTURE: A NEW TOOL TO PROCESS THE X-RAY TEXTURE DATA
D.I. Nikolayev, V. Luzin, T. Lychagina, Joint Institute for Nuclear Research, Russia
A.A. Dzjuba, V.A. Kogan, J. te Nijenhuis, Philips Analytical, The Netherlands
 

Session, Friday a.m. (Sunshine Peak)

XRD & XRF:
Session C-5
X-RAY INSTRUMENTATION & OTHER APPLICATIONS

Organized by: G. Berti, Universita’ di Pisa, Italy
D. Broton, Construction Technology Laboratories, Skokie, IL
8:00 D-065 APPLICATIONS OF POLYCAPILLARY OPTICS FOR POWDER DIFFRACTION
S.T. Misture, New York State College of Ceramics at Alfred University, Alfred, NY
M. Haller, X-ray Optical Systems, Inc., Albany, NY
8:20 D-034 TECHNIQUES AND LABORATORY APPLICATIONS FOR FOCUSED BEAM X-RAY DIFFRACTION
D.K. Bowen, G. Fraser, N. Loxley, J. Wall, Bede Scientific Instruments Ltd., UK
L. Pina, A. Inneman, R. Hudec, Reflex sro, Prague CZ
8:40 D-031 USING A TAPERED MONOCAPILLARY OPTIC TO PRODUCE A 30 mm X-RAY BEAM FOR MICRODIFFRACTION ANALYSIS
R.C. Chan, C.G. Cleaver, J.P. Heuer, J.L. Lakner, R.L. Lewis, Schafer Corporation, Sunol, CA
I. Ponomarev, N. Gao, X-ray Optical Systems, Inc., Albany, NY
9:00 D-072 BEAM COLLIMATION USING POLYCAPILLARY X-RAY OPTICS FOR LARGE AREA DIFFRACTION APPLICATIONS
S.D. Padiyar, H. Wang, W.M. Gibson, C.A. MacDonald, University at Albany, SUNY, Albany, NY
M.V. Gubarev, NASA, Huntsville, AL
9:20 D-017 PARALLEL BEAM METHODS IN POWDER DIFFRACTION AND TEXTURE IN THE LABORATORY
R.A. Clapp, Diffraction Technology Pty. Ltd., Australia
M. Haller, X-ray Optical Systems, Inc., Albany, NY
9:40 D-049 GRADED d-SPACING MULTILAYER OPTICS FOR VARIOUS ENERGIES
B. Verman, B. Kim, D. Wilcox, D. Broadway, Y. Platonov, N. Grupido, L.
Jiang, Osmic, Inc., Troy, MI
10:00 Break  
10:20 F-22 INTEGRATED SPECTROSCOPIC CHEMICAL IMAGING: MXRF, MRAMAN, MIR
G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM
10:40 D-047 X-RAY CHARACTERIZATION OF RESISTOR/DIELECTIC MATERIAL FOR LOW TEMPERATURE CO-FIRED CERAMIC PACKAGES
M.A. Rodriguez, P. Yang, D. Dimos, Sandia National Laboratories, Albuquerque, NM
11:00 D-116 AMBIGUITIES OF MICRO AND NANO STRUCTURAL DETERMINATION
G. Berti, Universita’ di Pisa, Italy
11:20 D-115 ACCURACY OF XRPD MEASUREMENT VIA DIFFRACTION INSTRUMENTAL MONITORING
G. Berti, Universita’ di Pisa, Italy
11:40 D-056 FUNDAMENTALS OF TWO-DIMENSIONAL X-RAY DIFFRACTION (XRD 2 )
B.B. He, U. Preckwinkel, K.L. Smith, Bruker Analytical X-ray Systems, Inc., Madison, WI
12:00 F-39 CRYOGENIC MICROCALORIMETERS FOR HIGH RESOLUTION ENERGY DISPERSIVE X-RAY SPECTROMETRY
J. Höhne, M. Bühler, T. Hertrich, CSP Cryogenic Spectrometers GmbH, Germany
M. Altmann, G. Angloher, F.v. Feilitzsch, T. Frank, P. Hettl, J. Jochum, T. Nüßle, S. Pfnür, J. Schnagl, S. Wänninger, Technische Universität München, Germany
 

Session, Friday a.m. (Buddy’s Run)

XRF:
Session F-5
APPLICATIONS OF XRF: ENVIRONMENTAL PROBLEMS AND LOW DETECTION LIMITS

Organized by: Y. Gohshi, National Institute for Environmental Studies, Japan
N. Dando, ALCOA, Alcoa Technical Center, PA
8:10 F-32 X-RAY EMISSION ANALYSIS OF VOLATILE AND NON-VOLATILE METALS IN THE ENVIRONMENT — Invited
S. Török, KFKI Atomic Energy Research Institute, Hungary
8:40 F-42 ULTRA TRACE ANALYSIS BY MICRO X-RAY FLUORESCENCE SPECTROSCOPY
B. Scruggs, EDAX Inc., Mahwah, NJ
M. Haschke, P. Pfannekuch, Röntgenanalytik Messtechnik GmbH, Germany
9:00 F-31 ANALYSIS OF HEAVY METALS AND OTHER TOXIC ELEMENTS USING XRF: COMPARISON OF QUANTITATIVE AND “STANDARD-LESS” APPROACHES
R. Yellepeddi, D. Bonvin, A. Kohler, ARL SA, Switzerland
9:20 F-10 ENVIRONMENTAL ANALYSIS USING MONOCHRO SOURCE EDXRF — Invited
K. Nishihagi, S. Terada, TECHNOS Co., Ltd., Japan
T. Wakisaka, N. Morita, M. Wakasa, Kao Corporation, Japan
9:50 Break  
10:10 F-03 TIME DEPENDENT CHARACTERIZATION OF OMBROTROPHIC PEAT CORES TAKEN FROM POLAND AND AUSTRIA FOR STUDYING ATMOSPHERIC DEPOSITION OF METALS USING X-RAY FLUORESCENCE TECHNIQUES
B. Holyñska, B. Ostachowicz, J. Ostachowicz, L. Samek, P. Wachniew, University of Mining and Metallurgy, Poland
E. Madeyska, Institute of Botany, Polish Acad. Of Science, Poland
P. Wobrauschek, C. Streli, G. Halmetschlager, Atominstitut of the Austrian Universities, Austria
10:30 F-49 DEVELOPMENT OF AN AUTOMATED SAMPLE PREPARATION STATION FOR MICROSAMPLE X-RAY ANALYSIS (MXA)
D. Clark Turner, E.C. Anderson, B. Shumway, Process Analytics, Orem, UT
10:50 F-48 PREPARATION AND CHARACTERIZATION OF DRIED-RESIDUE CALIBRA-TION STANDARDS FOR USE IN MICROSAMPLE X-RAY ANALYSIS (MXA)
E.C. Anderson, B. Shumway, D. Clark Turner, Process Analytics, Orem, UT
11:10 F-34 APPLICATION OF X-RAY MICROFLUORESCENCE SPECTROMETRY FOR LOCAL-IZED AREA ANALYSIS OF BIOLOGICAL AND ENVIRONMENTAL MATERIALS
J.R. Sieber, National Institute of Standards and Technology, Gaithersburg, MD
M. Lankosz, M. Boruchowska, University of Mining and Metallurgy, Poland
11:30 F-15 CHARACTERIZATION OF Pu-RICH PARTICLES BY X-RAY MICROFLUORESCENCE
M. Mattiuzzi, A. Markowicz, P.R. Danesi, IAEA Laboratories, Seibersdorf, Austria