New Developments in XRD & XRF Instrumentation (vendor/commercial presentations permitted)

Chairs:
Tim Fawcett, Emeritus, ICDD, USA, dxcfawcett@outlook.com
Andy Drews, Ford Motor Company, USA, adrews@ford.com

Abstracts should be submitted by technical representatives of a manufacturer. They should discuss specifications, and applications concerning one of their newest and most important products. Talks should include comments about software, XRD and XRF equipment, and accessories. No mention of prices or a comparison with competitors’ products can be included.

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Mining, Recycling, and Sustainable Materials

Chair: Kouichi Tsuji, Osaka Metropolitan University (OMU), Japan, k-tsuji@omu.ac.jp

The Mining, Recycling, and Sustainable Materials session welcomes presentations on X-ray analysis at mine sites, online X-ray analysis in recycling processes, and applications of handheld X-ray analyzers. X-ray analysis of rare earth and rare metal elements are also important in the industrial field and will be discussed.

Invited Speakers:
Akiko Hokura, Tokyo Denki University, Japan
Chiharu Tokoro, Waseda University, Japan

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Early Career Researchers: Spotlight on the Next Generation

Chair: Sarah Gosling, Keele University, United Kingdom, s.b.gosling@keele.ac.uk

A session for early career researchers to present their work to their peers and hone their presentation skills in a friendly environment. Abstracts are welcome from across the range of topics covered at DXC.

Early career researchers are typically defined as students, post-docs, and academics in their first independent post, or industry equivalents, but please get in contact with the organizers if you are not sure.

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Machine Learning Techniques in X-ray Analysis

Chair: Mathew Cherukara, Argonne National Laboratory, USA, mcherukara@anl.gov

The capabilities provided by next generation light sources along with the development of new characterization techniques and detector advances are expected to revolutionize science across disciplines but also dramatically increase the complexity and volume of data generated by instruments at the new light sources. Traditional techniques of data reduction and analysis will not be able to keep pace. Machine learning methods applied to a variety of X-ray characterization techniques have shown promise in accelerating, and in some cases improving the accuracy of X-ray data inversion, abstraction and inference. Concurrently, AI-driven experimental automation is accelerating and expanding the capabilities of x-ray instruments. Large language models (LLMs) are being explored as AI-assistants to guide scientific users in experiment design, instrument operation and data analysis.

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Cultural Heritage

Chair: Tina Hill, Bruker, USA, tina.hill@bruker.com

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Tomography and X-ray Microscopy

Chair: Martina Schmeling, Loyola University Chicago, USA, mschmel@luc.edu

Invited Speakers:
Ju-Chen Chia, Cornell University, USA
Gosia Korbas, Argonne National Laboratory, USA

General XRD

Chair: John Okasinski, Argonne National Laboratory, USA, okasinski@anl.gov

Welcoming abstracts in all areas of X-ray diffraction and related techniques.

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Industrial Applications of XRD

Chair: Tim Fawcett, Emeritus, ICDD, USA, dxcfawcett@outlook.com

The Industrial Applications session includes both X-ray fluorescence and X-ray diffraction analyses as used by industry scientists. The idea behind this session is to showcase the general approaches used in X-ray analyses for a variety of applications and material types.

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Pair Distribution Function

Chair: Tom Watkins, Oak Ridge National Laboratory, USA, watkinstr@ornl.gov

Invited Speaker:
Yuya Shinohara, Oak Ridge National Laboratory, USA

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Stress and Texture Analysis

Chair: Tom Watkins, Oak Ridge National Laboratory, USA, watkinstr@ornl.gov

The Stress and Texture Analysis session seeks to provide a forum to display and discuss the latest techniques and analyses for stress and texture work using diffraction across a broad range of applications.  Contributions are also sought from related areas that impact these analyses including but not limited to elasticity, statistics, validation, modelling, etc.

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SAXS & WAXS

Chair: Tom Watkins, Oak Ridge National Laboratory, USA, watkinstr@ornl.gov

Invited Speakers:
Byeongdu Lee, Argonne National Laboratory, USA
Yuya Shinohara, Oak Ridge National Laboratory, USA

General XRF

Chair: Ursula Fittschen, TU Clausthal, Clausthal-Zellerfeld, Germany, ursula.fittschen@tu-clausthal.de

Authors are invited to submit X-ray fluorescence and related X-ray technique papers to the general XRF session. Such papers on topics that do not fit well into other specific sessions can be submitted to the General XRF session.

Invited Speaker:
Juergen Thieme, NSLS, Germany

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Industrial Applications XRF

Chair: Poulami Dutta, Dow Chemical Company, USA, pdutta1@dow.com

This session will consist of presentations where EDXRF and/or WDXRF are used either for routine elemental characterization or to help solve problems in industry or other settings such as government or academia. Submissions can entail quantitative and/or qualitative XRF applications.

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Biomedical Imaging

Chairs:
Andrew Crawford, Michigan State University, USA, crawf472@msu.edu
Clinton Kidman, University of Saskatchewan, Canada, clinton.kidman@usask.ca

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Synergy of Computational Materials and Process Engineer Modeling with Materials Characterization

Chair: Michael Fischlschweiger, Clausthal University of Technology, Germany, michael.fischlschweiger@tu-clausthal.de

Invited Speakers:
Catherine Dejoie, European Synchrotron Radiation Facility, France
Tim Zeiner, Institut für Thermische Verfahrenstechnik, Karlsruher Institut für Technologie (KIT), Germany

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Spatially-Resolved Benchtop Micro-XRF

Chair: Tina Hill, Bruker, USA, tina.hill@bruker.com